Inventor · disambiguated record
Zhiying Chen
Also filed as: CHEN ZHIYING
35 granted patents·12 pending applications·118 citations·filing 2012–2024
95Inventor score
Files withTOKYO ELECTRON LTD31CHEN ZHIYING5FUZHOU BOE OPTOELECTRONICS TECH CO LTD3IBM1INSTITUTE OF FOOD SCIENCE AND TECH CHINESE ACADEMY OF AGRICULTURAL SCIENCES1
Top patents by PatentIndex Score
47 records- 0198US10998169B2Systems and methods of control for plasma processingTOKYO ELECTRON LTD·Filed 2018·Granted May 4, 2021·44 cites·20 claims
- 0297US9209032B2Electric pressure systems for control of plasma properties and uniformityTOKYO ELECTRON LTD·Filed 2014·Granted Dec 8, 2015·42 cites·10 claims
- 0385US11264212B1Ion angle detectorTOKYO ELECTRON LTD·Filed 2020·Granted Mar 1, 2022·2 cites·20 claims
- 0484US10280425B2Minicircle DNA recombinant parental plasmid having genetically engineered antibody gene expression cassette, a minicircle DNA having the expression cassette, and applicationsSHENZHEN INST ADV TECH·Filed 2014·Granted May 7, 2019·8 cites·2 claims
- 0584US8486798B1Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted Jul 16, 2013·6 cites·20 claims
- 0680US8721833B2Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted May 13, 2014·4 cites·15 claims
- 0779US9288890B1Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasmaTOKYO ELECTRON LTD·Filed 2014·Granted Mar 15, 2016·5 cites·20 claims
- 0878US11728135B2Electric pressure systems for control of plasma properties and uniformityTOKYO ELECTRON LTD·Filed 2015·Granted Aug 15, 2023·2 cites·19 claims
- 0970US12317930B2Atomizing core and atomizerLUXSHARE PRECISION INDUSTRY CO LTD·Filed 2022·Granted Jun 3, 2025·0 cites·20 claims
- 1069US9668332B2Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasmaTOKYO ELECTRON LTD·Filed 2016·Granted May 30, 2017·1 cites·3 claims
- 1167US9978568B2Self-sustained non-ambipolar direct current (DC) plasma at low powerTOKYO ELECTRON LTD·Filed 2014·Granted May 22, 2018·1 cites·10 claims
- 1264USD993820SChainCHEN ZHIYING·Filed 2022·Granted Aug 1, 2023·2 cites·1 claims
- 1362US11774433B2Method for characterizing graphene on platinum substrateSHANGHAI INST MICROSYSTEM & INFORMATION TECH CAS·Filed 2022·Granted Oct 3, 2023·0 cites·9 claims
- 1461US12487182B2Non-intrusive method for 2D/3D mapping plasma parametersTOKYO ELECTRON LTD·Filed 2023·Granted Dec 2, 2025·0 cites·20 claims
- 1561US11695294B1Power regulation apparatus, dual-battery charging apparatus and charging current regulation methodNUVOLTA TECH HEFEI CO LTD·Filed 2022·Granted Jul 4, 2023·0 cites·17 claims
- 1661US2025273429A1Plasma potential adjustment circuitTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1761US2025325706A1Linker peptide, fviii protein or variant thereof containing linker peptide, and use thereofSHENZHEN SYNO MINICIRCLE BIOTECHNOLOGY CO LTD·Filed 2023·Application pending·0 cites
- 1859US12228765B2Curved optical plate and method of manufacturing the same, backlight module and display deviceFUZHOU BOE OPTOELECTRONICS TECH CO LTD·Filed 2022·Granted Feb 18, 2025·0 cites·13 claims
- 1958US9793095B2Microwave surface-wave plasma deviceTOKYO ELECTRON LTD·Filed 2014·Granted Oct 17, 2017·0 cites·11 claims
- 2058US2025226192A1Method and system for plasma processTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2157US10395903B2Self-sustained non-ambipolar direct current (DC) plasma at low powerCHEN ZHIYING·Filed 2018·Granted Aug 27, 2019·0 cites·20 claims
- 2257US9947515B2Microwave surface-wave plasma deviceTOKYO ELECTRON LTD·Filed 2014·Granted Apr 17, 2018·0 cites·20 claims
- 2357US2025226179A1Method and system for plasma processTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2456US11942307B2Plasma processing with radio frequency (RF) source and bias signal waveformsTOKYO ELECTRON LTD·Filed 2021·Granted Mar 26, 2024·0 cites·17 claims
- 2556US11779666B2Continuous differential-pressure steam sterilization system and method for a powderINSTITUTE OF FOOD SCIENCE AND TECH CHINESE ACADEMY OF AGRICULTURAL SCIENCES·Filed 2023·Granted Oct 10, 2023·0 cites·10 claims
- 2656USD974948SPendantCHEN ZHIYING·Filed 2022·Granted Jan 10, 2023·1 cites·1 claims
- 2756US11043362B2Plasma processing apparatuses including multiple electron sourcesTOKYO ELECTRON LTD·Filed 2019·Granted Jun 22, 2021·0 cites·19 claims
- 2856US2025291076A1Grid-less ion angle detectorTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2956US2025292994A1Grid-less ion energy detectorTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3055US9697993B2Non-ambipolar plasma ehncanced DC/VHF phasorTOKYO ELECTRON LTD·Filed 2014·Granted Jul 4, 2017·0 cites·16 claims
- 3153US12228809B2Display module, display device and calculation methodFUZHOU BOE OPTOELECTRONICS TECH CO LTD·Filed 2022·Granted Feb 18, 2025·0 cites·20 claims
- 3253US2025246418A1Sensor in chamber insert ring assemblyTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3353US2014273538A1Non-ambipolar electric pressure plasma uniformity controlTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3452US11152194B2Plasma processing apparatuses having a dielectric injectorTOKYO ELECTRON LTD·Filed 2019·Granted Oct 19, 2021·0 cites·20 claims
- 3552US2025364211A1System and method for plasma processTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3651US11183398B2Ruthenium hard mask processTOKYO ELECTRON LTD·Filed 2019·Granted Nov 23, 2021·0 cites·21 claims
- 3751US9966239B2Non-ambipolar plasma enhanced DC/VHF phasorTOKYO ELECTRON LTD·Filed 2017·Granted May 8, 2018·0 cites·9 claims
- 3851US2025093572A1Backlight Module and Display DeviceFUZHOU BOE OPTOELECTRONICS TECH CO LTD·Filed 2022·Application pending·0 cites
- 3950US10388528B2Non-ambipolar electric pressure plasma uniformity controlTOKYO ELECTRON LTD·Filed 2016·Granted Aug 20, 2019·0 cites·20 claims
- 4049US9351367B2Dimmer compatible light emitting diode driverKONINKL PHILIPS NV·Filed 2013·Granted May 24, 2016·0 cites·15 claims
- 4147US11393662B2Apparatuses and methods for plasma processingTOKYO ELECTRON LTD·Filed 2019·Granted Jul 19, 2022·0 cites·21 claims
- 4245US11205562B2Hybrid electron beam and RF plasma system for controlled content of radicals and ionsTOKYO ELECTRON LTD·Filed 2018·Granted Dec 21, 2021·0 cites·21 claims
- 4345US9111873B2Low profile magnetic filterTOKYO ELECTRON LTD·Filed 2013·Granted Aug 18, 2015·0 cites·8 claims
- 4445US2014360670A1Processing system for non-ambipolar electron plasma (nep) treatment of a substrate with sheath potentialTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 4543US12014901B2Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasmaTOKYO ELECTRON LTD·Filed 2018·Granted Jun 18, 2024·0 cites·8 claims
- 4642US2014262040A1Method and system using plasma tuning rods for plasma processingTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 4738US11682452B2Local bit select with improved fast read before write suppressionIBM·Filed 2021·Granted Jun 20, 2023·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →