Inventor · disambiguated record
Zhengqing John Qi
Also filed as: QI ZHENGQING · QI ZHENGQING JOHN
7 granted patents·4 pending applications·2 citations·filing 2015–2025
74Inventor score
Top patents by PatentIndex Score
11 records- 0182US2025168977A1Scalable, Printable, Patterned Sheet Of High Mobility Graphene On Flexible SubstratesUNIV PENNSYLVANIA·Filed 2024·Application pending·0 cites
- 0276US10165679B2Scalable, printable, patterned sheet of high mobility graphene on flexible substratesUNIV PENNSYLVANIA·Filed 2017·Granted Dec 25, 2018·1 cites·22 claims
- 0376US2023337358A1Scalable, Printable, Patterned Sheet Of High Mobility Graphene On Flexible SubstratesUNIV PENNSYLVANIA·Filed 2022·Application pending·0 cites
- 0472US11546987B2Scalable, printable, patterned sheet of high mobility graphene on flexible substratesUNIV PENNSYLVANIA·Filed 2021·Granted Jan 3, 2023·0 cites·20 claims
- 0571US9930777B2Scalable, printable, patterned sheet of high mobility graphene on flexible substratesUNIV PENNSYLVANIA·Filed 2015·Granted Mar 27, 2018·1 cites·19 claims
- 0668US2020170108A1Scalable, Printable, Patterned Sheet Of High Mobility Graphene On Flexible SubstratesUNIV PENNSYLVANIA·Filed 2020·Application pending·0 cites
- 0760US2019116666A1Scalable, Printable, Patterned Sheet Of High Mobility Graphene On Flexible SubstratesUNIV PENNSYLVANIA·Filed 2018·Application pending·0 cites
- 0846US10332745B2Dummy assist features for pattern supportGLOBALFOUNDRIES INC·Filed 2017·Granted Jun 25, 2019·0 cites·17 claims
- 0946US9946152B2Extreme ultraviolet lithography photomasksGLOBALFOUNDRIES INC·Filed 2016·Granted Apr 17, 2018·0 cites·20 claims
- 1045US9791771B2Photomask structure with an etch stop layer that enables repairs of detected defects therein and extreme ultraviolet(EUV) photolithograpy methods using the photomask structureGLOBALFOUNDRIES INC·Filed 2016·Granted Oct 17, 2017·0 cites·20 claims
- 1142US12353802B1Model-based adaptive multi-aperture optical fiber coupling control system and methodJINLING INST TECHNOLOGY·Filed 2025·Granted Jul 8, 2025·0 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →