Inventor · disambiguated record
Zhifeng Sui
Also filed as: SUI ZHIFENG
11 granted patents·3 pending applications·906 citations·filing 1997–2025
92Inventor score
Files withAPPLIED MATERIALS INC5CRUSE JAMES P2APPLIED MATERIAL INC1SHENZHEN KUXIANG SHIDAI TECH CO LTD1VOLSTRIA INC1
Top patents by PatentIndex Score
14 records- 0198US8496756B2Methods for processing substrates in process systems having shared resourcesCRUSE JAMES P·Filed 2010·Granted Jul 30, 2013·518 cites·20 claims
- 0294US6829056B1Monitoring dimensions of features at different locations in the processing of substratesFiled 2003·Granted Dec 7, 2004·107 cites·19 claims
- 0391US6559942B2Monitoring substrate processing with optical emission and polarized reflected radiationAPPLIED MATERIALS INC·Filed 2001·Granted May 6, 2003·63 cites·21 claims
- 0490US6813534B2Endpoint detection in substrate fabrication processesFiled 2002·Granted Nov 2, 2004·54 cites·30 claims
- 0589US5995235ABandpass photon detectorAPPLIED MATERIALS INC·Filed 1997·Granted Nov 30, 1999·96 cites·12 claims
- 0688USD1083800SOutdoor battery chargerVOLSTRIA INC·Filed 2025·Granted Jul 15, 2025·3 cites·1 claims
- 0788US6594068B2High switching speed digital faraday rotator device and optical switches containing the sameFiled 2001·Granted Jul 15, 2003·40 cites·28 claims
- 0877US6831742B1Monitoring substrate processing using reflected radiationAPPLIED MATERIALS INC·Filed 2000·Granted Dec 14, 2004·17 cites·99 claims
- 0971US8721798B2Methods for processing substrates in process systems having shared resourcesCRUSE JAMES P·Filed 2010·Granted May 13, 2014·2 cites·16 claims
- 1057US6905624B2Interferometric endpoint detection in a substrate etching processAPPLIED MATERIALS INC·Filed 2003·Granted Jun 14, 2005·6 cites·11 claims
- 1139USD1094643SShower headSHENZHEN KUXIANG SHIDAI TECH CO LTD·Filed 2024·Granted Sep 23, 2025·0 cites·1 claims
- 1239US2013309785A1Rotational absorption spectra for semiconductor manufacturing process monitoring and controlAPPLIED MATERIAL INC·Filed 2013·Application pending·0 cites
- 1338US2010224322A1Endpoint detection for a reactor chamber using a remote plasma chamberAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1436US2002009254A1High switching speed digital faraday rotator device and optical switches reduced cross talk and state sensing capabilityFiled 2001·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Zhifeng Sui files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →