Inventor · disambiguated record
Ziyun Wang
Also filed as: WANG ZIYUN
41 granted patents·7 pending applications·477 citations·filing 2000–2024
98Inventor score
Top patents by PatentIndex Score
48 records- 0196US7910765B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2010·Granted Mar 22, 2011·19 cites·20 claims
- 0296US7887883B2Composition and method for low temperature deposition of silicon-containing filmsADVANCED TECH MATERIALS·Filed 2010·Granted Feb 15, 2011·23 cites·8 claims
- 0396US7863203B2Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the sameADVANCED TECH MATERIALS·Filed 2008·Granted Jan 4, 2011·19 cites·16 claims
- 0496US7786320B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2009·Granted Aug 31, 2010·29 cites·7 claims
- 0596US7713346B2Composition and method for low temperature deposition of silicon-containing filmsADVANCED TECH MATERIALS·Filed 2008·Granted May 11, 2010·31 cites·8 claims
- 0695US8802882B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsWANG ZIYUN·Filed 2010·Granted Aug 12, 2014·15 cites·20 claims
- 0795US8242032B2Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the sameWANG ZIYUN·Filed 2011·Granted Aug 14, 2012·7 cites·8 claims
- 0894US8236097B2Composition and method for low temperature deposition of silicon-containing filmsWANG ZIYUN·Filed 2011·Granted Aug 7, 2012·13 cites·5 claims
- 0994US7531679B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitrideADVANCED TECH MATERIALS·Filed 2002·Granted May 12, 2009·55 cites·22 claims
- 1093US9102693B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsENTEGRIS INC·Filed 2014·Granted Aug 11, 2015·8 cites·20 claims
- 1193US7781605B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsADVANCED TECH MATERIALS·Filed 2009·Granted Aug 24, 2010·14 cites·20 claims
- 1291US6440202B1Pyrazolate copper complexes, and MOCVD of copper using sameADVANCED TECH MATERIALS·Filed 2001·Granted Aug 27, 2002·22 cites·9 claims
- 1390US11002802B2Fault detection method for buck converter based on inverse kalman filterUNIV JIANGNAN·Filed 2020·Granted May 11, 2021·4 cites·4 claims
- 1490US8853075B2Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) processGATINEAU SATOKO·Filed 2009·Granted Oct 7, 2014·14 cites·20 claims
- 1590US6639080B2Pyrazolate copper complexes, and MOCVD of copper using sameADVANCED TECH MATERIALS·Filed 2002·Granted Oct 28, 2003·18 cites·10 claims
- 1689US7446217B2Composition and method for low temperature deposition of silicon-containing filmsADVANCED TECH MATERIALS·Filed 2003·Granted Nov 4, 2008·29 cites·31 claims
- 1788US7108771B2Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin filmsADVANCED TECH MATERIALS·Filed 2001·Granted Sep 19, 2006·24 cites·17 claims
- 1885US12299899B2Systems and methods for real-time state estimation of fast-moving objectsSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted May 13, 2025·2 cites·20 claims
- 1985US6623656B2Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using sameADVANCED TECH MATERIALS·Filed 2001·Granted Sep 23, 2003·28 cites·45 claims
- 2085US6417369B1Pyrazolate copper complexes, and MOCVD of copper using sameADVANCED TECH MATERIALS·Filed 2000·Granted Jul 9, 2002·26 cites·1 claims
- 2183US7579496B2Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the sameADVANCED TECH MATERIALS·Filed 2003·Granted Aug 25, 2009·16 cites·8 claims
- 2282US8859797B1Synthesis methods for carbosilanesAIR LIQUIDE ELECTRONICS US LP·Filed 2013·Granted Oct 14, 2014·3 cites·5 claims
- 2382US7601860B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsADVANCED TECH MATERIALS·Filed 2004·Granted Oct 13, 2009·17 cites·2 claims
- 2481US8541318B2Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the sameWANG ZIYUN·Filed 2012·Granted Sep 24, 2013·1 cites·20 claims
- 2581US8153833B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideWANG ZIYUN·Filed 2011·Granted Apr 10, 2012·3 cites·20 claims
- 2674US9783558B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsENTEGRIS INC·Filed 2015·Granted Oct 10, 2017·1 cites·20 claims
- 2774US7189571B1Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin filmsADVANCED TECH MATERIALS·Filed 2002·Granted Mar 13, 2007·6 cites·26 claims
- 2873US9085823B2Method of forming a tantalum-containing layer on a substrateBLASCO NICOLAS·Filed 2009·Granted Jul 21, 2015·2 cites·16 claims
- 2973US7084080B2Silicon source reagent compositions, and method of making and using same for microelectronic device structureADVANCED TECH MATERIALS·Filed 2002·Granted Aug 1, 2006·16 cites·26 claims
- 3071US8101788B2Silicon precursors and method for low temperature CVD of silicon-containing filmsWANG ZIYUN·Filed 2007·Granted Jan 24, 2012·1 cites·2 claims
- 3168US11542867B2Supersonic air intake passage capable of achieving synchronous adjustment of capturing area and throat areaUNIV NANJING AERONAUTICS & ASTRONAUTICS·Filed 2018·Granted Jan 3, 2023·2 cites·8 claims
- 3266US9073952B1Synthesis method for carbosilanesWAN ZHIWEN·Filed 2012·Granted Jul 7, 2015·1 cites·4 claims
- 3365US12467134B2Method for deposition of gallium-containing film with gallium precursorsAIR LIQUIDE·Filed 2022·Granted Nov 11, 2025·0 cites·20 claims
- 3462US11008351B2Methods for vapor deposition of group 4 transition metal-containing films using Group 4 transition metal-containing films forming compositionsAIR LIQUIDE·Filed 2017·Granted May 18, 2021·0 cites·13 claims
- 3561US6767830B2Br2SbCH3 a solid source ion implant and CVD precursorADVANCED TECH MATERIALS·Filed 2002·Granted Jul 27, 2004·8 cites·13 claims
- 3660US2024320441A1Natural Language Processing Dialog Methods and Systems for Virtual ScenesTENCENT TECH SHENZHEN CO LTD·Filed 2024·Application pending·0 cites
- 3758US2006235182A1Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin filmsXU CHONGYING·Filed 2006·Application pending·0 cites
- 3857US11380061B2Method and apparatus for three-dimensional (3D) object and surface reconstructionSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jul 5, 2022·0 cites·20 claims
- 3956US2009020140A1Non-flammable solvents for semiconductor applicationsAIR LIQUIDE ELECTRONICS US LP·Filed 2008·Application pending·0 cites
- 4055US11642787B2Trajectory generation of a robot using a neural networkSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 9, 2023·0 cites·11 claims
- 4155US8227358B2Silicon precursors and method for low temperature CVD of silicon-containing filmsWANG ZIYUN·Filed 2011·Granted Jul 24, 2012·0 cites·10 claims
- 4255US2012178267A1Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideWANG ZIYUN·Filed 2012·Application pending·0 cites
- 4350US7439318B2Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin filmsADVANCED TECH MATERIALS·Filed 2007·Granted Oct 21, 2008·0 cites·20 claims
- 4449US11650253B2State estimation method for power battery formation process based on convex space filteringUNIV JIANGNAN·Filed 2022·Granted May 16, 2023·0 cites·12 claims
- 4545US2006148271A1Silicon source reagent compositions, and method of making and using same for microelectronic device structureBOROVIK ALEXANDER S·Filed 2006·Application pending·0 cites
- 4644US2014322924A1Silicon containing compounds for ald deposition of metal silicate filmsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2014·Application pending·0 cites
- 4743US11802915B2Uncertain noisy filtering-based fault diagnosis method for power battery management systemUNIV JIANGNAN·Filed 2022·Granted Oct 31, 2023·0 cites·13 claims
- 4839US2006099831A1Silicon source reagent compositions, and method of making and using same for microelectronic device structureBOROVIK ALEXANDER S·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →