Inventor · disambiguated record
Zsolt Nenyei
Also filed as: NENYEI ZSOLT
14 granted patents·2 pending applications·566 citations·filing 1992–2012
94Inventor score
Top patents by PatentIndex Score
16 records- 0188US5841110AMethod and apparatus for improved temperature control in rapid thermal processing (RTP) systemsSTEAG AST GMBH·Filed 1997·Granted Nov 24, 1998·84 cites·11 claims
- 0287US5861609AMethod and apparatus for rapid thermal processingFiled 1995·Granted Jan 19, 1999·118 cites·13 claims
- 0386US8236706B2Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structuresPEUSE BRUCE W·Filed 2008·Granted Aug 7, 2012·14 cites·11 claims
- 0484US5628564AMethod and apparatus for wavevector selective pyrometry in rapid thermal processing systemsAST ELEKRONIK GMBH·Filed 1995·Granted May 13, 1997·98 cites·21 claims
- 0583US7977258B2Method and system for thermally processing a plurality of wafer-shaped objectsMATTSON TECH INC·Filed 2007·Granted Jul 12, 2011·11 cites·69 claims
- 0679US5872889AApparatus and method for rapid thermal processingSTEAG AST·Filed 1997·Granted Feb 16, 1999·54 cites·16 claims
- 0775US5837555AApparatus and method for rapid thermal processingAST ELECTRONIK·Filed 1996·Granted Nov 17, 1998·51 cites·22 claims
- 0873US5359693AMethod and apparatus for a rapid thermal processing of delicate componentsAST ELEKTRONIK GMBH·Filed 1992·Granted Oct 25, 1994·61 cites·30 claims
- 0969US7704898B2Method for the thermal treatment of disk-shaped substratesMATTSON TECH INC·Filed 2004·Granted Apr 27, 2010·15 cites·34 claims
- 1061US6830631B2Method for the removing of adsorbed molecules from a chamberSTEAG RTP SYSTEMS GMBH·Filed 2002·Granted Dec 14, 2004·8 cites·18 claims
- 1160US7101812B2Method of forming and/or modifying a dielectric film on a semiconductor surfaceMATTSON TECH INC·Filed 2003·Granted Sep 5, 2006·10 cites·33 claims
- 1258US5580830AModified reaction chamber and improved gas flushing method in rapid thermal processing apparatusAST ELEKRONIK·Filed 1995·Granted Dec 3, 1996·24 cites·23 claims
- 1357US6100149AMethod for rapid thermal processing (RTP) of silicon substratesSTEAG RTP SYSTEMS·Filed 1997·Granted Aug 8, 2000·17 cites·17 claims
- 1455US8575521B2Monitoring witness structures for temperature control in RTP systemsNENYEI ZSOLT·Filed 2008·Granted Nov 5, 2013·1 cites·3 claims
- 1545US2012298039A1Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structuresPEUSE BRUCE W·Filed 2012·Application pending·0 cites
- 1633US2007117413A1Process for the production of a nitrogenous layer a semiconductor or metal surfaceNENYEI ZSOLT·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →