Inventor · name-matched record
HISAMATSU TORU
2 granted patents·2 pending applications·0 citations·filing 2021–2024
25Inventor score
Files withTOKYO ELECTRON LTD4
This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.
Top patents by PatentIndex Score
4 records- 0171US12537159B2Etching method, plasma processing apparatus, and processing systemTOKYO ELECTRON LTD·Filed 2021·Granted Jan 27, 2026·0 cites·19 claims
- 0263US2026068612A1Methods to improve etch selectivity and critical dimension uniformity when etching high aspect ratio features within a hard mask layerTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0361US2026101689A1Method for plasma etching vertical features in a silicon-based semiconductor layer of a substrateTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0457US12532683B2Apparatus for substrate processingTOKYO ELECTRON LTD·Filed 2022·Granted Jan 20, 2026·0 cites·22 claims
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Identity basis: exact name match across USPTO filings. How scoring works →