Inventor · name-matched record
PAN YANG
3 granted patents·27 pending applications·0 citations·filing 2019–2025
45Inventor score
This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.
Top patents by PatentIndex Score
30 records- 0196US2026072349A1Photoresist development with halide chemistriesLAM RES CORP·Filed 2025·Application pending·0 cites
- 0286US12550660B2Plasma etching chemistries of high aspect ratio features in dielectricsLAM RES CORP·Filed 2024·Granted Feb 10, 2026·0 cites·20 claims
- 0382US2026038779A1Method for cleaning a chamberLAM RES CORP·Filed 2025·Application pending·0 cites
- 0470US2026085415A1System and Method for Delivering Liquid Precursor with a Constant Surface Level in a Ampoule to a Semiconductor Process ChamberPAN YANG·Filed 2024·Application pending·0 cites
- 0570US2026085410A1Vapor Delivery System Using In-situ Pressure Sensor for Semiconductor Process SystemPAN YANG·Filed 2024·Application pending·0 cites
- 0669US2026005031A1System and Method for Improving Atomic Layer Etching PerformancePAN YANG·Filed 2024·Application pending·0 cites
- 0768US2026101506A1Method and System for Enhancing Etch Efficiency in 3D NAND Using Silicon/Silicon-Germanium Stack ReplacementPAN YANG·Filed 2024·Application pending·0 cites
- 0868US2026023331A1AI-Driven Control Module for Real-Time Process Optimization in Semiconductor Process SystemsPAN YANG·Filed 2024·Application pending·0 cites
- 0967US2026079471A1System and Method for Reducing Latency of Process Recipe Execution in a Semiconductor Process SystemPAN YANG·Filed 2024·Application pending·0 cites
- 1067US2026036965A1System and Method for Controlling a Fleet of Semiconductor Process Systems Using Digital TwinsPAN YANG·Filed 2024·Application pending·0 cites
- 1167US2026093245A1AI-based System and Method for Optimizing Lot Dispatching in Semiconductor Fabrication Using Reinforcement Learning and Fab-wide Digital TwinPAN YANG·Filed 2024·Application pending·0 cites
- 1267US2026045463A1Data-Driven Method for Determining Resonant Frequencies in Plasma Process Systems with Multiple Plasma StatesPAN YANG·Filed 2024·Application pending·0 cites
- 1366US2026023351A1Autonomous Process Recipe Generation for Semiconductor Process Systems through Reinforcement Learning with Minimized Recipe TimePAN YANG·Filed 2024·Application pending·0 cites
- 1466US2026010142A1Autonomous Process Recipe Generation for Semiconductor Process Systems through Reinforcement LearningPAN YANG·Filed 2024·Application pending·0 cites
- 1565US2026100342A1Rapid Process Chamber Pressure Modulation Using Chamber Pressure Control Ring with Micro ShuttersPAN YANG·Filed 2024·Application pending·0 cites
- 1665US2026088251A1System and Method for Atomic Layer Etching with Uniformity Control MechanismsPAN YANG·Filed 2024·Application pending·0 cites
- 1764US2026051454A1Control System and Method for Ion Energy Distribution in Plasma Process Chambers Using Tailored Waveform GeneratorsPAN YANG·Filed 2024·Application pending·0 cites
- 1864US2026052920A1System and Method for Enhanced Atomic Layer Etching Process with a Single Process GasPAN YANG·Filed 2024·Application pending·0 cites
- 1964US2026066244A1Chamber with Grounded Ion Filter for Enhanced Atomic Layer Etching ProcessesPAN YANG·Filed 2024·Application pending·0 cites
- 2064US2026040863A1Enhanced Atomic Layer Etching Process with Optimized Gas Flow Control for Semiconductor ManufacturingPAN YANG·Filed 2024·Application pending·0 cites
- 2164US2026066245A1Atomic Layer Process Chamber for Optimal Etching and Deposition with Controlled Ion and Radical ExposurePAN YANG·Filed 2024·Application pending·0 cites
- 2264US2026074154A1Single Process Chamber for Dielectric Material Etching Using a Capacitively Coupled Plasma and Radical-Based Highly Selective EtchingPAN YANG·Filed 2024·Application pending·0 cites
- 2364US2026074153A1System and Method for Atomic Layer Etching and Radical-Based Highly Selective Etching in a Single Process ChamberPAN YANG·Filed 2024·Application pending·0 cites
- 2464US2026081124A1System and Method for Optimizing Operating Parameters for E to H-Mode Transitions in a Plasma Process ChamberPAN YANG·Filed 2024·Application pending·0 cites
- 2563US2026101724A1System and Method for Rapid Process Chamber Pressure Modulation Using an Array of Small Valves and PumpsPAN YANG·Filed 2024·Application pending·0 cites
- 2663US2026085411A1Vapor Delivery System Utilizing Light as a Heating Source for Semiconductor Processing SystemsPAN YANG·Filed 2024·Application pending·0 cites
- 2763US2026094789A1Simplified Gas Delivery System for Atomic Layer EtchingPAN YANG·Filed 2024·Application pending·0 cites
- 2858US2026017443A1System and Method for Autonomously Designing Process Systems for Semiconductor Manufacturing through Reinforcement LearningPAN YANG·Filed 2024·Application pending·0 cites
- 2952US12553283B2Shutter controllerWOAN TECH SHENZHEN CO LTD·Filed 2023·Granted Feb 17, 2026·0 cites·19 claims
- 3047US12550646B2Selectively etching for nanowiresLAM RES CORP·Filed 2019·Granted Feb 10, 2026·0 cites·14 claims
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Identity basis: exact name match across USPTO filings. How scoring works →