Inventor · name-matched record
PARK MINJOON
2 granted patents·5 pending applications·0 citations·filing 2022–2025
24Inventor score
Files withTOKYO ELECTRON LTD7
This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.
Top patents by PatentIndex Score
7 records- 0174US2026101692A1Multi level contact etchTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0263US2026068612A1Methods to improve etch selectivity and critical dimension uniformity when etching high aspect ratio features within a hard mask layerTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0360US2026036910A1Angled beam exposure for hardmask based modificationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0458US12563990B2Densification and reduction of selectively deposited Si protective layer for mask selectivity improvement in HAR etchingTOKYO ELECTRON LTD·Filed 2022·Granted Feb 24, 2026·0 cites·20 claims
- 0558US2026096401A1Mask modification methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0656US12526990B2Metal hardmasksTOKYO ELECTRON LTD·Filed 2022·Granted Jan 13, 2026·0 cites·20 claims
- 0753US2026045459A1In situ sidewall cleaning during plasma etch with metal-containing maskTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
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Identity basis: exact name match across USPTO filings. How scoring works →