Inventor · name-matched record
RAMASWAMY KARTIK
8 granted patents·10 pending applications·1 citations·filing 2021–2025
73Inventor score
This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.
Top patents by PatentIndex Score
18 records- 0192US12580155B2Learning based tuning in a radio frequency plasma processing chamberAPPLIED MATERIALS INC·Filed 2022·Granted Mar 17, 2026·1 cites·20 claims
- 0282US12555748B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2022·Granted Feb 17, 2026·0 cites·20 claims
- 0367US2026045447A1Balancing process kit area to wafer area within a processing chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0463US2026066225A1Multi-Mode Inductively Coupled PlasmaAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0563US2026066241A1Inductively coupled plasma chamber with electrically powered magnet ringAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0662US12586761B2Fast tuning radio frequency (RF) matching networkAPPLIED MATERIALS INC·Filed 2023·Granted Mar 24, 2026·0 cites·22 claims
- 0762US12573588B2Plasma processing system configured to deliver a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2024·Granted Mar 10, 2026·0 cites·20 claims
- 0862US12567539B2Methods for forming a high current inductor and non-transitory computer readable mediumAPPLIED MATERIALS INC·Filed 2021·Granted Mar 3, 2026·0 cites·14 claims
- 0962US2026058101A1Resonant multi-reactor remote plasma sourceAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1062US2026066233A1Multi-Spoke Shield for a Process ChamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1161US12567561B2High-power density RF remote plasma source apparatusAPPLIED MATERIALS INC·Filed 2022·Granted Mar 3, 2026·0 cites·18 claims
- 1261US2026100341A1Sheath and Temperature Control of Process KitAPPLIED MAT INC·Filed 2024·Application pending·0 cites
- 1360US2026052945A1Substrate-to-substrate bonding using electrostatic chucksAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1459US12562353B2Replaceable electrostatic chuck outer ring for edge arcing mitigationAPPLIED MATERIALS INC·Filed 2022·Granted Feb 24, 2026·0 cites·18 claims
- 1559US2026088792A1Electrical device line filterAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1659US2026013029A1Low-k rf rod for rf bias power deliveryAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1757US2026094787A1Pulsed voltage waveform with binary pulses for biasing of plasmaAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1853US12525433B2Method and apparatus to reduce feature charging in plasma processing chamberAPPLIED MATERIALS INC·Filed 2021·Granted Jan 13, 2026·0 cites·6 claims
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Identity basis: exact name match across USPTO filings. How scoring works →