P
US10253282B2ActiveUtilityPatentIndex 84

Cleaning formulation for removing residues on surfaces

Assignee: FUJIFILM ELECTRONIC MAT USA INCPriority: Dec 6, 2013Filed: Dec 21, 2016Granted: Apr 9, 2019
Est. expiryDec 6, 2033(~7.4 yrs left)· nominal 20-yr term from priority
Inventors:TAKAHASHI TOMONORIDU BINGWOJTCZAK WILLIAM ADORY THOMASKNEER EMIL A
H10P 76/204H10P 70/273H10P 70/234H10P 70/27H10P 50/287H10P 70/23C23G 1/18H10P 70/15C11D 3/0073C11D 7/3218C11D 7/5022C11D 7/3245C11D 7/3281H01L 21/0206H01L 21/02068H01L 21/02071H01L 21/0273H01L 21/02063C11D 11/0047H01L 21/31133C11D 2111/22
84
PatentIndex Score
6
Cited by
86
References
43
Claims

Abstract

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A cleaning composition, consisting of:
 1) at least one redox agent; 
 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 
 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 
 4) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 
 5) water; and 
 6) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. 
 
     
     
       2. The composition of  claim 1 , wherein the pH of the composition is between about 6 and about 11. 
     
     
       3. The composition of  claim 1 , wherein the at least one redox agent comprises hydroxylamine. 
     
     
       4. The composition of  claim 1 , wherein the at least one redox agent is from about 0.5% to about 20% by weight of the composition. 
     
     
       5. The composition of  claim 1 , wherein the polyaminopolycarboxylic acid is selected from the ground consisting of mono- or polyalkylene polyamine polycarboxylic acids, polyaminoalkane polycarboxylic acids, polyaminoalkanol polycarboxylic acids, and hydroxyalkylether polyamine polycarboxylic acids. 
     
     
       6. The composition of  claim 5 , wherein the polyaminopolycarboxylic acid is diethylenetriamine pentaacetic acid. 
     
     
       7. The composition of  claim 1 , wherein the polyaminopolycarboxylic acid is from about 0.01% to about 1% by weight of the composition. 
     
     
       8. The composition of  claim 1 , wherein the at least one metal corrosion inhibitor comprises a benzotriazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups. 
     
     
       9. The composition of  claim 8 , wherein the at least one metal corrosion inhibitor comprises 5-methylbenzotriazole. 
     
     
       10. The composition of  claim 1 , wherein the at least one metal corrosion inhibitor is from about 0.05% to about 1% by weight of the composition. 
     
     
       11. The composition of  claim 1 , wherein the at least one organic solvent comprises ethylene glycol butyl ether. 
     
     
       12. The composition of  claim 1 , wherein the at least one organic solvent is from about 1% to about 30% by weight of the composition. 
     
     
       13. The composition of  claim 1 , further comprising at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. 
     
     
       14. The composition of  claim 13 , wherein the at least one pH adjusting agent comprises 1,8-diazabicyclo[5.4.0]undec-7-ene. 
     
     
       15. The composition of  claim 13 , wherein the at least one pH adjusting agent is from about 0.1% to about 3% by weight of the composition. 
     
     
       16. The composition of  claim 1 , wherein the composition consists of hydroxylamine, diethylenetriamine pentaacetic acid, 5-methylbenzotriazole, 1,8-diazabicyclo[5.4.0]undec-7-ene, ethylene glycol butyl ether, and water. 
     
     
       17. A cleaning composition, comprising:
 1) at least one redox agent; 
 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 
 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 
 4) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 
 5) water; and 
 6) 1,8-diazabicyclo[5.4.0]undec-7-ene. 
 
     
     
       18. The composition of  claim 17 , wherein the pH of the composition is between about 6 and about 11. 
     
     
       19. The composition of  claim 17 , wherein the at least one redox agent comprises hydroxylamine. 
     
     
       20. The composition of  claim 17 , wherein the at least one redox agent is from about 0.5% to about 20% by weight of the composition. 
     
     
       21. The composition of  claim 17 , wherein the polyaminopolycarboxylic acid is selected from the ground consisting of mono- or polyalkylene polyamine polycarboxylic acids, polyaminoalkane polycarboxylic acids, polyaminoalkanol polycarboxylic acids, and hydroxyalkylether polyamine polycarboxylic acids. 
     
     
       22. The composition of  claim 21 , wherein the polyaminopolycarboxylic acid is diethylenetriamine pentaacetic acid. 
     
     
       23. The composition of  claim 17 , wherein the polyaminopolycarboxylic acid is from about 0.01% to about 1% by weight of the composition. 
     
     
       24. The composition of  claim 17 , wherein the at least one metal corrosion inhibitor comprises a benzotriazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups. 
     
     
       25. The composition of  claim 24 , wherein the at least one metal corrosion inhibitor comprises 5-methylbenzotriazole. 
     
     
       26. The composition of  claim 17 , wherein the at least one metal corrosion inhibitor is from about 0.05% to about 1% by weight of the composition. 
     
     
       27. The composition of  claim 17 , wherein the at least one organic solvent comprises ethylene glycol butyl ether. 
     
     
       28. The composition of  claim 17 , wherein the at least one organic solvent is from about 1% to about 30% by weight of the composition. 
     
     
       29. The composition of  claim 17 , wherein 1,8-diazabicyclo[5.4.0]undec-7-ene is from about 0.1% to about 3% by weight of the composition. 
     
     
       30. The composition of  claim 17 , wherein the composition comprises:
 from about 3% to about 10% by weight of hydroxylamine;
 from about 0.3% to about 0.7% by weight of diethylenetriamine pentaacetic acid; 
 
 from about 0.1% to about 0.5% by weight of 5-methylbenzotriazole; 
 from about 0.5% to about 1.5% by weight of 1,8-diazabicyclo[5.4.0]undec-7-ene; 
 from about 1% to about 15% by weight of ethylene glycol butyl ether; and 
 from about 85% to about 95% of the water. 
 
     
     
       31. A cleaning composition, comprising:
 1) hydroxylamine; 
 2) an imine, wherein the imine is 1,8-diazabicyclo[5.4.0]undec-7-ene or 1,5-diazabicyclo[4.3.0]-5-nonene; 
 3) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; and 
 4) water. 
 
     
     
       32. The composition of  claim 31 , wherein the pH of the composition is between about 6 and about 11. 
     
     
       33. The composition of  claim 31 , wherein the hydroxylamine is from about 0.5% to about 20% by weight of the composition. 
     
     
       34. The composition of  claim 31 , wherein the imine is 1,5-diazabicyclo[4.3.0]-5-nonene. 
     
     
       35. The composition of  claim 31 , wherein the imine is 1,8-diazabicyclo[5.4.0]undec-7-ene. 
     
     
       36. A cleaning composition, comprising:
 1) hydroxylamine; 
 2) an imine; 
 3) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; and 
 4) water; 
 wherein the imine is from about 0.1% to about 3% by weight of the composition. 
 
     
     
       37. The composition of  claim 31 , wherein the at least one organic solvent comprises a water soluble alcohol. 
     
     
       38. The composition of  claim 37 , wherein the water soluble alcohol is an alkane diol, a glycol, an alkoxyalcohol, a saturated aliphatic monohydric alcohol, an unsaturated non-aromatic monohydric alcohol, or an alcohol containing a ring structure. 
     
     
       39. A cleaning composition, comprising:
 1) hydroxylamine; 
 2) an imine; 
 3) at least one organic solvent comprising a water soluble alcohol; and 
 4) water; 
 wherein the water soluble alcohol is 2-methyl-1,3-propanediol, 1,3-propanediol, 2,2-dimethyl-1,3-propanediol, 1,4-butanediol, 1,3-butanediol, 1,2-butanediol, 2,3-butanediol, pinacol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol and tetraethyleneglycol, 3-methoxy-3-methyl-1-butanol, 3-methoxy-1-butanol, 1-methoxy-2-butanol, a water soluble glycol monoethers, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-propyl ether, ethylene glycol monoisopropyl ether, ethylene glycol mono n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutylether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monobutyl ether, 1-methoxy-2-propanol, 2-methoxy-1-propanol, 1-ethoxy-2-propanol, 2-ethoxy-1-propanol, propylene glycol mono-n-propyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, tripropylene glycol monoethyl ether, tripropylene glycol monomethyl ether, ethylene glycol monobenzyl ether, diethylene glycol monobenzyl ether, methanol, ethanol, n-propyl alcohol, isopropyl alcohol, 1-butanol, 2-butanol, isobutyl alcohol, tert-butyl alcohol, 2-pentanol, t-pentyl alcohol, 1-hexanol, allyl alcohol, propargyl alcohol, 2-butenyl alcohol, 3-butenyl alcohol, and 4-penten-2-ol, tetrahydrofurfuryl alcohol, furfuryl alcohol, or 1,3-cyclopentanediol. 
 
     
     
       40. The composition of  claim 31 , wherein the at least one organic solvent is from about 1% to about 30% by weight of the composition. 
     
     
       41. The composition of  claim 31 , wherein the composition comprises from about 78% to about 98% of the water. 
     
     
       42. The composition of  claim 31 , further comprising at least one additive. 
     
     
       43. The composition of  claim 31 , further comprising a surfactant.

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