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US10290490B2ActiveUtilityPatentIndex 51

Dust collecting apparatus, substrate processing system, and method of manufacturing semiconductor device

Assignee: TOSHIBA MEMORY CORPPriority: Feb 25, 2016Filed: Aug 17, 2016Granted: May 14, 2019
Est. expiryFeb 25, 2036(~9.6 yrs left)· nominal 20-yr term from priority
Inventors:SUGITA TOMOHIKOIIMORI HIROYASUOGAWA YOSHIHIRO
H10P 72/0414H10P 72/7618H10P 72/0402H10P 70/20B01D 49/006B08B 3/12H01L 21/67051H01L 21/68764B01D 51/08B01D 21/283H01L 21/67017B01D 43/00H01L 21/02057
51
PatentIndex Score
0
Cited by
26
References
17
Claims

Abstract

In one embodiment, a dust collecting apparatus includes a container configured to contain a fluid that includes particles to be collected. The apparatus further includes one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node. The one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container. The predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.

Claims

exact text as granted — not AI-modified
The invention claimed is: 
     
       1. A dust collecting apparatus comprising:
 a container configured to contain a fluid that includes particles to be collected; and 
 one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node, 
 wherein 
 the one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container, 
 the predetermined portion is formed of a wall material, protective film or coating film that prevents the particles from leaving from the node located in a vicinity of the predetermined portion, and 
 a shape of the node is a point, a closed curve, a closed surface, an open curve that includes an end portion on the predetermined portion, or an open surface that includes an end portion on the predetermined portion. 
 
     
     
       2. The apparatus of  claim 1 , wherein the container comprises an introduction port configured to introduce the fluid into the container, and a discharge port configured to discharge, from the container, the fluid in which the particles are concentrated or reduced by the trapping. 
     
     
       3. The apparatus of  claim 1 , wherein
 the container comprises a pair of opposed first wall faces, a pair of opposed second wall faces, and a pair of opposed third wall faces, and 
 the sound sources include at least one first sound source provided in a vicinity of the first wall faces, at least one second sound source provided in a vicinity of the second wall faces, and at least one third sound source provided in a vicinity of the third wall faces. 
 
     
     
       4. The apparatus of  claim 3 , wherein at least any one among one of the pair of first wall faces, one of the pair of second wall faces, and one of the pair of third wall faces is formed as a reflector that reflects a sound wave from the sound sources. 
     
     
       5. The apparatus of  claim 3 , wherein at least any one of the first, second and third sound sources is provided in a vicinity of both of the pair of first wall faces, both of the pair of second wall faces, or both of the pair of third wall faces. 
     
     
       6. The apparatus of  claim 1 , wherein
 the container comprises a pair of opposed first wall faces, and a second wall face having a cylindrical shape, and 
 the sound sources include at least one first sound source provided in a vicinity of the first wall faces, and at least one second sound source provided in a vicinity of the second wall face. 
 
     
     
       7. The apparatus of  claim 6 , wherein one of the pair of first wall faces is formed as a reflector that reflects a sound wave from the sound sources. 
     
     
       8. The apparatus of  claim 6 , wherein the at least one first sound source is provided in a vicinity of both of the pair of first wall faces. 
     
     
       9. The apparatus of  claim 1 , wherein
 the container comprises a first wall face having a spherical shape, and 
 the sound sources include at least one first sound source provided in a vicinity of the first wall face. 
 
     
     
       10. The apparatus of  claim 9 , wherein
 the container comprises an introduction port configured to introduce the fluid into the container, and a discharge port configured to discharge the fluid from the container, and 
 a distance between the introduction port and a center of the spherical shape is different from a distance between the discharge port and the center of the spherical shape. 
 
     
     
       11. The apparatus of  claim 9 , wherein
 the container comprises an introduction port configured to introduce the fluid into the container, and a discharge port configured to discharges the fluid from the container, and 
 the introduction port and the discharge port are provided at positions such that the particles from the introduction port are unable to reach the discharge port without passing through the node. 
 
     
     
       12. The apparatus of  claim 1 , wherein
 the container comprises a pair of opposed first wall faces, a pair of opposed second wall faces, and a pair of opposed third wall faces, 
 the sound sources are provided in a vicinity of one pair or two pairs of wall faces among the pair of first wall faces, the pair of second wall faces and the pair of third wall faces, and 
 the predetermined portion is provided on remaining one pair or two pairs of wall faces among the pair of first wall faces, the pair of second wall faces and the pair of third wall faces. 
 
     
     
       13. The apparatus of  claim 12 , wherein
 the container comprises an introduction port configured to introduce the fluid into the container, and a discharge port configured to discharge the fluid from the container, 
 the introduction port and the discharge port are provided on the first wall faces, and 
 the predetermined portion is provided on the second or third wall faces. 
 
     
     
       14. The apparatus of  claim 1 , wherein
 the container comprises a pair of opposed first wall faces, and a second wall face having a cylindrical shape, 
 the sound sources are provided in a vicinity of the first wall faces, and 
 the predetermined portion is provided in a vicinity of the second wall face. 
 
     
     
       15. A substrate processing system comprising:
 a container configured to contain a fluid that includes particles to be collected; 
 one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node; and 
 a substrate processing apparatus configured to process a substrate with the fluid discharged from the container, 
 wherein 
 the one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container, 
 the predetermined portion is formed of a wall material, protective film or coating film that prevents the particles from leaving from the node located in a vicinity of the predetermined portion, and 
 a shape of the node is a point, a closed curve, a closed surface, an open curve that includes an end portion on the predetermined portion, or an open surface that includes an end portion on the predetermined portion. 
 
     
     
       16. The system of  claim 15 , wherein
 the container is configured to discharge, to a first channel, the fluid in which the particles are concentrated by the trapping and to discharge, to a second channel, the fluid in which the particles are reduced by the trapping, and 
 the substrate processing apparatus is configured to process the substrate with the fluid from the second channel. 
 
     
     
       17. The system of  claim 15 , wherein the substrate processing apparatus is configured to clean or rinse the substrate with the fluid.

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