US10593639B2ActiveUtilityA1

Metal pad modification

63
Assignee: IBMPriority: Jun 28, 2017Filed: Apr 22, 2019Granted: Mar 17, 2020
Est. expiryJun 28, 2037(~11 yrs left)· nominal 20-yr term from priority
H01L 2224/13166H01L 2224/05147H01L 2224/11462H01L 2924/35121H01L 2924/01013H01L 2224/05555H01L 2224/05027H01L 2924/00014H01L 2224/05025H01L 2224/81815H01L 2224/10126H01L 2224/13139H01L 2924/01029H01L 2224/13116H01L 2224/13014H01L 2224/05015H01L 2224/05644H01L 2224/05647H01L 2924/04953H01L 2224/13144H01L 2224/05552H01L 2224/05144H01L 24/05H01L 2224/05012H01L 2924/014H01L 2224/05572H01L 2224/13147H01L 2224/03462H01L 2224/05124H01L 2224/13082H01L 2224/13113H01L 2224/056H01L 2224/0401H01L 2224/03464H01L 2224/05686H01L 2224/13186H01L 2224/05624H01L 2924/013H01L 2224/11464H01L 2924/3512H01L 24/13H01L 2224/13027H01L 2924/01014H01L 2224/0557H01L 2224/13124H10W 72/9415H10W 72/07236H10W 72/01935H10W 72/01235H10W 72/953H10W 72/952H10W 72/942H10W 72/932H10W 72/923H10W 72/283H10W 72/253H10W 72/252H10W 72/244H10W 72/232H10W 72/222H10W 72/29H10W 72/90H10W 72/20
63
PatentIndex Score
0
Cited by
31
References
1
Claims

Abstract

The present invention provides a structure. In an exemplary embodiment, the structure includes a base material, at least one metal pad, where a first surface of the metal pad is in contact with the base material, and a metal pedestal, where the metal pedestal is in contact with the metal pad, where a radial alignment of the metal pad is shifted by an offset distance, with respect to the metal pedestal, such that the metal pad is shifted towards a center axis of the base material, where a first dimension of the metal pad is smaller than a second dimension of the metal pad, where the second dimension is orthogonal to a line running from a center of the metal pad to the center axis of the base material, where the first dimension is parallel to the line.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A structure comprising:
 a base material; 
 at least one metal pad,
 wherein a first surface of the metal pad is in contact with a surface of the base material, 
 wherein the metal pad is deposited within the base material; 
 
 a metal pedestal,
 wherein a first surface of the metal pedestal is in contact with a second surface of the metal pad, 
 wherein a radial alignment of the metal pad is shifted by an offset distance, with respect to the metal pedestal, such that the metal pad is shifted towards a center axis of the base material,
 wherein the offset distance ranges from 0 μm to 20 μm, 
 
 wherein a first dimension of the metal pad is smaller than a second dimension of the metal pad, 
 wherein the second dimension is orthogonal to a line running from a center of the metal pad to the center axis of the base material, 
 wherein the first dimension is parallel to the line running from the center of the metal pad to the center axis of the base material, 
 wherein an aspect ratio of the second dimension to the first dimension is greater than 1:1 and less than 2:1; and 
 
 a solder bump in contact with a second surface of the metal pedestal; 
 a passivation layer between the metal pedestal and the metal pad with a via in the passivation layer,
 wherein the metal pedestal contacts the metal pad through the via in the passivation layer, 
 wherein the metal pedestal is deposited on the passivation layer and the second surface of the metal pad, 
 wherein the passivation layer has a thickness ranging from 0 μm to 20 μm.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.