Substrate processing apparatus

Abstract

A substrate processing apparatus includes a base portion 1541 that is disposed in a manner of being adjacent to a chamber; a hand 155 that holds a substrate S; an arm 1542 that is attached to the base portion 1541, supports the hand, and moves the hand forward and rearward by horizontally moving the hand with respect to the base portion; and a cover portion 156 that accommodates the hand in an internal space. The cover portion has a cover main body 1561 forming the internal space and an extending member 1562 having a hollow structure which penetrates the cover portion in a horizontal direction and of which one end serves as an opening 1562a and being engaged with the cover main body in a state of being movable in the horizontal direction while the opening communicates with the internal space.

What is claimed is: 
     
       1. A substrate processing apparatus for transferring a substrate in which a liquid film is formed on an upper surface, the substrate processing apparatus comprising:
 a chamber; 
 a base portion that is adjacent to the chamber; 
 a hand that holds the substrate; 
 an arm that is attached to the base portion and is capable of moving the hand forward and rearward with respect to the chamber by moving the hand in a horizontal direction with respect to the base portion; and 
 a cover portion that has an internal space capable of accommodating the hand for holding the substrate and has an opening through which the hand moving forward and rearward in accordance with the arm passes on a side portion, 
 wherein the cover portion has a cover main body forming the internal space and an extending member having a hollow structure which penetrates the cover portion in the horizontal direction and of which one end serves as the opening and being engaged with the cover main body in a state of being movable in the horizontal direction while the opening communicates with the internal space, and 
 wherein the arm causes the hand to enter the chamber from the internal space via the opening in a state in which the extending member has moved forward to the chamber side. 
 
     
     
       2. The substrate processing apparatus according to  claim 1  further comprising:
 a swiveling mechanism that integrally swivels the arm and the cover main body with respect to the base portion. 
 
     
     
       3. The substrate processing apparatus according to  claim 1 ,
 wherein a tip portion of the extending member has a shape for being engaged with a side wall of the chamber. 
 
     
     
       4. The substrate processing apparatus according to  claim 1 ,
 wherein the cover main body is capable of storing a liquid in a bottom portion of the internal space. 
 
     
     
       5. The substrate processing apparatus according to  claim 1 ,
 wherein the extending member extends to the outside from the inside of the internal space of the cover main body. 
 
     
     
       6. The substrate processing apparatus according to  claim 1  further comprising:
 a negative pressure supply unit that supplies a negative pressure to the internal space. 
 
     
     
       7. The substrate processing apparatus according to  claim 1  further comprising:
 a control unit that 
 causes the arm to move the hand forward and rearward between an internal position inside the chamber which the hand enters and an external position at which the hand is outside the chamber, and 
 causes the extending member to move horizontally between a forward movement position which is moved forward to the chamber side and a rearward movement position which is moved rearward to the cover main body side from the forward movement position. 
 
     
     
       8. The substrate processing apparatus according to  claim 1 ,
 wherein the arm and the cover main body integrally move with respect to the base portion in a state in which the extending member has retreated to the cover main body side. 
 
     
     
       9. The substrate processing apparatus according to  claim 1  further comprising:
 a first chamber and a second chamber that serve as the chamber, 
 wherein the substrate having the liquid film formed thereon is transferred from the first chamber to the second chamber. 
 
     
     
       10. The substrate processing apparatus according to  claim 9 ,
 wherein processing of forming a liquid film on an upper surface of a substrate in a horizontal posture is executed inside the first chamber, and the second chamber receives the substrate having the liquid film formed thereon. 
 
     
     
       11. The substrate processing apparatus according to  claim 9 ,
 wherein in each of the first chamber and the second chamber, a reception port for receiving entry of the hand is provided in a side wall facing the base portion, and a tip portion of the extending member has a shape for being engaged with the reception port. 
 
     
     
       12. The substrate processing apparatus according to  claim 11 ,
 wherein the arm executes forward and rearward movement of the hand via the opening in a state in which the extending member and the reception port are engaged with each other. 
 
     
     
       13. The substrate processing apparatus according to  claim 11 ,
 wherein the arm carries out the substrate from the first chamber in a state in which the extending member and the reception port of the first chamber are engaged with each other. 
 
     
     
       14. The substrate processing apparatus according to  claim 11 ,
 wherein the arm carries the substrate into the second chamber in a state in which the extending member and the reception port of the second chamber are engaged with each other. 
 
     
     
       15. The substrate processing apparatus according to  claim 9 ,
 wherein the liquid film is formed on the substrate using an organic solvent in the first chamber, and the substrate is processed using a supercritical fluid in the second chamber.