US11562924B2ActiveUtilityA1

Planarization apparatus, planarization process, and method of manufacturing an article

88
Assignee: CANON KKPriority: Jan 31, 2020Filed: Jan 31, 2020Granted: Jan 24, 2023
Est. expiryJan 31, 2040(~13.6 yrs left)· nominal 20-yr term from priority
H01L 21/67253H01L 21/7684H01L 21/32115H10P 72/0604H10P 95/04H10W 20/062H10P 95/08H10P 72/0428H10D 64/01326G03F 7/0002
88
PatentIndex Score
2
Cited by
9
References
8
Claims

Abstract

A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. An apparatus, comprising:
 a chuck comprising a plurality of lands defining a central zone and a peripheral zone surrounding the central zone; and 
 a superstrate including:
 a body having an edge; 
 a first side having:
 a mesa extending therefrom, wherein an edge of the mesa is at a radial width from the edge of the body; 
 a contact surface provided on the mesa to be in contact with a formable material formed on a substrate; and 
 
 a second side opposite to the first side having a central portion and a peripheral portion surrounding the central portion, the peripheral portion including a recessed region, 
 
 wherein the second side is in contact with the lands of the chuck while being retained thereby. 
 
     
     
       2. The apparatus of  claim 1 , wherein recessed region is concentric with the body. 
     
     
       3. The apparatus of  claim 1 , wherein the recessed region includes a stepped down surface extending circumferentially throughout the peripheral portion of the second side. 
     
     
       4. The apparatus of  claim 1 , wherein the recessed region includes a tapered down surface extending circumferentially throughout the peripheral portion of the second side. 
     
     
       5. The apparatus of  claim 1 , wherein the recessed region of the second side has a radial width wider than the radial width from the edge of the mesa to the edge of the body. 
     
     
       6. The apparatus of  claim 1 , wherein the recessed region of the second side has a radial width equal to the radial width from the edge of the mesa to the edge of the body. 
     
     
       7. The apparatus of  claim 1 , wherein the recessed region further comprises a trench extending circumferentially between the central portion and an edge of the second side. 
     
     
       8. The apparatus of  claim 1 , wherein the lands of the chuck have a same height.

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