US11562924B2ActiveUtilityA1
Planarization apparatus, planarization process, and method of manufacturing an article
Est. expiryJan 31, 2040(~13.6 yrs left)· nominal 20-yr term from priority
H01L 21/67253H01L 21/7684H01L 21/32115H10P 72/0604H10P 95/04H10W 20/062H10P 95/08H10P 72/0428H10D 64/01326G03F 7/0002
88
PatentIndex Score
2
Cited by
9
References
8
Claims
Abstract
A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. An apparatus, comprising:
a chuck comprising a plurality of lands defining a central zone and a peripheral zone surrounding the central zone; and
a superstrate including:
a body having an edge;
a first side having:
a mesa extending therefrom, wherein an edge of the mesa is at a radial width from the edge of the body;
a contact surface provided on the mesa to be in contact with a formable material formed on a substrate; and
a second side opposite to the first side having a central portion and a peripheral portion surrounding the central portion, the peripheral portion including a recessed region,
wherein the second side is in contact with the lands of the chuck while being retained thereby.
2. The apparatus of claim 1 , wherein recessed region is concentric with the body.
3. The apparatus of claim 1 , wherein the recessed region includes a stepped down surface extending circumferentially throughout the peripheral portion of the second side.
4. The apparatus of claim 1 , wherein the recessed region includes a tapered down surface extending circumferentially throughout the peripheral portion of the second side.
5. The apparatus of claim 1 , wherein the recessed region of the second side has a radial width wider than the radial width from the edge of the mesa to the edge of the body.
6. The apparatus of claim 1 , wherein the recessed region of the second side has a radial width equal to the radial width from the edge of the mesa to the edge of the body.
7. The apparatus of claim 1 , wherein the recessed region further comprises a trench extending circumferentially between the central portion and an edge of the second side.
8. The apparatus of claim 1 , wherein the lands of the chuck have a same height.Cited by (0)
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References (0)
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