Particle remover and method

Abstract

A device for removing particles in a gas stream includes a first cylindrical portion configured to receive the gas stream containing a target gas and the particles, a rotatable device disposed within the first cylindrical portion and configured to generate a centrifugal force when in a rotational action to divert the particles away from the rotatable device, a second cylindrical portion coupled to the first cylindrical portion and configured to receive the target gas, and a third cylindrical portion coupled to the first cylindrical portion and surrounding the second cylindrical portion, the third cylindrical portion being configured to receive the diverted particles.

What is claimed is: 
     
       1. A method of delivering a gas stream to a reaction chamber of a wafer process system, the method comprising:
 providing a particle remover configured to receive the gas stream containing a target gas and unwanted particles, the gas stream being generated from a precursor source of a wafer process system, wherein the particle remover comprises a rotatable shaft and a plurality of staggered blades disposed on a surface of the rotatable shaft; 
 rotating the rotatable shaft to generate a centrifugal force to drive the unwanted particles away from the rotatable shaft; and 
 diverting the unwanted particles to a side pathway while moving the target gas toward a main pathway coupled to the reaction chamber of the wafer process system. 
 
     
     
       2. The method of  claim 1 , further comprising collecting the unwanted particles in a collection reservoir. 
     
     
       3. The method of  claim 1 , wherein the particle remover comprises:
 a first cylindrical portion for receiving the gas stream; 
 a second cylindrical portion coupled to the first cylindrical portion; and 
 a third cylindrical portion coupled to the first cylindrical portion and surrounding the second cylindrical portion; and 
 wherein the rotatable shaft is disposed within the first cylindrical portion. 
 
     
     
       4. The method of  claim 3 , wherein the side pathway is disposed in the third cylindrical portion, and the main pathway is disposed in the second cylindrical portion. 
     
     
       5. The method of  claim 3 , wherein the first, second, and third cylindrical portions are disposed along a longitudinal center axis, and the rotation shaft is configured to rotate around the longitudinal center axis. 
     
     
       6. A method of delivering a gas stream to a reaction chamber of a wafer process system, the method comprising:
 providing a gas stream generated from a precursor source of a wafer process system; and 
 providing a particle remover disposed between the precursor source and the reaction chamber, the particle remover comprising a first cylindrical portion, a rotatable device disposed within the first cylindrical portion, a second cylindrical portion coupled to the first cylindrical portion, and a third cylindrical portion coupled to the first cylindrical portion and surrounding the second cylindrical portion; and, wherein the method further comprises: 
 receiving the gas stream containing a target gas and particles through the first cylindrical portion; 
 generating, through the rotatable device, a centrifugal force when in a rotational action to divert the particles away from the rotatable device; 
 receiving the target gas, through the second cylindrical portion, to be delivered to the reaction chamber of the wafer process system; and 
 receiving the particles through the third cylindrical portion. 
 
     
     
       7. The method of  claim 6 , wherein the rotatable device comprises:
 a rotatable shaft arranged in an elongated direction of the first cylindrical portion; 
 a plurality of staggered blades disposed on a surface of the rotation shaft; and 
 an electric motor coupled to the rotatable shaft; and, wherein the method further comprises: 
 rotating, through the electric motor, the rotatable shaft when the first cylindrical portion receives the gas stream. 
 
     
     
       8. The method of  claim 7 , wherein the plurality of staggered blades are arranged at an angle not perpendicular to the surface of the rotation shaft. 
     
     
       9. The method of  claim 6 , wherein the rotatable device is disposed externally to the second cylindrical portion and the third cylindrical portion. 
     
     
       10. The method of  claim 6 , wherein the particle remover further comprises a plurality of support connections configured to couple a portion of the second cylindrical portion to an inner wall of the first cylindrical portion in a spoke structure. 
     
     
       11. The method of  claim 6 , wherein the first, second, and third cylindrical portions have a same longitudinal center axis. 
     
     
       12. The method of  claim 6 , wherein a cross-sectional area of the first cylindrical portion is equal to or greater than a cross-sectional area of the second cylindrical portion, and a cross-sectional area of the third cylindrical portion is greater than a cross-sectional area of the first cylindrical portion. 
     
     
       13. A method for gas stream delivery in a wafer process system, the method comprising:
 coupling an inlet port of a particle remover to a precursor source of the wafer process system; 
 coupling an outlet port of the particle remover to a reaction chamber of the wafer process system; 
 providing a gas stream generated from the precursor source of the wafer process system, wherein the gas stream contains a target gas and unwanted particles; 
 generating a centrifugal force to drive the unwanted particles away from a rotatable shaft of the particle remover; and 
 diverting the unwanted particles to a side pathway while moving the target gas toward the outlet port coupled to reaction chamber of the wafer process system. 
 
     
     
       14. The method of  claim 13 , wherein generating the centrifugal force comprises:
 rotating the rotatable shaft. 
 
     
     
       15. The method of  claim 14 , wherein the particle remover further comprises:
 a plurality of blades disposed on a surface of the rotatable shaft. 
 
     
     
       16. The method of  claim 15 , wherein the plurality of blades are a plurality of staggered blades. 
     
     
       17. The method of  claim 15 , wherein the plurality of blades are arranged at an angle not perpendicular to the surface of the rotatable shaft. 
     
     
       18. The method of  claim 13 , further comprising:
 collecting the unwanted particles in a collection reservoir. 
 
     
     
       19. The method of  claim 13 , wherein the inlet port comprises a first cylindrical portion, the outlet port comprises a second cylindrical portion, and the particle remover further comprises a third cylindrical portion coupled to the first cylindrical portion and surrounding the second cylindrical portion. 
     
     
       20. The method of  claim 19 , wherein the side pathway is disposed in the third cylindrical portion.