P
US12497696B2ActiveUtilityPatentIndex 52

Gas supply structure and substrate processing apparatus

Assignee: KOKUSAI ELECTRIC CORPPriority: Mar 20, 2019Filed: Jul 19, 2021Granted: Dec 16, 2025
Est. expiryMar 20, 2039(~12.7 yrs left)· nominal 20-yr term from priority
Inventors:KURATA TOMOYUKIMORITA SHINYAHIRANO ATSUSHIMURATA SATORUOKADA HIROMI
H10P 14/60C23C 16/45563C23C 16/45578
52
PatentIndex Score
0
Cited by
23
References
14
Claims

Abstract

A gas supply structure capable of suppressing damage to a structure provided in a reaction tube and made of the non-metallic material such as quartz includes: a gas supply nozzle through which a process gas is supplied into a process chamber in a reaction tube via an opening; a first seal provided so as to cover at least a gap between the opening of the reaction tube and the gas supply nozzle; a holder connected to the gas supply nozzle so as to provide a gap between the gas supply nozzle and the holder; an adapter connected to the holder; a first fixing structure configured to hold the holder and the adapter; and a second seal provided so as to cover at least a gap between the gas supply nozzle and the adapter and maintain a space between the gas supply nozzle and the adapter in an airtight state.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A gas supply structure comprising:
 a gas supply nozzle made of quartz through which a process gas is supplied into a process chamber provided in a reaction tube made of quartz via an opening of the reaction tube;   a first seal made of resin that covers at least a first gap between the opening of the reaction tube and the gas supply nozzle;   a retainer made of metal, installed radially more outward than an outer peripheral surface of the reaction tube and connected to the gas supply nozzle so as to provide a gap between the gas supply nozzle and the retainer;   a cushioning structure made of non-metal material and provided between the retainer and the reaction tube;   a ring adapter installed radially more outward than the outer peripheral surface of the reaction tube and connected to the retainer;   a first fixing structure configured to hold the retainer and the ring adapter;   a second seal that covers at least a second gap between the gas supply nozzle and the ring adapter and maintains a space between the gas supply nozzle and the ring adapter in an airtight state; and   a third fixing structure configured to fix the first fixing structure in a predetermined posture,   wherein, in a state where the third fixing structure is fixed to the reaction tube, the gas supply nozzle protruding outward from the opening of the reaction tube is connected with the first seal, the retainer, the second seal, the first fixing structure and the ring adapter arranged in afore listed order; wherein an upper end of the first fixing structure is provided with a push bolt and a pull bolt, and an angle or orientation of the first fixing structure is adjustable by adjusting the push bolt and the pull bolt.   
     
     
         2 . The gas supply structure of  claim 1 , wherein the gas supply nozzle and the reaction tube are connected with each other via the first seal so as to maintain the opening in an airtight state. 
     
     
         3 . The gas supply structure of  claim 1 , wherein the second seal is made of resin. 
     
     
         4 . The gas supply structure of  claim 3 , wherein the cushioning structure is made of fluororesin. 
     
     
         5 . The gas supply structure of  claim 1 , further comprising a second fixing structure configured to press the ring adapter toward the reaction tube so as to close the opening. 
     
     
         6 . The gas supply structure of  claim 1 , wherein the first seal is configured to prevent the gas supply nozzle from contacting the reaction tube. 
     
     
         7 . The gas supply structure of  claim 1 , wherein the second seal is configured to prevent the gas supply nozzle from contacting the retainer. 
     
     
         8 . The gas supply structure of  claim 1 , wherein the second seal is configured to be capable of covering the gap between the gas supply nozzle and the retainer. 
     
     
         9 . The gas supply structure of  claim 1 , wherein the first fixing structure is configured such that the opening, the retainer and the ring adapter are arranged concentrically. 
     
     
         10 . The gas supply structure of  claim 1 , wherein an upstream end of the gas supply nozzle is arranged so as to protrude to an outside of the reaction tube through the opening. 
     
     
         11 . The gas supply structure of  claim 1 , wherein an upstream end of the gas supply nozzle is arranged so as to be connected to the gas supply nozzle in an airtight state through the ring adapter. 
     
     
         12 . The gas supply structure of  claim 1 , further comprising a heater provided between the third fixing structure and the reaction tube, wherein the heater is configured to be capable of heating at least one among the gas supply nozzle, the reaction tube and the ring adapter. 
     
     
         13 . The gas supply structure of  claim 1 , wherein a lower end of the first fixing structure is fixed to the third fixing structure by a fastening bolt. 
     
     
         14 . A substrate processing apparatus comprising:
 a reaction tube made of quartz in which a process chamber is provided, wherein a substrate is processed in the process chamber; and   a gas supply structure comprising:   a gas supply nozzle through which a process gas is supplied into the process chamber via an opening of the reaction tube made of quartz;   a first seal made of resin that covers at least a gap between the opening of the reaction tube and the gas supply nozzle;   a retainer made of metal, installed radially more outward than an outer peripheral surface of the reaction tube and connected to the gas supply nozzle so as to provide a first gap between the gas supply nozzle and the retainer;   a cushioning structure made of non-metal material and provided between the retainer and the reaction tube;   a ring adapter installed radially more outward than an outer peripheral surface of the reaction tube and connected to the retainer;   a first fixing structure configured to hold the retainer and the ring adapter;   a second seal that covers at least a second gap between the gas supply nozzle and the ring adapter and maintains a space between the gas supply nozzle and the ring adapter in an airtight state; and   a third fixing structure configured to fix the first fixing structure in a predetermined posture,   wherein, in a state where the third fixing structure is fixed to the reaction tube, the gas supply nozzle protruding outward from the opening of the reaction tube is connected with the first seal, the retainer, the second seal, the first fixing structure and the ring adapter arranged in aforelisted order; wherein an upper end of the first fixing structure is provided with a push bolt and a pull bolt, and an angle or orientation of the first fixing structure is adjustable by adjusting the push bolt and the pull bolt.

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