Substrate cleaning device, substrate processing device, and maintenance method for substrate cleaning device

Abstract

A substrate cleaning device ( 31 ) includes a roll cleaning member ( 61 ) and a rotation holding portion ( 100 ). The rotation holding portion ( 100 ) includes a non-contact sealing portion ( 140 ) that is disposed between a bearing portion ( 130 ) and the roll cleaning member ( 61 ) to seal a gap between a shaft portion ( 110 ) and a housing portion ( 120 ). The non-contact sealing portion ( 140 ) includes a rotating portion ( 150 ) that is attached to the shaft portion ( 110 ) and has a plurality of protrusion portions ( 151 ) formed on a peripheral surface ( 150 a ) of the rotating portion ( 150 ) at intervals in an axial direction, and a fixed portion ( 160 ) that is attached to the housing portion ( 120 ), surrounds the plurality of protrusion portions ( 151 ), and has a gas supply hole ( 161 ) formed in an inner peripheral surface ( 160 a ) of the fixed portion ( 160 ) surrounding the plurality of protrusion portions ( 151 ), the gas supply hole ( 161 ) supplying a compressed gas ( 200 ) from a position inward of the protrusion portions ( 151 ) in the axial direction, which are disposed at both end portions in the axial direction, among the plurality of protrusion portions ( 151 ).

The invention claimed is: 
     
         1 . A substrate cleaning device comprising:
 a roll cleaning member configured to scrub a substrate; and   a rotation holding portion configured to hold an end portion of the roll cleaning member in an axial direction,   wherein the rotation holding portion includes   a shaft portion configured to be connected to the end portion of the roll cleaning member in the axial direction,   a housing portion configured to surround the shaft portion,   a bearing portion configured to be disposed inside the housing portion and to rotatably support the shaft portion, and   a non-contact sealing portion configured to be disposed between the bearing portion and the roll cleaning member and to seal a gap between the shaft portion and the housing portion, and the non-contact sealing portion includes   a rotating portion configured to be attached to the shaft portion and to have a plurality of protrusion portions formed on a peripheral surface of the rotating portion at intervals in the axial direction, and   a fixed portion configured to be attached to the housing portion, to surround the plurality of protrusion portions, and to have a gas supply hole formed in an inner peripheral surface of the fixed portion surrounding the plurality of protrusion portions, the gas supply hole supplying a compressed gas from a position inward of the protrusion portions in the axial direction, which are disposed at both end portions in the axial direction, among the plurality of protrusion portions.   
     
     
         2 . The substrate cleaning device according to  claim 1 ,
 wherein the gas supply hole supplies the compressed gas from a position including a center portion of a formation region of the plurality of protrusion portions in the axial direction.   
     
     
         3 . The substrate cleaning device according to  claim 1 ,
 wherein the gas supply hole is open to the inner peripheral surface of the fixed portion in a direction parallel to a tangential direction of the peripheral surface of the rotating portion.   
     
     
         4 . The substrate cleaning device according to  claim 1 ,
 wherein the gas supply hole is open toward a center axis of the rotating portion.   
     
     
         5 . The substrate cleaning device according to  claim 1 ,
 wherein a gas exhaust hole for exhausting the compressed gas is formed in the inner peripheral surface of the fixed portion on a side opposite to the gas supply hole.   
     
     
         6 . The substrate cleaning device according to  claim 1 ,
 wherein a gas exhaust hole for exhausting the compressed gas is formed on the inner peripheral surface of the fixed portion on the same side as the gas supply hole.   
     
     
         7 . The substrate cleaning device according to  claim 1 ,
 wherein the fixed portion includes   a first wall portion configured to be disposed closer to a roll cleaning member side than the plurality of protrusion portions in the axial direction, to extend radially inward beyond a tip of the protrusion portion disposed at an end portion on the roll cleaning member side among the plurality of protrusion portions, and to face the peripheral surface of the rotating portion with a gap, and   a second wall portion configured to be disposed closer to the roll cleaning member side than the first wall portion in the axial direction, and to cover the gap between the first wall portion and the peripheral surface of the rotating portion when viewed in the axial direction.   
     
     
         8 . The substrate cleaning device according to  claim 7 ,
 wherein a drainage hole is formed in the inner peripheral surface of the fixed portion between the first wall portion and the second wall portion.   
     
     
         9 . A substrate processing device comprising:
 a polishing unit configured to polish a substrate; and   a cleaning unit configured to clean the substrate polished in the polishing unit,   wherein the cleaning unit includes the substrate cleaning device according to  claim 1 .   
     
     
         10 . A maintenance method for a substrate cleaning device,
 in which the substrate cleaning device includes
 a roll cleaning member configured to scrub a substrate, and 
 a rotation holding portion configured to hold an end portion of the roll cleaning member in an axial direction, 
 the rotation holding portion includes 
 a shaft portion configured to be connected to the end portion of the roll cleaning member in the axial direction, 
 a housing portion configured to surround the shaft portion, 
 a bearing portion configured to be disposed inside the housing portion and to rotatably support the shaft portion, and 
 a non-contact sealing portion configured to be disposed between the bearing portion and the roll cleaning member to seal a gap between the shaft portion and the housing portion, and 
 the non-contact sealing portion includes 
 a rotating portion configured to be attached to the shaft portion and to have a plurality of protrusion portions formed on a peripheral surface of the rotating portion at intervals in the axial direction, and 
 a fixed portion configured to be attached to the housing portion, to surround the plurality of protrusion portions, and to have a gas supply hole formed in an inner peripheral surface of the fixed portion surrounding the plurality of protrusion portions, the gas supply hole supplying a compressed gas from a position inward of the protrusion portions in the axial direction, which are disposed at both end portions in the axial direction, among the plurality of protrusion portions, the method comprising: 
 performing maintenance in a state in which, after the fixed portion is removed from the housing portion, a cover surrounding the rotating portion is attached to a place from which the fixed portion is removed.