Gas delivering device

Abstract

A gas delivering device inside a gaseous reaction chamber capable of increasing gas flow in areas having a deficient supply of gas by forming additional air holes in corresponding positions. Because a gas-delivering panel design having asymmetrical air holes is employed, gas flow rate within the reaction chamber can be roughly balanced. Hence, a homogeneous stream of gaseous reactants can be maintained above the surface of a reacting wafer.

What is claimed is:  
     
         1 . A gas delivering device installed inside a reaction chamber, comprising a gas-delivering panel having asymmetrically placed air holes whose positions are determined by environmental factors within the reaction chamber.  
     
     
         2 . The structure of    claim 1   , wherein the environmental factors includes gas flow rate in various places within the reaction chamber.  
     
     
         3 . The structure of    claim 1   , wherein the environmental factors include distribution of pressure within the reaction chamber.  
     
     
         4 . The structure of    claim 1   , wherein the gas delivering panel has a circular shape.  
     
     
         5 . A gas delivering structure installed inside a reaction chamber, comprising a gas delivering panel having a group of symmetrically positioned air holes and a group of air holes at one corner sector of the symmetrically positioned air holes for adjusting gas flow rate.  
     
     
         6 . The structure of    claim 5   , wherein the group of air holes for adjusting gas flow rate are positioned above areas within the chamber where the gas flow rate is slow.  
     
     
         7 . The structure of    claim 5   , wherein the group of air holes for adjusting gas flow are positioned above areas within the chamber where gas pressure is low.  
     
     
         8 . The structure of    claim 5   , wherein the gas delivering panel has a circular shape.  
     
     
         9 . The structure of    claim 5   , wherein the group of symmetrically positioned air holes is on the perimeter of a circle.  
     
     
         10 . The structure of    claim 5   , wherein the group of symmetrically positioned air holes is on the perimeter of a symmetrical polygon.