Method of delivering gas into reaction chamber and shower head used to deliver gas

Abstract

A method of delivering two or more mutually-reactive reaction gases when a predetermined film is deposited on a substrate, and a shower head used in the gas delivery method, function to increase the film deposition rate while preventing formation of contaminating particles. In this method, one reaction gas is delivered toward the edge of the substrate, and the other reaction gases are delivered toward the central portion of the substrate, each of the reaction gases being delivered via an independent gas outlet to prevent the reaction gases from being mixed. In the shower head, separate passages are provided to prevent the first reaction gas from mixing with the other reaction gases by delivering the first reaction gas from outlets formed around the edge of the bottom surface of the shower head. The other reaction gases are delivered from outlets formed in the central portion of the bottom surface of the shower head. Accordingly, one of the mutually-reactive gases is delivered toward the central portion of the substrate, and the others are delivered toward the edge of the substrate.

What is claimed is:  
     
         1 . A gas delivery method of delivering two or more mutually-reactive reaction gases into a reaction chamber to deposit a predetermined film on a substrate seated within the reaction chamber, the method comprising: 
 delivering a first reaction gas toward an outer edge of the substrate; and    delivering other reaction gases toward a central portion of the substrate, wherein each of the reaction gases is delivered via an independent gas outlet to prevent the reaction gases from being mixed.    
     
     
         2 . The gas delivery method as claimed in  claim 1 , wherein the predetermined film is deposited by atomic layer deposition.  
     
     
         3 . The gas delivery method as claimed in  claim 1 , wherein each of the first reaction gas and the other reaction gases are alternately delivered for designated periods of time.  
     
     
         4 . The gas delivery method as claimed in  claim 3 , wherein each of the first reaction gas and the other reaction gases is delivered together with a carrier gas.  
     
     
         5 . The gas delivery method as claimed in  claim 4 , wherein the carrier gas is inert.  
     
     
         6 . The gas delivery method as claimed in  claim 4 , wherein the reaction chamber is purged by delivering only the carrier gas for a period of time between delivery of the first reaction gas and the other reaction gases.  
     
     
         7 . The gas delivery method as claimed in  claim 1 , wherein the other reaction gases comprise second and third reaction gases that are each reactive to the first reaction gas, and the second and third reaction gases are simultaneously delivered via a common gas outlet so as to be mixed with each other during delivery.  
     
     
         8 . The gas delivery method as claimed in  claim 1 , wherein the other reaction gases comprise second and third reaction gases that are each reactive to the first reaction gas, and the second and third reaction gases are alternately delivered via a common gas outlet at different times to prevent mixing.  
     
     
         9 . The gas delivery method as claimed in  claim 1 , wherein the other reaction gases comprise second and third reaction gases each reactive to the first reaction gas, and the second and third reaction gases are delivered via independent gas outlets, respectively, to prevent mixing of the second and third reaction gases.  
     
     
         10 . The gas delivery method as claimed in  claim 1 , wherein the first reaction gas is delivered downward via gas outlets formed around an upper edge of the reaction chamber, and the other reaction gases are delivered downward via gas outlets formed on a central portion of an upper side of the reaction chamber.  
     
     
         11 . The gas delivery method as claimed in  claim 1 , wherein the first reaction gas is delivered laterally via gas outlets formed on a side surface of the reaction chamber, and the other reaction gases are delivered downward via gas outlets formed on a central portion of an upper side of the reaction chamber.  
     
     
         12 . The gas delivery method as claimed in  claim 1 , wherein the first reaction gas is delivered upward via gas outlets formed along an edge of a bottom surface of the reaction chamber, and the other reaction gases are delivered downward via gas outlets formed on a central portion of an upper side of the reaction chamber.  
     
     
         13 . A gas delivery method of delivering a first reaction gas containing elements of a material to be deposited and a second reaction gas for forming the material by reacting with the first reaction gas via separate gas outlets to deposit the material on a substrate seated within a reaction chamber, the method comprising steps of: 
 (a) delivering the first reaction gas toward an outer edge of the substrate for a first period of time;    (b) purging the reaction chamber while blocking inflow of the first reaction gas;    (c) delivering the second reaction gas toward a central portion of the substrate for a second period of time; and    (d) purging the reaction chamber while blocking inflow of the second reaction gas.    
     
     
         14 . The gas delivery method as claimed in  claim 13 , wherein delivery of each of the first and second reaction gases is done together with a carrier gas in each of the steps (a) and (c) in order to smoothly supply the first and second reaction gases, and purging of the reaction chamber in each of the steps (b) and (d) is done by continuously delivering only the carrier gas while blocking the first and second reaction gases.  
     
     
         15 . The gas delivery method as claimed in  claim 14 , wherein the carrier gas is inert.  
     
     
         16 . The gas delivery method as claimed in  claim 13 , wherein the steps (a) through (d) are repeated so as to deposit the material to a desired thickness.  
     
     
         17 . A shower head installed at an upper portion of a reaction chamber in which a substrate is seated on a lower portion thereof, so as to supply two or more mutually-reactive reaction gases, the shower head comprising: 
 a gas supply line formed on an upper surface of the shower head for receiving a first reaction gas from a supply source of the first reaction gas;    gas supply lines formed on the upper surface of the shower head for receiving other reaction gases from respective supply sources of the other reaction gases;    a plurality of outlets for the first reaction gas formed along an outer edge of a lower surface of the shower head for discharging the first reaction gas;    a plurality of outlets for each of the other reaction gases formed on a central portion of the lower surface of the shower head for discharging the other reaction gases;    a gas passage formed within a body of the shower head for connecting the gas supply line for the first reaction gas to the plurality of outlets for the first reaction gas; and    gas passages formed independently of the gas passage for the first reaction gas within the body of the shower head for connecting the supply lines for the other reaction gases to the plurality of outlets for each of the other reaction gases.    
     
     
         18 . The shower head as claimed in  claim 17 , wherein the plurality of outlets for the first reaction gas are extended further downward toward the substrate than the plurality of outlets for each of the other reaction gases, such that the plurality of outlets for the first reaction gas are closer to the substrate than the plurality of outlets for each of the other reaction gases when the shower head is installed in the upper portion of the reaction chamber.  
     
     
         19 . The shower head as claimed in  claim 17 , wherein a diameter of the edge of the bottom surface of the shower head on which the plurality of outlets for the first reaction gas are formed is greater than or equal to a diameter of the substrate.  
     
     
         20 . The shower head as claimed in  claim 17 , wherein the other reaction gases comprise second and third reaction gases that are each reactive to the first reaction gas, and the gas passages for the second and third reaction gases are formed independently of each other.