Projection exposure system

Abstract

A projection exposure system, intended in particular for microlithography, is used for generating, in an image plane, an image of a mask arranged in an object plane. The projection exposure system has a light source emitting projection light and projection optics arranged between the mask and the image. Starting from the mask, the following are arranged in the beam path of the projection optics: a first group of optical components with an overall positive refractive power; a second group of optical components with an overall negative refractive power; a third group of optical components with an overall positive refractive power; a fourth group of optical components with an overall negative refractive power, and, a fifth group of optical components with an overall positive refractive power. At least three optical subgroups having at least one optical component can be displaced along the optical axis of the projection optics. The first optical subgroup comprises the mask or at least one optical component from the first group of optical components. The second optical subgroup comprises at least one optical component from the second or the third group of optical components. The third optical subgroup comprises at least one optical component from the third or the fourth group of optical components. With such subgroups, efficient imaging error correction of the projection optics is possible.

What is claimed is  
     
         1 . A projection exposure system, in particular for microlithography, for generating, in an image plane, an image of a mask arranged in an object plane, with a light source emitting projection light and projection optics arranged between the mask and the image, wherein the following are arranged in a beam path of the projection optics, starting from the mask: 
 a) a first group of optical components with an overall positive refractive power;    b) a second group of optical components with an overall negative refractive power;    c) a third group of optical components with an overall positive refractive power;    d) a fourth group of optical components with an overall negative refractive power; and    e) a fifth group of optical components with an overall positive refractive power; characterised in that    f) at least a first, second and third optical subgroup each having at least one optical component can be displaced along an optical axis of the projection optics, wherein    g) the first optical subgroup comprises one of the mask and at least one optical component from the first group of optical components,    h) the second optical subgroup comprises at least one optical component from one of the second and the third group of optical components, and    i) the third optical subgroup comprises at least one optical component from one of the third and the fourth group of optical components.    
     
     
         2 . The projection exposure system according to  claim 1 , characterised in that the second optical subgroup is arranged next to the first group of optical components.  
     
     
         3 . The projection exposure system according to  claim 1 , characterised in that the third optical subgroup is arranged in a transition region between the third and the fourth groups of optical components.  
     
     
         4 . The projection exposure system according to  claim 1 , characterised in that a pair of optical components, whose displacements along the optical axis are expediently coupled together, is provided as the second optical subgroup.  
     
     
         5 . The projection exposure system according to  claim 4 , characterised in that a support body is provided, which can be displaced along the optical axis of the projection optics and which supports said pair of optical components together.  
     
     
         6 . The projection exposure system according to  claim 1 , characterised in that an instrument for adjusting a wavelength is provided.  
     
     
         7 . The projection exposure system according to  claim 6 , characterised in that the adjustment instrument includes means for altering an emission wavelength of the light source.  
     
     
         8 . The projection exposure system according to  claim 6 , characterised in that the adjustment instrument includes means for altering a projection light wavelength after exiting the light source.  
     
     
         9 . The projection exposure system according to  claim 1 , characterised by at least a fourth optical subgroup, having at least one optical component, which can be displaced along the optical axis of the projection optics and which comprises at least one optical component from the fifth group of optical components.  
     
     
         10 . The projection exposure system according to  claim 9 , characterised by an at most fourth and a fifth optical subgroup which can be displaced along the optical axis of projection optics.  
     
     
         11 . The projection exposure system according to  claim 1 , characterised in that the optical components are designed as refractive components.