Inventor · disambiguated record
Bernhard Kneer
Also filed as: KNEER BERNHARD
12 granted patents·6 pending applications·25 citations·filing 2002–2016
87Inventor score
Files withZEISS CARL SMT AG10ZEISS CARL SMT GMBH3EHRMANN ALBRECHT2ASML NETHERLANDS BV1KNEER BERNHARD1
Top patents by PatentIndex Score
18 records- 0178US7522260B1Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned componentsZEISS CARL SMT AG·Filed 2005·Granted Apr 21, 2009·5 cites·25 claims
- 0275US9436095B2Exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2012·Granted Sep 6, 2016·1 cites·22 claims
- 0372US7372539B2Method for distortion correction in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted May 13, 2008·10 cites·18 claims
- 0470US8330935B2Exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2010·Granted Dec 11, 2012·2 cites·24 claims
- 0570US7605905B2Method for distortion correction in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Oct 20, 2009·2 cites·14 claims
- 0666US7719658B2Imaging system for a microlithographical projection light systemZEISS CARL SMT AG·Filed 2005·Granted May 18, 2010·2 cites·27 claims
- 0764US9086637B2Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure systemKNEER BERNHARD·Filed 2012·Granted Jul 21, 2015·1 cites·26 claims
- 0861US10345710B2Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2016·Granted Jul 9, 2019·0 cites·22 claims
- 0957US2008304033A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1057US2008309894A1Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1156US7457043B2Projection exposure systemZEISS CARL SMT AG·Filed 2007·Granted Nov 25, 2008·1 cites·17 claims
- 1256US7408621B2Projection exposure systemZEISS CARL SMT AG·Filed 2006·Granted Aug 5, 2008·1 cites·14 claims
- 1353US2011228246A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2011·Application pending·0 cites
- 1452US9696631B2Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure systemZEISS CARL SMT GMBH·Filed 2015·Granted Jul 4, 2017·0 cites·21 claims
- 1548US2007070316A1Microlithographic projection exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2006·Application pending·0 cites
- 1645US2007165198A1Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 1740US2003063268A1Projection exposure systemFiled 2002·Application pending·0 cites
- 1836US10558126B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2015·Granted Feb 11, 2020·0 cites·28 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →