Laser-assisted silicide fuse programming

Abstract

A method is provided, the method comprising programming a silicide fuse by passing a current through the silicide fuse while substantially simultaneously irradiating the silicide fuse with a laser.

What is claimed:  
     
         1 . A method comprising: 
 programming a silicide fuse by passing a current through the silicide fuse while substantially simultaneously irradiating the silicide fuse with a laser.    
     
     
         2 . The method of  claim 1 , wherein passing the current through the silicide fuse comprises subjecting the silicide fuse to a voltage of no more than about 2 V.  
     
     
         3 . The method of  claim 1 , wherein irradiating the silicide fuse with the laser comprises irradiating the silicide fuse with a high intensity laser.  
     
     
         4 . The method of  claim 2 , wherein irradiating the silicide fuse with the laser comprises irradiating the silicide fuse with a high intensity laser.  
     
     
         5 . The method of  claim 1 , wherein irradiating the silicide fuse with the laser comprises irradiating the silicide fuse with a pulsed laser.  
     
     
         6 . The method of  claim 5 , wherein irradiating the silicide fuse with the pulsed laser comprises irradiating the silicide fuse with the pulsed laser for a time period in a range of about 1 microsecond to about 2 seconds.  
     
     
         7 . The method of  claim 2 , wherein irradiating the silicide fuse with the laser comprises irradiating the silicide fuse with a pulsed laser.  
     
     
         8 . The method of  claim 7 , wherein irradiating the silicide fuse with the pulsed laser comprises irradiating the silicide fuse with the pulsed laser for a time period in a range of about 1 microsecond to about 2 seconds.  
     
     
         9 . The method of  claim 3 , wherein irradiating the silicide fuse with the high intensity laser comprises irradiating the silicide fuse with a pulsed high intensity laser.  
     
     
         10 . The method of  claim 9 , wherein irradiating the silicide fuse with the pulsed high intensity laser comprises irradiating the silicide fuse with the pulsed high intensity laser for a time period in a range of about 1 microsecond to about 2 seconds.  
     
     
         11 . A method comprising: 
 programming a plurality of silicide fuses by passing a current through at least one of the plurality of silicide fuses while substantially simultaneously irradiating the at least one of the plurality of silicide fuses with a laser.    
     
     
         12 . The method of  claim 11 , wherein passing the current through the at least one of the plurality of silicide fuses comprises subjecting the at least one of the plurality of silicide fuses to a voltage of no more than about 2 V.  
     
     
         13 . The method of  claim 11 , wherein irradiating the at least one of the plurality of silicide fuses with the laser comprises irradiating the at least one of the plurality of silicide fuses with a high intensity laser.  
     
     
         14 . The method of  claim 12 , wherein irradiating the at least one of the plurality of silicide fuses with the laser comprises irradiating the at least one of the plurality of silicide fuses with a high intensity laser.  
     
     
         15 . The method of  claim 11 , wherein irradiating the at least one of the plurality of silicide fuses with the laser comprises irradiating the at least one of the plurality of silicide fuses with a pulsed laser.  
     
     
         16 . The method of  claim 15 , wherein irradiating the at least one of the plurality of silicide fuses with the pulsed laser comprises irradiating the at least one of the plurality of silicide fuses with the pulsed laser for a time period in a range of about 1 microsecond to about 2 seconds.  
     
     
         17 . The method of  claim 12 , wherein irradiating the at least one of the plurality of silicide fuses with the laser comprises irradiating the at least one of the plurality of silicide fuses with a pulsed laser.  
     
     
         18 . The method of  claim 17 , wherein irradiating the at least one of the plurality of silicide fuses with the pulsed laser comprises irradiating the at least one of the plurality of silicide fuses with the pulsed laser for a time period in a range of about 1 microsecond to about 2 seconds.  
     
     
         19 . The method of  claim 13 , wherein irradiating the at least one of the plurality of silicide fuses with the high intensity laser comprises irradiating the at least one of the plurality of silicide fuses with a pulsed high intensity laser.  
     
     
         20 . The method of  claim 19 , wherein irradiating the at least one of the plurality of silicide fuses with the pulsed high intensity laser comprises irradiating the at least one of the plurality of silicide fuses with the pulsed high intensity laser for a time period in a range of about 1 microsecond to about 2 seconds.  
     
     
         21 . A method comprising: 
 forming a plurality of semiconductor devices;    forming a plurality of silicide fuses between at least some of the plurality of semiconductor devices; and    programming the plurality of silicide fuses by passing a current through at least one of the plurality of silicide fuses while substantially simultaneously irradiating the at least one of the plurality of silicide fuses with a laser.    
     
     
         22 . The method of  claim 21 , wherein passing the current through the at least one of the plurality of silicide fuses comprises subjecting the at least one of the plurality of silicide fuses to a voltage of no more than about 2 V.  
     
     
         23 . The method of  claim 21 , wherein irradiating the at least one of the plurality of silicide fuses with the laser comprises irradiating the at least one of the plurality of silicide fuses with a high intensity laser.  
     
     
         24 . The method of  claim 22 , wherein irradiating the at least one of the plurality of silicide fuses with the laser comprises irradiating the at least one of the plurality of silicide fuses with a high intensity laser.  
     
     
         25 . The method of  claim 21 , wherein irradiating the at least one of the plurality of silicide fuses with the laser comprises irradiating the at least one of the plurality of silicide fuses with a pulsed laser.  
     
     
         26 . The method of  claim 25 , wherein irradiating the at least one of the plurality of silicide fuses with the pulsed laser comprises irradiating the at least one of the plurality of silicide fuses with the pulsed laser for a time period in a range of about 1 microsecond to about 2 seconds.  
     
     
         27 . The method of  claim 22 , wherein irradiating the at least one of the plurality of silicide fuses with the laser comprises irradiating the at least one of the plurality of silicide fuses with a pulsed laser.  
     
     
         28 . The method of  claim 27 , wherein irradiating the at least one of the plurality of silicide fuses with the pulsed laser comprises irradiating the at least one of the plurality of silicide fuses with the pulsed laser for a time period in a range of about 1 microsecond to about 2 seconds.  
     
     
         29 . The method of  claim 23 , wherein irradiating the at least one of the plurality of silicide fuses with the high intensity laser comprises irradiating the at least one of the plurality of silicide fuses with a pulsed high intensity laser.  
     
     
         30 . The method of  claim 29 , wherein irradiating the at least one of the plurality of silicide fuses with the pulsed high intensity laser comprises irradiating the at least one of the plurality of silicide fuses with the pulsed high intensity laser for a time period in a range of about 1 microsecond to about 2 seconds.