Exposure apparatus and device fabrication method using the same

Abstract

An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.

1 . An exposure apparatus comprising: 
 an original-form stage for holding an original form;    a projection optical system for introducing light from the original form into an object to be exposed; and    a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of said projection optical system,    wherein a space for enclosing said original-form stage is different from a space for enclosing at least part of said detection optical system.    
   
   
       2 . An exposure apparatus according to  claim 1 , further comprising a drive mechanism for driving the original-form stage, wherein an optical path of detecting light from said detection optical system to each of the plural points inclines, when viewed from the optical-axis direction of said projection optical system, relative to a drive direction in which said drive mechanism drives said original-form stage.  
   
   
       3 . An exposure apparatus according to  claim 1 , wherein said exposure apparatus is a scanning exposure apparatus for scanning the original-form stage in a scanning direction in exposure, and 
 wherein an optical path of detecting light from said detection optical system to each of the plural points inclines relative to the scanning direction, when viewed from the optical-axis direction of the projection optical system.    
   
   
       4 . An exposure apparatus according to  claim 1 , wherein said exposure apparatus is a scanning exposure apparatus for scanning the original-form stage in a scanning direction in exposure, and 
 wherein an optical path of detecting light from said detection optical system to each of the plural points is substantially parallel to the scanning direction, when viewed from the optical-axis direction of the projection optical system.    
   
   
       5 . An exposure apparatus according to  claim 1 , further comprising a drive mechanism for driving said original-plate stage, wherein when said exposure apparatus exposes, said exposure apparatus scans the original-plate stage using said drive mechanism, and detects surface positions of the original form using said detection optical system.  
   
   
       6 . An exposure apparatus comprising: 
 a first movable stage for supporting and moving a first object;    a second movable stage for supporting and moving a second object;    a projection optical system for projecting a pattern on the first object onto the second object as a result of that said first and second movable stages are scanned in synchronization with said projection optical system; and    a detector for scanning the first object and for detecting a surface shape of the first object,    wherein said detector includes a driving part for scanning the first object before detecting an entire surface shape of the first object, and said first movable stage serves as the driving part.    
   
   
       7 . An exposure apparatus according to  claim 6 , wherein said detector utilizes an optically oblique incidence system, and an area for obliquely incident light of the optically oblique incidence system to detect the first object intersects an area of the first object projected onto the second object by said projection optical system.  
   
   
       8 . An exposure apparatus according to  claim 6 , wherein said detector includes at least three or more detection points for detecting the surface shape of the first object in a non-scanning direction different from a scanning direction of said first movable stage.  
   
   
       9 . An exposure apparatus according to  claim 6 , wherein said detector is located on part of a fixing board that drives said first movable stage.  
   
   
       10 . An exposure apparatus according to  claim 6 , further comprising an alarm for alarming an exchange of the first object and a reset of the first object onto a holder for holding the first object, based on a detection result of the surface shape of the first object detected by said detector.  
   
   
       11 . An exposure apparatus according to  claim 6 , further comprising: 
 a synchronous scanner for synchronously scanning said first and second movable stages relative to said projection optical system; and    a controller for controlling said synchronous scanner based on a detection result of the surface shape of the first object detected by said detector.    
   
   
       12 . An exposure apparatus according to  claim 6 , further comprising a controller for controlling a transfer by said projection optical system, based on a detection result of the surface shape of the first object detected by said detector.  
   
   
       13 . An exposure apparatus comprising: 
 a projection optical system for projecting light from an object;    a detector for detecting a surface shape of the object by scanning the object; and    a movable stage for supporting the object, and for moving said detector and the object relative to each other when said detector detects the surface shape of the object.    
   
   
       14 . An exposure apparatus comprising: 
 a projection optical system for transferring a pattern on a reticle; and    a detector for detecting a surface shape of the reticle by irradiating detecting light via a slit-shaped illuminated area,    wherein said detector irradiates the detecting light in a direction parallel to a width direction of the slit-shaped illumination area.    
   
   
       15 . An exposure apparatus according to  claim 14 , wherein said detector detects a shape of a pattern surface of the reticle, on which the pattern is formed.  
   
   
       16 . An exposure apparatus according to  claim 14 , wherein said exposure apparatus is a scanning exposure apparatus.  
   
   
       17 . An exposure apparatus according to  claim 14 , wherein said detector irradiates the detecting light in a direction parallel to a scanning direction of the reticle.  
   
   
       18 . An exposure apparatus according to  claim 14 , wherein said detector irradiates the detecting light onto plural measurement points on the reticle.  
   
   
       19 . An exposure apparatus comprising: 
 a projection optical system for transferring a pattern on an original form onto a photosensitive plate;    an original-form stage for holding and moving the original form, said original-form stage including a movable part and a non-movable part;    a reference original-form fixed on the original form or said original-form stage; and    a surface position detector for obtaining information about surface positions of the original form or the reference original-form,    wherein said surface position detector is formed on the non-movable part of said original-form stage, and at least part of said surface position detector is formed in a space substantially separated from a space that encloses the movable part of said original-form stage.    
   
   
       20 . An exposure apparatus according to  claim 19 , wherein said surface position detector obtains information about surface positions of the original form or the reference original-form in an optical-axis direction of said projection optical system, and includes an oblique incidence optical system for irradiating light oblique to the optical-axis direction of said projection optical system, onto a pattern surface of the original form or a surface of the reference original-form at a side of said projection optical system, an incident direction of the irradiated light being substantially parallel to a moving direction of said original-form stage.  
   
   
       21 . An exposure apparatus according to  claim 19 , wherein at least part of said surface position detector is located between said original-form stage and said projection optical system, in a space substantially separated from the space that encloses the movable part of said original-form stage or a space that encloses said projection optical system.  
   
   
       22 . An exposure apparatus according to  claim 19 , wherein an optical element substantially separates a space that encloses at least part of said surface position detector from the space that encloses the movable part of said original-form stage.  
   
   
       23 . An exposure apparatus according to  claim 19 , wherein an optical element substantially separates a space that encloses at least part of said surface position detector from a space that encloses said projection optical system.  
   
   
       24 . An exposure apparatus according to  claim 19 , further comprising an air-conditioner mechanism for individually air-conditioning at least one of a space that encloses at least part of said surface position detector and the space that encloses the movable part of the original-form stage.  
   
   
       25 . An exposure apparatus according to  claim 19 , further comprising an air-conditioner mechanism for individually air-conditioning at least one of a space that encloses at least part of said surface position detector and a space that encloses said projection optical system.  
   
   
       26 . A device fabrication method comprising the steps of: 
 exposing an object using an exposure apparatus according to  claim 1;  and    developing the object that has been exposed.    
   
   
       27 . A device fabrication method comprising the steps of: 
 exposing an object using an exposure apparatus according to  claim 6;  and    developing the object that has been exposed.    
   
   
       28 . A device fabrication method comprising the steps of: 
 exposing an object using an exposure apparatus according to  claim 13;  and    developing the object that has been exposed.    
   
   
       29 . A device fabrication method comprising the steps of: 
 exposing an object using an exposure apparatus according to  claim 14;  and    developing the object that has been exposed.    
   
   
       30 . A device fabrication method comprising the steps of: 
 exposing an object using an exposure apparatus according to  claim 19;  and    developing the object that has been exposed.