Gas distribution system

Abstract

The present invention provides a gas distribution apparatus useful in semiconductor manufacturing. The gas distribution apparatus comprises a unitary member and a gas distribution network formed within the unitary member for uniformly delivering a gas into a process region. The gas distribution network is formed of an inlet passage extending upwardly through the upper surface of the unitary member for connecting to a gas source, a plurality of first passages converged at a junction and connected with the inlet passage at the junction, a plurality of second passages connected with the plurality of first passages, and a plurality of outlet passages connected with the plurality of second passages for delivering the gas into a processing region. The first passages extend radially and outwardly from the junction to the periphery surface of the unitary member, and the second passages are non-perpendicular to the first passages and extend outwardly from the first passages to the periphery surface. The outlet passages extend downwardly through the lower surface of the unitary member for delivering the gas into the processing region.

1 . A gas distribution apparatus, comprising: 
 a member having an upper surface, a lower surface and a periphery surface; and    a gas distribution network formed within said member for uniformly delivering a gas into a process region, said gas distribution network being formed of:    an inlet passage extending upwardly through said upper surface for connecting to a gas source;    a plurality of first passages converged at a junction and connected with said inlet passage at the junction, said first passages extend radially and outwardly from the junction to the periphery surface;    a plurality of second passages connected with said plurality of first passages, said second passages are non-perpendicular to said first passages and extend outwardly from said first passages to the periphery surface; and    a plurality of outlet passages connected with said plurality of second passages and extending downwardly through said lower surface for delivering the gas into the processing region.    
     
     
         2 . The apparatus of  claim 1  wherein said member is cylindrical unitary member.  
     
     
         3 . The apparatus of  claim 1  wherein said plurality of first and second passages are co-planar.  
     
     
         4 . The apparatus of  claim 1  wherein said plurality of second passages between adjacent two passages are in parallel.  
     
     
         5 . The apparatus of  claim 1  wherein said second passages are angled from the first passage connected therewith from about 30 to about 45 degree.  
     
     
         6 . The apparatus of  claim 5  wherein said second passages are angled from the first passage in about 45 degree.  
     
     
         7 . The apparatus of  claim 1  wherein said second passages connected on both sides of a common first passage are staggeredly arranged.  
     
     
         8 . The apparatus of  claim 1  wherein said first passages are comprised of four orthogonal coordinate passages  
     
     
         9 . The apparatus of  claim 1  wherein said first passages are comprised of six passages, and adjacent two passages form an angle of about 60 degree.  
     
     
         10 . The apparatus of  claim 1  wherein the first passages have a first diameter, the second passages have a second diameter, and the outlet passages have an outlet diameter, where the first diameter is larger than the second diameter, and the second diameter is larger than the outlet diameter.  
     
     
         11 . The apparatus of  claim 10  wherein the first diameter is selected in the range from about 5 to about 15 mm, the second diameter in the range from about 3 to about 12 mm, and the outlet diameter in the range from about 0.25 to about 2.5 mm.  
     
     
         12 . The apparatus of  claim 1  wherein the outlets have a substantially constant density on the lower surface of the unitary member.  
     
     
         13 . The apparatus of  claim 1  wherein the outlet passages are substantially cylindrical.  
     
     
         14 . The apparatus of  claim 1  wherein the outlet passages are formed of a first portion having a smaller diameter and a second portion having a greater diameter.  
     
     
         15 . The apparatus of  claim 1  wherein the outlet passages is provided with threading for receiving inserts to alter the size of and/or the direction of the gas exiting the outlet passages.  
     
     
         16 . A gas distribution apparatus comprising: 
 a plurality of first passages; and    a plurality of second passages coupled to said plurality of first passages;    wherein the first passages are comprised of four quadrants, and where in two opposite quadrants the first and second passages are symmetrically arranged and in two adjacent quadrants the second passages on both sides of a common first passage are staggeridly arranged.