Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film

Abstract

The present invention provides a composition for forming a silica-based film, the composition containing (a) a siloxane resin; (b) an organic solvent including at least one species of aprotic solvent; and (c) an onium salt.

1 - 12 . (canceled)  
   
   
       13 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt.    
   
   
       14 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt,    wherein the organic solvent contains at least one species of aprotic solvent selected from the group consisting of ether-based solvents and ketone-based solvents.    
   
   
       15 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt,    wherein the organic solvent contains at least one species of aprotic solvent excluding amide-based solvent.    
   
   
       16 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt,    wherein the onium salt contains at least an ammonium salt selected from the group consisting of tetramethylammonium nitrate, tetramethylammonium acetate, tetramethylammonium propionate, tetramethylammonium maleate, and tetramethylammonium sulfate.    
   
   
       17 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt,    wherein the siloxane resin contains a siloxane resin including units derived from tetraalkoxysilane and trialkoxysilane.    
   
   
       18 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt,    wherein the aprotic solvent contains at least one species of aprotic solvent selected from the group consisting of alkylene glycol dialkyls, alkylene glycol alkyl esters, alkylene glycol diesters, and cyclic ketones.    
   
   
       19 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt,    wherein the aprotic solvent contains an aprotic solvent having a relative permittivity of at least 10.    
   
   
       20 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin containing a siloxane resin obtainable by hydrolyzing and condensing a compound represented by the following general formula (1):      R 1   n SiX 4-n      wherein R 1  is an H or F atom, a group containing a B, N, Al, P, Si, Ge, or Ti atom, or an organic group having a carbon number of 1 to 20; X is a hydrolyzable group; and n is an integer of 0 to 2; R 1  being either identical or different when n is 2; X being either identical or different when n is 0 to 2;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt,    wherein the total content of H, F, B, N, Al, P, Ge, Ti, and C atoms in the siloxane resin with respect to 1 mol of Si atom is 0.65 mol or less.    
   
   
       21 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin;    (b) an organic solvent containing at least one species of aprotic solvent; and    (c) an onium salt,    further comprising a pore forming compound which thermally decomposes or evaporates at a heating temperature of 250° to 500° C.    
   
   
       22 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin; and    (b) an organic solvent containing at least one species of aprotic solvent;    wherein the siloxane resin is obtainable by hydrolyzing and condensing the compound in the aprotic solvent.    
   
   
       23 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin; and    (b) an organic solvent containing at least one species of aprotic solvent, wherein the aprotic solvent includes a dialkylether of dihydric alcohol.    
   
   
       24 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin; and    (b) an organic solvent containing at least two species of aprotic solvent.    
   
   
       25 . A composition for forming a silica-based film comprising: 
 (a) a siloxane resin; and    (b) an organic solvent containing at least one species of aprotic solvent,    wherein the siloxane resin is obtainable by hydrolyzing and condensing the compound in the presence of organic or inorganic acid.