Inventor · disambiguated record
Haruaki Sakurai
Also filed as: SAKURAI HARUAKI
9 granted patents·6 pending applications·37 citations·filing 2004–2016
84Inventor score
Top patents by PatentIndex Score
15 records- 0178US8034545B2Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguideHITACHI CHEMICAL CO LTD·Filed 2009·Granted Oct 11, 2011·4 cites·7 claims
- 0278US7297464B2Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguideHITACHI CHEMICAL CO LTD·Filed 2005·Granted Nov 20, 2007·16 cites·15 claims
- 0366US7682701B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2005·Granted Mar 23, 2010·4 cites·21 claims
- 0459US7687590B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2005·Granted Mar 30, 2010·2 cites·39 claims
- 0559US7205030B2Method for forming porous filmSANYO ELECTRIC CO·Filed 2004·Granted Apr 17, 2007·6 cites·12 claims
- 0657US8466229B2Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based filmSAKURAI HARUAKI·Filed 2008·Granted Jun 18, 2013·0 cites·11 claims
- 0751US7358300B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2004·Granted Apr 15, 2008·5 cites·13 claims
- 0847US2005239953A1Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguideHITACHI CHEMICAL CO LTD·Filed 2005·Application pending·0 cites
- 0944US2006047034A1Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based filmSAKURAI HARUAKI·Filed 2004·Application pending·0 cites
- 1042US10946494B2Polishing agent, stock solution for polishing agent, and polishing methodHITACHI CHEMICAL CO LTD·Filed 2016·Granted Mar 16, 2021·0 cites·19 claims
- 1142US10119049B2Polishing agent, storage solution for polishing agent and polishing methodHITACHI CHEMICAL CO LTD·Filed 2015·Granted Nov 6, 2018·0 cites·12 claims
- 1241US2004253462A1Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity filmHITACHI CHEMICAL CO LTD·Filed 2004·Application pending·0 cites
- 1341US2006199021A1Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity filmNARITA TAKENORI·Filed 2006·Application pending·0 cites
- 1436US2009214796A1Method for Forming Antireflection FilmOKANIWA KAORU·Filed 2006·Application pending·0 cites
- 1534US2008260956A1Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic PartSAKURAI HARUAKI·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →