Stage system, exposure apparatus, and device manufacturing method

Abstract

A stage system that can meet enlargement of a stroke and thus, particularly, that can be suitably incorporated into an electron beam exposure apparatus. The stage system includes a first fixed guide having a plane along X and Y directions, a first movable guide to be guided by the first fixed guided (the first movable guide having a Y guide 3 f extending in the Y direction), a second fixed guide having a plane along X and Y directions, a second movable guide to be guided by the second fixed guide (the second movable guide having an X guide extending in the X direction), and a central movable member to be guided in the X and Y directions by the Y guide and the X guide.

1 . A stage system, comprising: 
 a first fixed guide having a first guide surface being parallel to or approximately parallel to a first direction and a second direction being orthogonal to or approximately orthogonal to the first direction;    a first movable guide to be guided by said first fixed guide and having three freedoms of straight motions in the first and second directions and a motion in a rotational direction about a third direction being orthogonal to or approximately orthogonal to the first and second directions, said first movable guide having a first guide extending in the second direction;    a second fixed guide having a second guide surface being parallel to or approximately parallel to the first and second directions;    a second movable guide to be guided by said second fixed guide and having three freedoms of straight motions in the first and second directions and a motion in a rotational direction about the third direction, said second movable guide having a second guide extending in the first direction; and    a central movable member to be guided in the first and second directions by means of said first and second guides.    
   
   
       2 - 15 . (canceled)