Substrate processing apparatus

Abstract

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a washing processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The washing processing block comprises washing processing group. A resist film is formed in the resist film processing block. Before the substrate is subjected to exposure processing by the exposure device, the substrate is subjected to washing and drying processing in the washing processing group.

1 . A substrate processing apparatus that is arranged adjacent to an exposure device, comprising: 
 a processing section for applying processing to a substrate; and    an interface that is provided on one end of said processing section for exchanging the substrate between said processing section and said exposure device, wherein    said processing section includes:    a first processing block that includes a first processing unit that forms a photosensitive film made of photosensitive material, a first thermal processing unit that thermally treats the substrate, and a first transport unit that transports the substrate;    a second processing block that includes a second processing unit that applies a development processing to the substrate after the exposure processing by said exposure device, a second thermal processing unit that thermally treats the substrate, and a second transport unit that transports the substrate; and    a third processing block that includes a third processing unit that washes the substrate after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device, and a third transport unit that transports the substrate.    
   
   
       2 . The substrate processing apparatus according to  claim 1 , wherein 
 said third processing block further includes a third thermal processing unit that thermally treats the substrate, and is arranged adjacent to said interface.    
   
   
       3 . The substrate processing apparatus according to  claim 1 , wherein 
 said processing section further comprises a fourth processing block that includes a fourth processing unit that forms an anti-reflection film on the substrate before the formation of said photosensitive film by said first processing unit, a fourth thermal processing unit that thermally treats the substrate, and a fourth transport unit that transports the substrate.    
   
   
       4 . The substrate processing apparatus according to  claim 3 , further comprising an indexer that is arranged adjacent to another end of said processing section and carries in the substrate to said processing section and carries out the substrate from said processing section, wherein 
 said fourth processing block is arranged adjacent to said indexer.    
   
   
       5 . The substrate processing apparatus according to  claim 1 , wherein 
 said interface includes a fifth processing unit that applies given processing to the substrate;    a platform on which the substrate is temporarily mounted;    a fifth transport unit that transports the substrate between said processing section, said fifth processing unit, and said platform; and    a sixth transport unit that transports the substrate between said platform and said exposure device.    
   
   
       6 . The substrate processing apparatus according to  claim 5 , wherein 
 said fifth transport unit includes first and second holders for holding the substrate,    said fifth transport unit holds the substrate with said first holder during the transport of the substrate before the exposure processing by said exposure device, and holds the substrate with said second holder during the transport of the substrate after the exposure processing by said exposure device,    said sixth transport unit includes third and fourth holders for holding the substrate, and    said sixth transport unit holds the substrate with said third holder during the transport of the substrate before the exposure processing by said exposure device, and holds the substrate with said fourth holder during the transport of the substrate after the exposure processing by said exposure device.    
   
   
       7 . The substrate processing apparatus according to  claim 6 , wherein 
 said second holder is provided below said first holder, and said fourth holder is provided below said third holder.    
   
   
       8 . The substrate processing apparatus according to  claim 5 , wherein 
 said fifth processing unit includes an edge exposure unit that subjects a peripheral portion of the substrate to exposure.    
   
   
       9 . The substrate processing apparatus according to  claim 1 , wherein 
 said third processing unit further dries the substrate after washing the substrate.    
   
   
       10 . The substrate processing apparatus according to  claim 9 , wherein 
 said third processing unit comprises:    a substrate holding device that holds the substrate substantially horizontally;    a rotation-driving device that rotates the substrate held on said substrate holding device about an axis vertical to the substrate;    a washing liquid supplier that supplies a washing liquid onto the substrate held on said substrate holding device; and    an inert gas supplier that supplies an inert gas onto the substrate after the washing liquid has been supplied onto the substrate by said washing liquid supplier.    
   
   
       11 . The substrate processing apparatus according to  claim 10 , wherein 
 said inert gas supplier supplies the inert gas so that the washing liquid supplied onto the substrate from said washing liquid supplier is removed from the substrate as the washing liquid moves outwardly from the center of the substrate.    
   
   
       12 . The substrate processing apparatus according to  claim 10 , wherein 
 said third processing unit further comprises a rinse liquid supplier that supplies a rinse liquid onto the substrate after the supply of the washing liquid from said washing liquid supplier and before the supply of the inert gas from said inert gas supplier.    
   
   
       13 . The substrate processing apparatus according to  claim 12 , wherein 
 said inert gas supplier supplies the inert gas so that the rinse liquid supplied onto the substrate from said rinse liquid supplier is removed from the substrate as the rinse liquid moves outwardly from the center of the substrate.    
   
   
       14 . The substrate processing apparatus according to  claim 1 , wherein 
 said third processing unit washes the substrate by supplying a fluid mixture containing a washing liquid and a gas onto the substrate from a fluid nozzle.    
   
   
       15 . The substrate processing apparatus according to  claim 14 , wherein 
 said gas is an inert gas.    
   
   
       16 . The substrate processing apparatus according to  claim 14 , wherein 
 said third processing unit further dries the substrate after washing the substrate.    
   
   
       17 . The substrate processing apparatus according to  claim 16 , wherein 
 said third processing unit includes an inert gas supplier that dries the substrate by supplying an inert gas onto the substrate.    
   
   
       18 . The substrate processing apparatus according to  claim 17 , wherein 
 said fluid nozzle functions as said inert gas supplier.    
   
   
       19 . The substrate processing apparatus according to  claim 17 , wherein 
 said third processing unit further includes:    a substrate holding device that holds the substrate substantially horizontally; and    a rotation-driving device that rotates the substrate held on said substrate holding device about an axis vertical to the substrate.    
   
   
       20 . The substrate processing apparatus according to  claim 17 , wherein 
 said third processing unit supplies the inert gas so that the fluid mixture supplied onto the substrate from said fluid nozzle is removed from the substrate as the fluid mixture moves outwardly from the center of the substrate.    
   
   
       21 . The substrate processing apparatus according to  claim 17 , wherein 
 said third processing unit further includes a rinse liquid supplier that supplies a rinse liquid onto the substrate, after the supply of the fluid mixture from said fluid nozzle and before the supply of the inert gas from said inert gas supplier.    
   
   
       22 . The substrate processing apparatus according to  claim 21 , wherein 
 said fluid nozzle functions as said rinse liquid supplier.    
   
   
       23 . The substrate processing apparatus according to  claim 21 , wherein 
 said third processing unit supplies the inert gas so that the rinse liquid supplied onto the substrate from said rinse liquid supplier is removed from the substrate as the rinse liquid moves outwardly from the center of the substrate.    
   
   
       24 . The substrate processing apparatus according to  claim 14 , wherein 
 said fluid nozzle has a liquid flow passage through which a liquid flows, a gas flow passage through which a gas flows, a liquid discharge port having an opening that communicates with said liquid flow passage, and a gas discharge port that is provided near said liquid discharge port and has an opening that communicates with said gas flow passage.