Inventor · disambiguated record
Masashi Kanaoka
Also filed as: KANAOKA MASASHI
17 granted patents·18 pending applications·122 citations·filing 2005–2017
92Inventor score
Top patents by PatentIndex Score
35 records- 0195US7497633B2Substrate processing apparatus and substrate processing methodSOKUDO CO LTD·Filed 2005·Granted Mar 3, 2009·42 cites·28 claims
- 0292US7604424B2Substrate processing apparatusSOKUDO CO LTD·Filed 2006·Granted Oct 20, 2009·29 cites·26 claims
- 0389US8034190B2Substrate processing apparatus and substrate processing methodSOKUDO CO LTD·Filed 2010·Granted Oct 11, 2011·22 cites·17 claims
- 0487US8496761B2Substrate processing apparatus and substrate processing methodKANEYAMA KOJI·Filed 2010·Granted Jul 30, 2013·5 cites·7 claims
- 0574US8540824B2Substrate processing methodKANEYAMA KOJI·Filed 2010·Granted Sep 24, 2013·3 cites·10 claims
- 0673US8941809B2Substrate processing apparatus and substrate processing methodKANAOKA MASASHI·Filed 2009·Granted Jan 27, 2015·6 cites·22 claims
- 0772US8585830B2Substrate processing apparatus and substrate processing methodYASUDA SHUICHI·Filed 2010·Granted Nov 19, 2013·2 cites·18 claims
- 0870US8356424B2Substrate processing methodDAINIPPON SCREEN MFG·Filed 2010·Granted Jan 22, 2013·2 cites·8 claims
- 0969US8932672B2Substrate processing apparatusKANEYAMA KOJI·Filed 2009·Granted Jan 13, 2015·2 cites·8 claims
- 1068US8894775B2Substrate processing apparatus and substrate processing methodMIYAGI TADASHI·Filed 2008·Granted Nov 25, 2014·3 cites·8 claims
- 1168US8040488B2Substrate processing apparatusSOKUDO CO LTD·Filed 2005·Granted Oct 18, 2011·3 cites·12 claims
- 1264US8218124B2Substrate processing apparatus with multi-speed drying having rinse liquid supplier that moves from center of rotated substrate to its periphery and stops temporarily so that a drying core can formMIYAGI TADASHI·Filed 2008·Granted Jul 10, 2012·2 cites·15 claims
- 1361US9937520B2Substrate treating methodSCREEN HOLDINGS CO LTD·Filed 2015·Granted Apr 10, 2018·1 cites·16 claims
- 1459US9477162B2Substrate processing methodSCREEN SEMICONDUCTOR SOLUTIONS CO LTD·Filed 2014·Granted Oct 25, 2016·0 cites·8 claims
- 1554US2008226830A1Method and system for removal of films from peripheral portions of a substrateSOKUDO CO LTD·Filed 2007·Application pending·0 cites
- 1652US2007190437A1Substrate processing apparatusKANEYAMA KOJI·Filed 2007·Application pending·0 cites
- 1751US2008016714A1Substrate processing apparatusKANEYAMA KOJI·Filed 2007·Application pending·0 cites
- 1850US2016203997A1Substrate processing methodSCREEN SEMICONDUCTOR SOLUTIONS CO LTD·Filed 2016·Application pending·0 cites
- 1949US2007071439A1Substrate processing apparatusKANEYAMA KOJI·Filed 2006·Application pending·0 cites
- 2049US2012037593A1Method and system for removal of films from peripheral portions of a substrateMIYAGI TADASHI·Filed 2011·Application pending·0 cites
- 2149US2006098979A1Substrate processing apparatus and substrate processing methodDAINIPPON SCREEN MFG·Filed 2005·Application pending·0 cites
- 2248US2006159449A1Substrate processing apparatusDAINIPPON SCREEN MFG·Filed 2005·Application pending·0 cites
- 2348US2006098978A1Substrate processing apparatus and substrate processing methodYASUDA SCHUICHI·Filed 2005·Application pending·0 cites
- 2448US2006147202A1Substrate processing apparatus and substrate processing methodDAINIPPON SCREEN MFG·Filed 2005·Application pending·0 cites
- 2547US2010136257A1Substrate processing apparatusSOKUDO CO LTD·Filed 2010·Application pending·0 cites
- 2647US2006152694A1Substrate processing apparatusYASUDA SHUICHI·Filed 2005·Application pending·0 cites
- 2746US10134610B2Substrate processing method for drying a substrate by discharging gas to liquid layer on the substrate while rotating the substrateMIYAGI TADASHI·Filed 2008·Granted Nov 20, 2018·0 cites·2 claims
- 2845US2010129526A1Substrate processing apparatusSOKUDO CO LTD·Filed 2010·Application pending·0 cites
- 2944US2007172234A1Apparatus for and method of processing substrateSHIGEMORI KAZUHITO·Filed 2007·Application pending·0 cites
- 3044US2007274711A1Substrate processing apparatus and substrate processing methodKANEYAMA KOJI·Filed 2007·Application pending·0 cites
- 3144US2007253710A1Method of processing substrate, substrate processing system and substrate processing apparatusKANEYAMA KOJI·Filed 2007·Application pending·0 cites
- 3243US2007147831A1Substrate processing apparatus for performing exposure processKANEYAMA KOJI·Filed 2006·Application pending·0 cites
- 3343US2007147832A1Method of processing substrate, substrate processing system and substrate processing apparatusSHIGEMORI KAZUHITO·Filed 2006·Application pending·0 cites
- 3442US10423070B2Substrate treating methodSCREEN HOLDINGS CO LTD·Filed 2017·Granted Sep 24, 2019·0 cites·15 claims
- 3537US10144033B2Substrate processing apparatus and substrate processing methodSCREEN HOLDINGS CO LTD·Filed 2016·Granted Dec 4, 2018·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →