Substrate processing apparatus

Abstract

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a blush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.

1 . A substrate processing apparatus that is arranged adjacent to an exposure device, comprising: 
 a processing section that subjects a substrate to processing; and    an interface provided adjacent to one end of said processing section for exchanging the substrate between said processing section and said exposure device,    at least one of said processing section and said interface further comprising a first processing unit that cleans an edge of the substrate before exposure processing by the exposure device, and    said first processing unit comprising    a substrate holding device that holds the substrate substantially horizontally,    a rotation driving mechanism that rotates the substrate held by said substrate holding device around an axis perpendicular to the substrate,    a cleaning device that cleans the edge of the substrate rotated by said rotation driving mechanism, and    a position correction device that corrects the position where the substrate is cleaned by said cleaning device.    
   
   
       2 . The substrate processing apparatus according to claim  1 , wherein said position correction device corrects the position of the substrate such that the center of the substrate held by said substrate holding device coincides with the rotation center of the substrate by said rotation driving mechanism.  
   
   
       3 . The substrate processing apparatus according to  claim 2 , wherein said position correction device comprises a plurality of a butting members that abut against outer edges of the substrate to correct the position of the substrate.  
   
   
       4 . The substrate processing apparatus according to  claim 3 , wherein said plurality of abutting members are respectively arranged at positions symmetrical with the rotation center of said substrate used as a basis and move at equal speeds toward the rotation center of said substrate.  
   
   
       5 . The substrate processing apparatus according to  claim 3 , wherein 
 said plurality of abutting members are arranged so as to extend, inclined obliquely upward outward from the rotation center of the substrate by said rotation driving mechanism,    said position correction device further comprises a lifting device that holds said plurality of abutting members so as to be movable upward and downward, and    said lifting device raises said plurality of abutting members such that the plurality of abutting members abut against the outer edges of the substrate.    
   
   
       6 . The substrate processing apparatus according to  claim 2 , wherein said position correction device comprises a supporting member that supports a back surface of the substrate and moves in a substantially horizontal direction to correct the position of the substrate.  
   
   
       7 . The substrate processing apparatus according to  claim 2 , further comprising a substrate position detector that detects the position of the substrate relative to said substrate holding device, and a control device that controls said position correction device on the basis of an output signal of said substrate position detector.  
   
   
       8 . The substrate processing apparatus according to  claim 1 , wherein 
 said position correction device comprises    an edge detector that detects the position of the edge of the substrate rotated by said rotation driving mechanism, and    a cleaning device moving mechanism that moves said cleaning device such that the relative position between said cleaning device and the center of the substrate is held on the basis of the position of the edge of the substrate detected by said edge detector.    
   
   
       9 . The substrate processing apparatus according to  claim 1 , wherein 
 said position correction device comprises    an edge detector that detects the position of the edge of the substrate rotated by said rotation driving mechanism, and    a holding device moving mechanism that moves said substrate holding device such that the relative position between the cleaning device and the center of the substrate is held on the basis of the position of the edge of the substrate detected by said edge detector.    
   
   
       10 . The substrate processing apparatus according to  claim 1 , further comprising 
 a carry-in section that carries the substrate into said first processing unit, and    said position correction device comprising    a carry-in position detector that detects the position of said carry-in section in a case where said carry-in section carries the substrate into said first processing unit, and    a position adjustment device that adjusts the position of said carry-in section on the basis of the position detected by said carry-in position detector.    
   
   
       11 . The substrate processing apparatus according to  claim 1 , wherein 
 said interface comprises a transport device that transports the substrate between said processing section and said exposure device,    said transport device comprises first and second holders that hold the substrate,    said first holder holds the substrate when the substrate -before said exposure processing is transported, and    said second holder holds the substrate when the substrate after said exposure processing is transported.    
   
   
       12 . The substrate processing apparatus according to  claim 11 , wherein said second holder is provided below said first holder.  
   
   
       13 . The substrate processing apparatus according to  claim 1 , wherein said processing section further comprises a second processing unit that forms a photosensitive film made of a photosensitive material on the substrate.  
   
   
       14 . The substrate processing apparatus according to  claim 13 , wherein said processing section further comprises a third processing unit that forms a protective film for protecting said photosensitive film.  
   
   
       15 . The substrate processing apparatus according to  claim 14 , wherein said processing section further comprises a fourth processing unit that removes said protective film after said exposure processing.  
   
   
       16 . The substrate processing apparatus according to  claim 13 , wherein said processing section further comprises a fifth processing unit that forms an anti-reflection film on the substrate before said second processing unit forms said photosensitive film.  
   
   
       17 . The substrate processing apparatus according to  claim 1 , wherein said processing section further comprises a sixth processing unit that subjects the substrate to development processing.  
   
   
       18 . The substrate processing apparatus according to  claim 1 , wherein said cleaning device in said first processing unit comprises a two-fluid nozzle that discharges a fluid mixture of a liquid and a gas to the edge of said substrate.  
   
   
       19 . The substrate processing apparatus according to  claim 1 , wherein said cleaning device in said first processing unit comprises a ultrasonic nozzle that discharges ultrasonic waves to the edge of said substrate while applying the ultrasonic waves to said liquid.  
   
   
       20 . A substrate processing apparatus that is arranged adjacent to an exposure device, comprising: 
 a processing section that subjects a substrate to; and    an interface provided adjacent to one end of said processing section for exchanging the substrate between said processing section and said exposure device,    said interface further comprising an edge cleaning unit that cleans an edge of the substrate before exposure processing by the exposure device.