Substrate processing apparatus

Abstract

A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes first and second cleaning/drying processing units. A substrate W is subjected to cleaning and drying processing before exposure processing in the first cleaning/drying processing unit, while being subjected to cleaning and drying processing after the exposure processing in the second cleaning/drying processing unit.

1 . A substrate processing apparatus that is arranged adjacent to an exposure device, comprising: 
 a processing section for subjecting a substrate to processing;    an interface for transferring and receiving the substrate between said processing section and said exposure device,    at least one of said processing section and said interface including    a drying processing unit that subjects the substrate to drying processing, and    said drying processing unit including    a substrate holding device that holds the substrate substantially horizontally,    a rotation driving device that rotates the substrate held by said substrate holding device around an axis perpendicular to the substrate,    a liquid layer formation device that forms a liquid layer on the substrate held by said substrate holding device, and    a gas discharge device that discharges gas toward the center of the liquid layer formed on the substrate by said liquid layer formation device with the substrate rotated by said rotation driving device.    
   
   
       2 . The substrate processing apparatus according to  claim 1 , wherein 
 said rotation driving device rotates the substrate at a first rotational speed when said liquid layer formation device forms said liquid layer and gradually or continuously increases the rotational speed of the substrate to a second rotational speed after said liquid layer formation device forms the liquid layer, and    said gas discharge device discharges the gas to the liquid layer on the substrate rotated at a third rotational speed higher than said first rotational speed and lower than said second rotational speed.    
   
   
       3 . The substrate processing apparatus according to  claim 2 , wherein 
 said rotation driving device maintains the rotational speed of the substrate at a fourth rotational speed higher than said first rotational speed and lower than said second rotational speed for a predetermined time period after said liquid layer formation device forms the liquid layer and before said gas discharge device discharges the gas.    
   
   
       4 . The substrate processing apparatus according to  claim 1 , wherein 
 said drying processing unit further includes    a layer thickness detector that detects the thickness of the liquid layer formed on the substrate by said liquid layer formation device, and    a controller that controls the rotational speed of the substrate by said rotation driving device and the timing of the discharge of the gas by said gas discharge device on the basis of the thickness of the liquid layer detected by said layer thickness detector.    
   
   
       5 . The substrate processing apparatus according to  claim 1 , wherein 
 said drying processing unit subjects the substrate to the drying processing after exposure processing by said exposure device.    
   
   
       6 . The substrate processing apparatus according to  claim 5 , wherein 
 the processing section further includes a development processing unit that subjects the substrate to development processing, and    said drying processing unit subjects the substrate to the drying processing after the exposure processing by said exposure device and before the development processing by said development processing unit.    
   
   
       7 . The substrate processing apparatus according to  claim 1 , wherein 
 said drying processing unit subjects the substrate to the drying processing before the exposure processing by said exposure device.    
   
   
       8 . The substrate processing apparatus according to  claim 7 , wherein 
 said processing section further includes    a photosensitive film formation unit that forms on the substrate a photosensitive film composed of a photosensitive material, and    a protective film formation unit that forms a protective film for protecting said photosensitive film,    said drying processing unit subjecting the substrate to the drying processing after the formation of said photosensitive film and said protective film and before the exposure processing by said exposure device.