Substrate processing apparatus

Abstract

A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.

1 . A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, comprising the steps of:
 forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device;   applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device;   applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing by said exposure device and   applying development processing to the substrate by said third processing unit after the exposure processing by said exposure device,   wherein said step of applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.   
   
   
       2 . The substrate processing method according to  claim 1 , wherein said step of supplying the inert gas includes the steps of:
 rotating the substrate, onto which the washing liquid is supplied, about an axis vertical to the substrate while holding the substrate substantially horizontally, and   supplying the inert gas onto the substrate being rotated.   
   
   
       3 . The substrate processing method according to  claim 2 , wherein said step of supplying the inert gas includes Lhs step of:
 supplying the inert gas so that the washing liquid supplied onto the substrate is removed from the substrate as the washing liquid moves outwardly from the center of the substrate.   
   
   
       4 . The substrate processing method according to  claim 2 , wherein
 said step of applying the drying processing to the substrate further includes the step of supplying a rinse liquid onto the substrate after the supply of the washing liquid and before the supply of the inert gas.   
   
   
       5 . The substrate processing method according to  claim 4 , wherein
 said step of supplying the inert gas includes the step of supplying the inert gas so that the rinse liquid supplied onto the substrate is removed from the substrate as the rinse liquid moves outwardly from the center of the substrate.   
   
   
       6 . The substrate processing method according  claim 1 , wherein said step of supplying the washing liquid includes the step of supplying a fluid mixture containing a washing liquid and a gas from a fluid nozzle of said second processing unit to the substrate. 
   
   
       7 . The substrate processing method according to  claim 6 , wherein said step of applying the drying processing to the substrate includes the step of supplying an inert gas from said fluid nozzle onto the substrate. 
   
   
       8 . The substrate processing method according to  claim 1 , further comprising the steps of:
 transporting the substrate after the washing processing to said exposure device; and   transporting the substrate from said exposure device.   
   
   
       9 . The substrate processing method according to  claim 8 , wherein
 said substrate processing apparatus further comprises a first transport unit including first and second holders,   said step of transporting the substrate to said exposure device includes the step of holding and transporting the substrate with said first holder of said first transport unit to said exposure device, and   said step of transporting the substrate from said exposure device includes the step of holding and transporting the substrate from said exposure device with said second holder of said first transport unit.   
   
   
       10 . The substrate processing method according to  claim 9 , wherein said step of holing and transporting the substrate from said exposure device includes the step of holding and transporting the substrate with said second holder that is provided below said first holder. 
   
   
       11 . The substrate processing method according to  claim 9 , wherein said step of holding and transporting the substrate to said exposure device includes the step of holding and transporting the substrate after the washing processing by said second processing unit, with said first holder of said first transport unit, to said exposure device. 
   
   
       12 . The substrate processing method according to  claim 9 , wherein
 said substrate processing apparatus further include a second transport unit and a platform,   said method further, comprises the step of transporting the substrate by said second transport unit after the washing processing S by said second processing unit and before the exposure processing by said exposure device to said platform, and   said step of holding and transporting the substrate to said exposure device includes the step of holding and transporting the substrate before the exposure processing, mounted on said platform, with said first holder of said first transport unit to said exposure device.   
   
   
       13 . The substrate processing method according to  claim 12 , wherein
 said step of holing and transporting the substrate from said exposure device includes the step of holding and transporting the substrate after the exposure processing by said exposure device from said exposure device to said platform with said second holder of said first transport unit, and   said method further includes the step of transporting the substrate after the exposure processing, mounted on said platform, by said second transport unit.   
   
   
       14 . The substrate processing method according to  claim 13 , wherein said second transport unit includes third and fourth holders,
 said step of transporting the substrate before the exposure processing to said platform by said second transport unit includes the step of holding and transporting the substrate after the washing processing by said second processing unit and before the exposure processing by said exposure device to said platform, with said third holder of said second transport unit, and   said step of transporting the substrate after the exposure processing by said second transport unit includes the step of holding and transporting the substrate after the exposure processing, mounted on said platform, with said fourth holder of said second transport unit.   
   
   
       15 . The substrate processing method according to  claim 14 , wherein
 said step of transporting the substrate after the exposure processing by said second transport unit includes the step of holding and transporting the substrate after the exposure processing, mounted on said platform, with said fourth holder provided below said third holder of said second transport unit.   
   
   
       16 . The substrate processing method according to  claim 15 , wherein
 said platform includes first and second substrate platforms, said step of transporting the substrate before the exposure processing to said platform by said second transport unit includes the step of holding and transporting the substrate after the washing processing by said second processing unit and before the exposure processing by said exposure device to said first substrate platform, with said third holder of said second transport unit,   said step of transporting the substrate before the exposure processing, mounted on said plat form to said exposure device: includes the step of holding and transporting the substrate mounted on said first substrate platform to said exposure device, with said first holder of said first transport unit,   said step of transporting the substrate after the exposure processing from said exposure device to said platform includes the step of transporting the substrate after the exposure processing from said exposure device to said second substrate platform by said second holder of said first transport unit, and   said step of transporting the substrate after the exposure processing, mounted on said plat form includes the step of holding and transporting the substrate after the exposure processing, mounted on said second substrate platform, with said fourth holder of said second transport unit.   
   
   
       17 . The substrate processing method according to  claim 16 ,
 wherein said substrate processing apparatus further includes a fourth processing unit, and   said step of holding and transporting the substrate before the exposure processing to said first substrate plat form, with said third holder of said second transport unit includes the steps of:
 transporting the substrate after the washing processing by said second processing unit and before the exposure processing by said exposure device to said fourth processing unit, by said third holder of said second transport unit, 
 applying given processing to the substrate before the exposure processing, transported by said second transport unit, by said fourth processing unit, and 
 transporting the substrate after the processing by said fourth processing unit to said second substrate platform by said third holder of said second transport unit. 
   
   
   
       18 . The substrate processing method according to  claim 17 ,
 wherein said step of applying the given processing by said fourth processing unit includes the step of subjecting a peripheral portion of the substrate to exposure by said fourth processing unit.   
   
   
       19 . The substrate processing method according to  claim 1 ,
 Wherein said substrate processing apparatus further includes a fifth processing unit, and said method further includes the step of forming an anti-reflection film on the substrate by said fifth processing unit before the formation of said photosensitive film by said first processing unit.