US2007020115A1PendingUtilityA1

Integrated pump apparatus for semiconductor processing

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Assignee: BOC GROUP INCPriority: Jul 1, 2005Filed: Jul 1, 2005Published: Jan 25, 2007
Est. expiryJul 1, 2025(expired)· nominal 20-yr term from priority
Inventors:Graeme HuntleyNeil BelleniePeter HollandMichael Andrew PercyRichard LewingtonDavid C. Wong
F04D 23/008F04D 29/403F04D 19/046F04D 29/522F04D 17/168
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Claims

Abstract

The invention relates to an integrated pump apparatus for use in semiconductor processing. The apparatus may include a turbomolecular pump and a dry pump positioned no more than about 20 centimeters away from each other. The turbomolecular pump and dry pump may share at least one of a common housing and a common controller. The apparatus may also include at least one of an abatement device and a cryogenic water pump.

Claims

exact text as granted — not AI-modified
1 . An apparatus for use in semiconductor processing, comprising: 
 a turbomolecular pump; and    a dry pump,    wherein the turbomolecular pump and the dry pump are coupled together so as to position the turbomolecular pump and the dry pump no more than about 20 centimeters from one another.    
     
     
         2 . The apparatus of  claim 1 , wherein the turbomolecular pump and the dry pump are coupled together so as to position the turbomolecular pump and the dry pump no more than about 10 centimeters from one another.  
     
     
         3 . The apparatus of  claim 1 , wherein the turbomolecular pump and the dry pump are coupled together so as to position the turbomolecular pump and the dry pump no more than about 0.5 centimeters from one another.  
     
     
         4 . The apparatus of  claim 1 , wherein the apparatus comprises at least one of a common housing associated with both of the pumps and a common controller associated with both of the pumps.  
     
     
         5 . The apparatus of  claim 1 , further comprising a semiconductor processing tool associated with the turbomolecular pump and the dry pump, 
 wherein the turbomolecular pump, the dry pump, and the semiconductor processing tool are disposed in a single room of a facility where semiconductors are processed.    
     
     
         6 . The apparatus of  claim 1 , wherein a boundary between the turbomolecular pump and the dry pump is not externally discernable.  
     
     
         7 . The apparatus of  claim 1 , wherein the apparatus includes only one electrical connection configured to provide electrical power input to both of the pumps.  
     
     
         8 . The apparatus of  claim 1 , wherein the apparatus includes only one fluid connection configured to provide fluid to at least one of the pumps.  
     
     
         9 . The apparatus of  claim 1 , wherein the apparatus includes only one cooling water connection configured to provide cooling water to at least one of the pumps.  
     
     
         10 . The apparatus of  claim 1 , wherein the apparatus includes only one nitrogen connection configured to provide nitrogen to at least one of the pumps.  
     
     
         11 . The apparatus of  claim 1 , wherein the apparatus includes only one clean dry air connection configured to provide clean dry air to at least one of the pumps.  
     
     
         12 . The apparatus of  claim 1 , wherein the apparatus comprises a common controller, and wherein the common controller controls both the turbomolecular pump and the dry pump.  
     
     
         13 . The apparatus of  claim 1 , wherein the apparatus comprises a common controller, wherein the apparatus further comprises a cryogenic water pump, and wherein the common controller is associated with the cryogenic water pump.  
     
     
         14 . The apparatus of  claim 13 , wherein a common controller controls the turbomolecular pump, the dry pump, and the cryogenic water pump.  
     
     
         15 . The apparatus of  claim 1 , wherein the apparatus comprises a common controller, wherein the apparatus further comprises an abatement device, and wherein the common controller is associated with the abatement device.  
     
     
         16 . The apparatus of  claim 15 , wherein the common controller controls the turbomolecular pump, the dry pump, and the abatement device.  
     
     
         17 . The apparatus of  claim 1 , wherein the apparatus comprises a common housing and a common controller.  
     
     
         18 . An apparatus for use in semiconductor processing, comprising: 
 a turbomolecular pump; and    a dry pump coupled to the turbomolecular pump,    wherein the apparatus comprises at least one of a common housing associated with both of the pumps and a common controller associated with both of the pumps.    
     
     
         19 . The apparatus of  claim 18 , wherein the apparatus comprises the common housing, and wherein the common housing includes only one electrical connection configured to provide electrical power input to both of the pumps.  
     
     
         20 . The apparatus of  claim 18 , wherein the apparatus comprises the common housing, and wherein the common housing includes only one fluid connection configured to provide fluid to at least one of the pumps.  
     
     
         21 . The apparatus of  claim 18 , wherein the apparatus comprises the common housing, and wherein the common housing includes only one water connection configured to provide water to at least one of the pumps.  
     
     
         22 . The apparatus of  claim 18 , wherein the apparatus comprises the common housing, and wherein the common housing includes only one nitrogen connection configured to provide nitrogen to at least one of the pumps.  
     
     
         23 . The apparatus of  claim 18 , wherein the apparatus comprises the common housing, and wherein the common housing includes only one clean dry air connection configured to provide clean dry air to at least one of the pumps.  
     
     
         24 . The apparatus of  claim 18 , wherein the apparatus comprises the common controller, and wherein the common controller controls both the turbomolecular pump and the dry pump.  
     
     
         25 . The apparatus of  claim 18 , wherein the apparatus comprises the common controller, wherein the apparatus further comprises a cryogenic water pump, and wherein the common controller is also associated with the cryogenic water pump.  
     
     
         26 . The apparatus of  claim 25 , wherein the common controller controls the turbomolecular pump, the dry pump, and the cryogenic water pump.  
     
     
         27 . The apparatus of  claim 18 , wherein the apparatus comprises the common controller, wherein the apparatus further comprises an abatement device, and wherein the common controller is also associated with the abatement device.  
     
     
         28 . The apparatus of  claim 27 , wherein the common controller controls the turbomolecular pump, the dry pump, and the abatement device.  
     
     
         29 . The apparatus of  claim 18 , wherein the apparatus comprises the common housing and the common controller.  
     
     
         30 . The apparatus of  claim 18 , further comprising a semiconductor processing tool associated with the turbomolecular pump and the dry pump, 
 wherein the turbomolecular pump, the dry pump, and the semiconductor processing tool are disposed in a single room of a facility where semiconductors are processed.    
     
     
         31 . The apparatus of  claim 18 , wherein a boundary between the turbomolecular pump and the dry pump is not externally discernable.  
     
     
         32 . An apparatus for use in semiconductor processing, comprising: 
 a turbomolecular pump;    a dry pump coupled to the turbomolecular pump;    a semiconductor processing tool associated with the turbomolecular pump and the dry pump,    wherein the turbomolecular pump, the dry pump, and the semiconductor processing tool are disposed in a single room of a facility where semiconductors are processed.    
     
     
         33 . The apparatus of  claim 32 , wherein the boundary between the turbomolecular pump and the dry pump is not externally discernable.  
     
     
         34 . The apparatus of  claim 1 , wherein the turbomolecular pump and the dry pump share a common facility distribution path.  
     
     
         35 . The apparatus of  claim 18 , wherein the turbomolecular pump and the dry pump share a common facility distribution path.

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