Inventor · disambiguated record
Richard Lewington
Also filed as: LEWINGTON RICHARD
17 granted patents·6 pending applications·189 citations·filing 2005–2015
94Inventor score
Top patents by PatentIndex Score
23 records- 0193US7601272B2Method and apparatus for integrating metrology with etch processingAPPLIED MATERIALS INC·Filed 2006·Granted Oct 13, 2009·26 cites·14 claims
- 0292US7909961B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 22, 2011·21 cites·4 claims
- 0392US7846848B2Cluster tool with integrated metrology chamber for transparent substratesAPPLIED MATERIALS INC·Filed 2006·Granted Dec 7, 2010·25 cites·18 claims
- 0491US7976671B2Mask etch plasma reactor with variable process gas distributionAPPLIED MATERIALS INC·Filed 2006·Granted Jul 12, 2011·20 cites·16 claims
- 0591US7520999B2Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Apr 21, 2009·16 cites·20 claims
- 0690US7943005B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted May 17, 2011·15 cites·19 claims
- 0789US9218944B2Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensorsCHANDRACHOOD MADHAVI R·Filed 2006·Granted Dec 22, 2015·15 cites·12 claims
- 0888US7967930B2Plasma reactor for processing a workpiece and having a tunable cathodeAPPLIED MATERIALS INC·Filed 2006·Granted Jun 28, 2011·11 cites·21 claims
- 0987US7504041B2Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Mar 17, 2009·13 cites·15 claims
- 1083US8017029B2Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backsideAPPLIED MATERIALS INC·Filed 2006·Granted Sep 13, 2011·7 cites·19 claims
- 1182US8002946B2Mask etch plasma reactor with cathode providing a uniform distribution of etch rateAPPLIED MATERIALS INC·Filed 2006·Granted Aug 23, 2011·8 cites·11 claims
- 1275US8012366B2Process for etching a transparent workpiece including backside endpoint detection stepsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·3 cites·16 claims
- 1372US7964818B2Method and apparatus for photomask etchingAPPLIED MATERIALS INC·Filed 2006·Granted Jun 21, 2011·3 cites·11 claims
- 1472US7419551B2Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Sep 2, 2008·4 cites·16 claims
- 1565US7431797B2Plasma reactor with a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Oct 7, 2008·2 cites·19 claims
- 1648US10170280B2Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wallAPPLIED MATERIALS INC·Filed 2015·Granted Jan 1, 2019·0 cites·15 claims
- 1748US8568553B2Method and apparatus for photomask plasma etchingKUMAR AJAY·Filed 2011·Granted Oct 29, 2013·0 cites·20 claims
- 1848US2008099437A1Plasma reactor for processing a transparent workpiece with backside process endpoint detectionLEWINGTON RICHARD·Filed 2006·Application pending·0 cites
- 1944US2008099450A1Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distributionAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2044US2006154388A1Integrated metrology chamber for transparent substratesLEWINGTON RICHARD·Filed 2005·Application pending·0 cites
- 2142US2008099451A1Workpiece rotation apparatus for a plasma reactor systemLEWINGTON RICHARD·Filed 2006·Application pending·0 cites
- 2240US2007020115A1Integrated pump apparatus for semiconductor processingBOC GROUP INC·Filed 2005·Application pending·0 cites
- 2335US2010276391A1Inductively coupled plasma reactor having rf phase control and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →