US2007184757A1PendingUtilityA1

Polishing sheet and polishing work method

Assignee: FUJI SPINNING CO LTDPriority: Jun 3, 2003Filed: Apr 9, 2007Published: Aug 9, 2007
Est. expiryJun 3, 2023(expired)· nominal 20-yr term from priority
Y10T428/24355Y10T428/249976Y10T428/249986B24B 37/24Y10T428/24372B32B 5/18B32B 2264/10Y10T428/249953B32B 27/40B32B 2307/51Y10T428/249967B32B 2266/0278B24D 3/32B32B 2266/06
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Claims

Abstract

The present invention provides a polishing sheet that can secure a flatness of a material to be polished and can improve a polishing efficiency. A polishing pad 1 has a polyurethane sheet 2 made of polyurethane resin. The polyurethane sheet 2 has large cells 3 with a generally triangular sectional configuration rounded along a thickness direction thereof. Polyurethane resin exists in the polyurethane sheet 2 in a partition wall manner and fine foams 4 are formed in the polyurethane resin. Fine particles 5 added during manufacture of the polyurethane sheet 2 exist inside some of the fine foams 4 and the fine particles 5 are separable from the fine foams. By separating off fine particles positioned at a polishing face P by dummy polishing or the like, fine foams which evenly reserve a polishing liquid containing abrasive particles are formed at the polishing face P.

Claims

exact text as granted — not AI-modified
1 . A polishing work method for a material to be polished, which uses a polishing sheet which has an elastic plastic foam sheet in which fine particles are contained and has a fine foam structure to be formed at a polishing face thereof by separating off the fine particles, comprising the steps of; 
 attaching the polishing sheet to a surface plate of a polishing machine; and    after all the fine particles are substantially separated off from the polishing face, performing polishing work with the polishing sheet to the material to be polished by using a polishing liquid containing abrasive particles.    
     
     
         2 . A polishing work method according to  claim 1 , wherein all the fine particles are substantially separated off from the polishing face due to dummy polishing by the polishing machine.

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