Polishing pad

Abstract

A polishing pad includes a main body having a polishing surface and a backing that is affixed to the back surface of the main body. The elasticity of the main body is within the range of 600 psi-16000 psi and preferably within the range of 1600 psi-16000 psi when a compressive pressure of 2 psi-16 psi is applied, and the thickness of the main body is within the range of 0.5 mm-3.0 mm. The elasticity of the backing is lower than that of the main body and exceeds 300 psi when a compressive pressure of 2 psi-16 psi is applied.

1 . A polishing pad comprising: 
 a main body having a polishing surface; and    a backing affixed to the back surface of said main body;    wherein said main body has elasticity within the range of 600 psi-16000 psi when a compressive pressure of 2 psi-16 psi is applied; and    wherein said backing, when a compressive pressure of 2 psi-16 psi is applied, has elasticity lower than the elasticity of said main body and exceeds 300 psi.    
     
     
         2 . The polishing pad of  claim 1  wherein said main body has elasticity within the range of 1600 psi-16000 psi when a compressive pressure of 2 psi-16 psi is applied  
     
     
         3 . The polishing pad of  claim 2  wherein said main body has a thickness of 0.5 mm-3.0 mm.  
     
     
         4 . The polishing pad of  claim 1  wherein said main body comprises one selected from the group consisting of pads made of a foamed material having a synthetic resin as material thereof; pads made of a non-woven cloth comprising synthetic fibers; pads made of a synthetic resin having microcapsules mixed thereinto.  
     
     
         5 . The polishing pad of  claim 1  wherein said backing comprises one selected from the group consisting of pads made of a foamed material having a synthetic resin as material thereof; pads made of a non-woven cloth comprising synthetic fibers; pads made of a synthetic resin having microcapsules mixed thereinto.