Plasma Processing Apparatus And Method

Abstract

A plasma processing apparatus includes a sample stage disposed at a lower part of a processing chamber, a bell jar made of an insulative material constituting an upper portion of a vacuum vessel, a coil antenna disposed outside and around the bell jar to which electric power is supplied so as to generate the plasma in a plasma generating space inside of the bell jar, and a Faraday shield mounted on the bell jar and disposed between an external surface of the bell jar and the coil antenna. A ring shaped member made of an electric conductive material is disposed inside of an inner surface of a ring portion of the processing chamber located below a skirt portion of the bell jar and constitutes a part of the processing chamber. The ring shaped member extends upwardly so as to cover a portion of an inner surface of the bell jar.

1 . A plasma processing apparatus for processing a sample which is located in a processing chamber disposed inside a vacuum vessel using a plasma generated in the processing chamber comprising: 
 a sample stage disposed at a lower part of the processing chamber on which the sample is located;    a bell jar made of an insulative material constituting an upper portion of the vacuum vessel, which is disposed at an upper part of the sample stage and the processing chamber;    a coil antenna disposed outside and around the bell jar to which electric power is supplied so as to generate the plasma in a plasma generating space inside of the bell jar;    a Faraday shield mounted on the bell jar and disposed between an external surface of the bell jar and the coil antenna;    a ring shaped member made of an electric conductive material which is disposed inside of an inner surface of a ring portion of the processing chamber located below a skirt portion of the bell jar and constituting a part of the processing chamber, the ring shaped member extending upwardly so as to cover a portion of an inner surface of the bell jar.    
   
   
       2 . A plasma processing apparatus according to  claim 1 , wherein the ring shaped member extends so as to cover the inner surface of the portion of the bell jar where a distance between the inner surface of the portion of the bell jar and the Faraday shield is large.  
   
   
       3 . A plasma processing apparatus according to  claim 1 , wherein the ring shaped member extends to cover a boundary of the bell jar and the ring portion of the processing chamber.  
   
   
       4 . A plasma processing apparatus according to  claim 1 , wherein the ring shaped member is connected to ground.  
   
   
       5 . A plasma processing apparatus according to  claim 2 , wherein the ring shaped member is connected to ground.  
   
   
       6 . A plasma processing apparatus according to  claim 3 , wherein the ring shaped member is connected to ground.  
   
   
       7 . A plasma processing apparatus according to  claim 1 , wherein the Faraday shield is supplied with radio frequency power.  
   
   
       8 . A plasma processing apparatus according to  claim 2 , wherein the Faraday shield is supplied with radio frequency power.  
   
   
       9 . A plasma processing apparatus according to  claim 3 , wherein the Faraday shield is supplied with radio frequency power.  
   
   
       10 . A plasma processing apparatus according to  claim 1 , wherein a top of an extended portion of the ring shaped member has a knife edge shape in cross section.  
   
   
       11 . A plasma processing apparatus according to  claim 2 , wherein a top of an extended portion of the ring shaped member has a knife edge shape in cross section.  
   
   
       12 . A plasma processing apparatus according to  claim 3 , wherein a top of an extended portion of the ring shaped member has a knife edge shape in cross section.