Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask

Abstract

A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.

1 . An apparatus configured to inspect an object, said apparatus comprising: 
 a first optical system configured to expose a first portion of the object with a first light beam;    a second optical system configured to expose a second portion of the object with a second light beam, the second portion of said object being substantially spaced from said first portion;    a first sensor configured to sense a transmitted image of said first portion of said object, said transmitted image corresponding to a portion of said first light beam passing through said first portion of said object, and generate first image data in response to said transmitted image;    a second sensor configured to sense a reflected image of said second portion of said object, said reflected image corresponding to a portion of said second light beam reflected off said second portion of said object, and generate second image data in response to said reflected image;    a third optical system configured to focus said transmitted image on to said first sensor, and focus the reflected image on to the second sensor; and    a defect detecting circuit configured to detect a defect of said object based upon said first and second image data.    
   
   
       2 . (canceled)  
   
   
       3 . An apparatus according to  claim 1 , wherein the first sensor and the second sensor include time delayed integration sensors.  
   
   
       4 . An apparatus according to  claim 1 , wherein the first sensor and the second sensor include one-dimensional sensors.  
   
   
       5 . An apparatus according to  claim 1 , wherein the first sensor and the second sensor include area-sensors.  
   
   
       6 . (canceled)  
   
   
       7 . An apparatus according to  claim 1 , wherein the first sensor and the second sensor are positioned relative to one another.  
   
   
       8 . (canceled)  
   
   
       9 . (canceled)  
   
   
       10 . An apparatus according to  claim 1 , further comprising a light source configured to supply first optical energy corresponding to said first light beam, and second optical energy corresponding to said second light beam.  
   
   
       11 . A method for inspecting an object, comprising: 
 exposing a first portion of said object with a first light beam;    exposing a second portion of said object with a second light beam, the second portion being spaced from the first portion;    sensing a transmitted image of a mask with a first sensor, said transmitted image corresponding to a portion of said first light beam passing through said object;    sensing a reflected image of the mask with a second sensor, said reflected image corresponding to a portion of said second light beam reflected off said object; and    outputting signals representing data of the transmitted and reflected images so as to detect defects associated with said object based upon said transmitted and reflected images.    
   
   
       12 . (canceled)  
   
   
       13 . A method for inspecting an object according to  claim 11 , wherein the first sensor and the second sensor include time delay integration sensors.  
   
   
       14 . A method for inspecting an object according to  claim 11 , wherein said first sensor and said second sensor include one-dimensional sensors.  
   
   
       15 . A method for inspecting an object according to  claim 11 , wherein the first sensor and the second sensor include area-sensors.  
   
   
       16 . (canceled)  
   
   
       17 . A method for inspecting an object according to  claim 11 , wherein the first sensor and the second sensor are positioned relative to one another.  
   
   
       18 . (canceled)  
   
   
       19 . (canceled)  
   
   
       20 . A method of manufacturing a mask comprising: 
 fabricating the mask by forming a pattern on a substrate;    inspecting the mask, said inspecting comprising:    exposing a first portion of the mask with a first light beam;    exposing a second portion of the mask with a second light beam, the second portion being spaced from the first portion;    sensing a transmitted image of the mask with a first sensor, said transmitted image corresponding to a portion of said first light beam passing through said mask;    sensing a reflected image of the mask with a second sensor, said reflected image corresponding to a portion of said second light beam reflected off said mask; and    outputting signals representing data of the transmitted and reflected images so as to detect defects in said mask based on said transmitted and reflected images.