Exposure Apparatus, Exposure Method, and Method for Producing Device

Abstract

An exposure apparatus has a projection optical system. The projection optical system has a first optical element closest to an image plane thereof and a second optical element which is second closest to the image plane with respect to the first optical element. The first optical element has a lower surface arranged opposite to a surface of a substrate and an upper surface arranged opposite to the second optical element. A space between the second optical element and the upper surface of the first optical element is filled with a second liquid so that a liquid immersion area is formed in an area of the upper surface, the area including an area through which an exposure light beam passes. The substrate is exposed by radiating the exposure light beam onto the substrate through a first liquid on a side of the lower surface of the first optical element and the second liquid on a side of the upper surface. It is possible to avoid any deterioration of the exposure accuracy caused by the pollution of the optical element, and to suppress any enormous expansion of the liquid immersion area.

1 . An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising: 
 a projection optical system which has a plurality of elements including a first element closest to an image plane and a second element which is second closest to the image plane with respect to the first element, wherein:    the first element has a first surface which is arranged opposite to a surface of the substrate and through which the exposure light beam passes, and a second surface which is arranged opposite to the second element and through which the exposure light beam passes; the first element and the second element are supported in a substantially stationary state with respect to an optical axis of the projection optical system; a space between the second element and the second surface of the first element is filled with a second liquid so that only a partial area, which includes an area of the second surface of the first element through which the exposure light beam passes, serves as a liquid immersion area; and the exposure light beam is radiated onto the substrate to expose the substrate through a first liquid on a side of the first surface of the first element and the second liquid on a side of the second surface.    
   
   
       2 . The exposure apparatus according to  claim 1 , wherein the liquid, which is disposed between the first element and the second element, is retained by a surface tension.  
   
   
       3 . The exposure apparatus according to  claim 1 , wherein an outer diameter of a surface of the second element opposed to the first element is smaller than an outer diameter of the second surface of the first element.  
   
   
       4 . An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising: 
 a projection optical system which has a plurality of elements including a first element closest to an image plane and a second element which is second closest to the image plane with respect to the first element, wherein:    the first element has a first surface which is arranged opposite to a surface of the substrate and through which the exposure light beam passes, and a second surface which is arranged opposite to the second element and through which the exposure light beam passes;    an outer diameter of a surface of the second element opposed to the first element is smaller than an outer diameter of the second surface of the first element;    the first element and the second element are supported in a substantially stationary state with respect to an optical axis of the projection optical system; and    the exposure light beam is radiated onto the substrate to expose the substrate through a first liquid on a side of the first surface of the first element and a second liquid on a side of the second surface.    
   
   
       5 . The exposure apparatus according to  claim 1 , wherein the first surface and the second surface of the first element are substantially in parallel to each other.  
   
   
       6 . The exposure apparatus according to  claim 1 , wherein a distance between the first surface and the second surface of the first element on the optical axis of the projection optical system is not less than 15 mm.  
   
   
       7 . The exposure apparatus according to  claim 1 , wherein: 
 a partial area of the second surface of the first element, which serves as the liquid immersion area, is designated as a first area, and an area, which is disposed therearound, is designated as a second area; and    an affinity of a surface of the first area for the second liquid is higher than an affinity of a surface of the second area for the second liquid.    
   
   
       8 . The exposure apparatus according to  claim 7 , wherein the surface of the second area is liquid-repellent with respect to the second liquid.  
   
   
       9 . The exposure apparatus according to  claim 1 , further comprising: 
 a first liquid immersion mechanism which fills a space between the substrate and the first surface of the first element with the first liquid; and    a second liquid immersion mechanism which fills a space between the first element and the second element with the second liquid.    
   
   
       10 . The exposure apparatus according to  claim 9 , wherein each of the first liquid immersion mechanism and the second liquid immersion mechanism has a supply port and a recovery port for the liquid.  
   
   
       11 . The exposure apparatus according to  claim 9 , wherein the first liquid and the second liquid are an identical liquid.  
   
   
       12 . The exposure apparatus according to  claim 9 , wherein the second liquid immersion mechanism has a liquid recovery port which is arranged to surround the liquid immersion area formed on the second surface of the first element.  
   
   
       13 . The exposure apparatus according to  claim 9 , wherein: 
 the first liquid immersion mechanism has an inclined surface which is formed opposite to the surface of the substrate; and    the first liquid immersion mechanism has a liquid recovery port which is formed on the inclined surface.    
   
   
       14 . The exposure apparatus according to  claim 13 , wherein the inclined surface is formed so that a spacing distance between the inclined surface and the surface of the substrate is increased at positions separated farther from the optical axis of the exposure light beam.  
   
   
       15 . The exposure apparatus according to  claim 13 , wherein: 
 the inclined surface is formed to surround a projection area onto which the exposure light beam is radiated; and    the liquid recovery port of the first liquid immersion mechanism is arranged to surround the projection area onto which the exposure light beam is radiated.    
   
   
       16 . The exposure apparatus according to  claim 13 , wherein a porous member is arranged in the liquid recovery port of the first liquid immersion mechanism.  
   
   
       17 . The exposure apparatus according to  claim 13 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed between the inclined surface and the projection area to be irradiated with the exposure light beam, which is substantially in parallel to the surface of the substrate, and which is formed continuously to the inclined surface; and    the flat portion is formed to surround the projection area.    
   
   
       18 . The exposure apparatus according to  claim 17 , wherein the flat portion of the first liquid immersion mechanism is arranged between the substrate and the first surface of the first element.  
   
   
       19 . The exposure apparatus according to  claim 9 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed opposite to the surface of the substrate and which is substantially in parallel to the surface of the substrate; and    the flat portion is arranged between the substrate and the first surface of the first element to surround a projection area onto which the exposure light beam is radiated.    
   
   
       20 . The exposure apparatus according to  claim 19 , wherein the first liquid immersion mechanism has a liquid recovery port which is disposed outside the flat portion with respect to the projection area and which is arranged to surround the flat portion.  
   
   
       21 . The exposure apparatus according to  claim 19 , wherein the first liquid immersion mechanism has a liquid recovery port which is arranged outside the flat portion with respect to the projection area onto which the exposure light beam is radiated.  
   
   
       22 . An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a first liquid, the exposure apparatus comprising: 
 a projection optical system which has a plurality of elements including a first element closest to an image plane and a second element which is second closest to the image plane with respect to the first element; and    a first liquid immersion mechanism which supplies the first liquid, wherein:    the first element has a first surface which is arranged opposite to a surface of the substrate and through which the exposure light beam passes, and a second surface which is arranged opposite to the second element and which is substantially in parallel to the first surface;    an outer diameter of the second surface of the first element is greater than an outer diameter of the first surface of the first element; and    the exposure light beam is radiated onto the substrate to expose the substrate through the first liquid between the first element and the substrate.    
   
   
       23 . The exposure apparatus according to  claim 22 , wherein: 
 a space between the first element and the second element is filled with a second liquid; and    the exposure light beam is radiated onto the substrate through the first liquid and the second liquid to expose the substrate.    
   
   
       24 . The exposure apparatus according to  claim 22 , wherein an outer diameter of a surface of the second element opposed to the second surface of the first element is smaller than the outer diameter of the second surface of the first element.  
   
   
       25 . The exposure apparatus according to  claim 22 , further comprising a second liquid immersion mechanism which fills a space between the first element and the second element with a second liquid.  
   
   
       26 . The exposure apparatus according to  claim 25 , wherein the second liquid is the same as the first liquid.  
   
   
       27 . The exposure apparatus according to  claim 25 , wherein the second liquid immersion mechanism has a supply port which supplies the second liquid, and a recovery port which recovers the second liquid.  
   
   
       28 . The exposure apparatus according to  claim 25 , wherein the second liquid immersion mechanism forms a liquid immersion area in only a partial area of the second surface of the first element.  
   
   
       29 . The exposure apparatus according to  claim 22 , wherein a distance between the first surface and the second surface of the first element on an optical axis of the projection optical system is not less than 15 mm.  
   
   
       30 . An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a first liquid, the exposure apparatus comprising: 
 a first liquid immersion mechanism which provides the first liquid onto the substrate; and    a projection optical system which has a plurality of elements including a first element closest to an image plane and a second element which is second closest to the image plane with respect to the first element, wherein:    the first element is arranged so that a first surface of the first element is opposed to a surface of the substrate, and a second surface of the first element is opposed to the second element;    a distance between the first surface and the second surface of the first element on an optical axis of the projection optical system is not less than 15 mm; and    the exposure light beam is radiated onto the substrate to expose the substrate through a first liquid on a side of the first surface of the first element.    
   
   
       31 . The exposure apparatus according to  claim 30 , wherein the first surface and the second surface are substantially in parallel to each other.  
   
   
       32 . The exposure apparatus according to  claim 22 , wherein: 
 the first liquid immersion mechanism has an inclined surface which is formed opposite to the surface of the substrate; and    the first liquid immersion mechanism has a liquid recovery port which is formed on the inclined surface.    
   
   
       33 . The exposure apparatus according to  claim 32  wherein the inclined surface is formed so that a spacing distance between the inclined surface and the surface of the substrate is increased at positions separated farther from the optical axis of the exposure light beam.  
   
   
       34 . The exposure apparatus according to  claim 32 , wherein a porous member is arranged in the liquid recovery port of the first liquid immersion mechanism.  
   
   
       35 . The exposure apparatus according to  claim 32 , wherein the inclined surface is formed to surround a projection area onto which the exposure light beam is radiated.  
   
   
       36 . The exposure apparatus according to  claim 35 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed between the inclined surface and the projection area to be irradiated with the exposure light beam, which is substantially in parallel to the surface of the substrate, and which is formed continuously to the inclined surface; and    the flat portion is formed to surround the projection area.    
   
   
       37 . The exposure apparatus according to  claim 22 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed opposite to the surface of the substrate and which is substantially in parallel to the surface of the substrate; and    the flat portion is arranged to surround a projection area onto which the exposure light beam is radiated.    
   
   
       38 . The exposure apparatus according to  claim 36 , wherein the flat portion of the first liquid immersion mechanism is arranged opposite to the surface of the substrate between the substrate and the first surface of the first element.  
   
   
       39 . The exposure apparatus according to  claim 37 , wherein the first liquid immersion mechanism has a liquid recovery port which is arranged outside the flat portion with respect to the projection area onto which the exposure light beam is radiated.  
   
   
       40 . The exposure apparatus according to  claim 22 , wherein the first liquid immersion mechanism has a liquid recovery port which is arranged to surround a projection area onto which the exposure light beam is radiated.  
   
   
       41 . The exposure apparatus according to  claim 40 , wherein the liquid recovery port of the first liquid immersion mechanism, which is formed to surround the projection area, has an outer diameter which is smaller than an outer diameter of the second surface of the first element.  
   
   
       42 . The exposure apparatus according to  claim 40 , wherein the liquid recovery port of the first liquid immersion mechanism is arranged around the first surface of the first element so that the liquid supply port is opposed to the surface of the substrate between the first element and the substrate.  
   
   
       43 . The exposure apparatus according to  claim 22 , wherein: 
 the first element has a third surface which is formed around the first surface; and    the distance between the first surface and the second surface of the first element is longer than a distance between the second surface and the third surface of the first element.    
   
   
       44 . The exposure apparatus according to  claim 22 , wherein a surface of the second element, which is opposed to the first element, is smaller than the second surface of the first element.  
   
   
       45 . The exposure apparatus according to  claim 22 , wherein the outer diameter of the second surface of the first element is not less than twice the outer diameter of the first surface of the first element.  
   
   
       46 . The exposure apparatus according to  claim 25 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed opposite to the surface of the substrate and which is substantially in parallel to the surface of the substrate; and    the flat portion is arranged to surround an optical path for the exposure light beam between the substrate and the first surface of the first element.    
   
   
       47 . The exposure apparatus according to  claim 46 , wherein the first liquid immersion mechanism has a plate which is arranged between the first element and the substrate and which includes an opening through which the exposure light beam passes and the flat portion formed around the opening.  
   
   
       48 . The exposure apparatus according to  claim 46 , wherein a distance between the first surface and the second surface of the first element is greater than a distance between the substrate and the first surface of the first element on an optical axis of the projection optical system.  
   
   
       49 . The exposure apparatus according to  claim 25 , wherein a distance between the first surface and the second surface of the first element is greater than a distance between the substrate and the first surface of the first element on an optical axis of the projection optical system.  
   
   
       50 . The exposure apparatus according to  claim 46 , wherein the first liquid immersion mechanism has a recovery port which is arranged at a position opposed to the substrate and which recovers the first liquid from the surface of the substrate.  
   
   
       51 . The exposure apparatus according to  claim 37 , wherein the first liquid immersion mechanism has a plate which is arranged between the first element and the substrate and which includes an opening through which the exposure light beam passes and the flat portion formed around the opening.  
   
   
       52 . The exposure apparatus according to  claim 37 , wherein a distance between the first surface and the second surface of the first element is greater than a distance between the substrate and the first surface of the first element on an optical axis of the projection optical system.  
   
   
       53 . The exposure apparatus according to  claim 25 , wherein a surface of the second element, which is opposed to the first element, is smaller than the second surface of the first element.  
   
   
       54 . The exposure apparatus according to  claim 22 , wherein a distance between the first surface and the second surface of the first element is greater than a distance between the substrate and the first surface of the first element on an optical axis of the projection optical system.  
   
   
       55 . The exposure apparatus according to  claim 30 , wherein the exposure light beam is radiated onto the substrate through the first liquid and a second liquid between the second element and the second surface of the first element.  
   
   
       56 . The exposure apparatus according to  claim 30 , wherein the first liquid immersion mechanism has a nozzle member which is provided with a liquid supply port and a liquid recovery port, and the nozzle member is positioned below the second surface of the first element.  
   
   
       57 . An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a first liquid, the exposure apparatus comprising: 
 a first liquid immersion mechanism which provides the first liquid onto the substrate; and    a projection optical system which has a plurality of elements including a first element closest to an image plane and a second element which is second closest to the image plane with respect to the first element, wherein:    the first element has a first surface which is arranged opposite to a surface of the substrate and through which the exposure light beam passes, and a second surface which is arranged opposite to the second element and through which the exposure light beam passes;    a distance between the first surface and the second surface of the first element on an optical axis of the projection optical system is greater than a distance between the first surface of the first element and the surface of the substrate on the optical axis of the projection optical system; and    the exposure light beam is radiated onto the substrate to expose the substrate through the first liquid between the substrate and the first surface of the first element and a second liquid between the second element and the second surface of the first element.    
   
   
       58 . The exposure apparatus according to  claim 57 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed opposite to the surface of the substrate and which is substantially in parallel to the surface of the substrate; and    the flat portion is arranged to surround an optical path for the exposure light beam between the substrate and the first surface of the first element.    
   
   
       59 . The exposure apparatus according to  claim 58 , wherein the first liquid immersion mechanism includes a plate which is arranged between the first element and the substrate, and the plate has the flat portion and an opening through which the exposure light beam passes.  
   
   
       60 . The exposure apparatus according to  claim 57 , wherein a surface of the second element, which is opposed to the first element, is smaller than the second surface of the first element.  
   
   
       61 . The exposure apparatus according to  claim 60 , further comprising a second liquid immersion mechanism which provides the second liquid to a space between the first element and the second element independently from the first liquid immersion mechanism.  
   
   
       62 . The exposure apparatus according to  claim 57 , further comprising a second liquid immersion mechanism which provides the second liquid to a space between the first element and the second element independently from the first liquid immersion mechanism.  
   
   
       63 . The exposure apparatus according to  claim 61 , wherein: 
 the first liquid immersion mechanism includes a supply port for supplying the first liquid and a recovery port for recovering the first liquid from a position above the substrate, the supply port and the recovery port being disposed in the vicinity of a space between the first element and the substrate; and    the second liquid immersion mechanism includes a supply port for supplying the second liquid, the supply port being disposed in the vicinity of the space between the first element and the second element.    
   
   
       64 . An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a first liquid, the exposure apparatus comprising: 
 a projection optical system which has a plurality of elements including a first element closest to an image plane and a second element which is second closest to the image plane with respect to the first element;    a first liquid immersion mechanism which provides the first liquid to a space between the first element and the substrate; and    a second liquid immersion mechanism which provides a second liquid to a space between the first element and the second element independently from the first liquid immersion mechanism, wherein:    the first element has a first surface which is arranged opposite to a surface of the substrate and through which the exposure light beam passes, and a second surface which is arranged opposite to the second element and through which the exposure light beam passes;    the first liquid immersion mechanism has a flat liquid contact surface which is arranged opposite to the surface of the substrate, the liquid contact surface being arranged to surround an optical path for the exposure light beam between the substrate and the first surface of the first element; and    the exposure light beam is radiated onto the substrate to expose the substrate through the first liquid between the substrate and the first surface of the first element and the second liquid between the second element and the second surface of the first element.    
   
   
       65 . The exposure apparatus according to  claim 64 , wherein the first liquid immersion mechanism includes a plate which is arranged between the first element and the substrate, and the plate has the liquid contact surface and an opening through which the exposure light beam passes.  
   
   
       66 . The exposure apparatus according to  claim 64 , wherein a surface of the second element, which is opposed to the first element, is smaller than the second surface of the first element.  
   
   
       67 . The exposure apparatus according to  claim 66 , wherein: 
 the first liquid immersion mechanism includes a supply port for supplying the first liquid and a recovery port for recovering the first liquid from a position above the substrate, the supply port and the recovery port being disposed in the vicinity of a space between the first element and the substrate; and    the second liquid immersion mechanism includes a supply port for supplying the second liquid, the supply port being disposed in the vicinity of the space between the first element and the second element.    
   
   
       68 . The exposure apparatus according to  claim 64 , wherein: 
 the first liquid immersion mechanism includes a supply port for supplying the first liquid and a recovery port for recovering the first liquid from a position above the substrate, the supply port and the recovery port being disposed in the vicinity of the space between the first element and the substrate; and    the second liquid immersion mechanism includes a supply port for supplying the second liquid, the supply port being disposed in the vicinity of the space between the first element and the second element.    
   
   
       69 . The exposure apparatus according to  claim 1 , wherein the first element and the second element are supported by an identical support member.  
   
   
       70 . The exposure apparatus according to  claim 1 , wherein the space between the first element and the second element is not communicated with a space between the first element and the substrate.  
   
   
       71 . The exposure apparatus according to  claim 1 , wherein the first element has no refractive power.  
   
   
       72 . The exposure apparatus according to  claim 1 , further comprising a recovery port which recovers the first liquid, and a porous member which is provided in the recovery port, wherein a condition of (4×g×cos θ)/d 3 (Pa−Pb) holds provided that Pa represents a pressure of a space between the porous member and the substrate, Pb represents a pressure of a flow passage space over the porous member, d represents a pore size of the porous member, θ represents a contact angle of the porous member with respect to the liquid, and γ represents a surface tension of the liquid.  
   
   
       73 . The exposure apparatus according to  claim 1 , wherein a plate, which is formed with an opening through which the exposure light beam passes, is provided between the first element and the substrate.  
   
   
       74 . The exposure apparatus according to  claim 73 , wherein a supply port, which supplies the first liquid, is formed in the vicinity of the opening of the plate.  
   
   
       75 . The exposure apparatus according to  claim 73 , wherein a recovery port, which recovers the first liquid, is formed around the opening of the plate.  
   
   
       76 . A method for producing a device, comprising using the exposure apparatus as defined in  claim 1 .  
   
   
       77 . An exposure method for exposing a substrate by radiating an exposure light beam onto the substrate via a liquid and a projection optical system including a first element closest to an image plane and a second element which is second closest to the image plane with respect to the first element, wherein: 
 a first surface of the first element, which is opposed to the substrate, is smaller than a second surface of the first element which is opposed to the second element; and    a surface of the second element, which is opposed to the first element, is smaller than the second surface of the first element, the exposure method comprising:    providing a first liquid to a space between the substrate and the first surface of the first element;    providing a second liquid to a space between the first element and the second element; and    exposing the substrate by radiating the exposure light beam onto the substrate through the first liquid and the second liquid.    
   
   
       78 . The exposure method according to  claim 77 , further comprising supplying and recovering the first liquid with respect to the space between the substrate and the first surface of the first element during the exposure for the substrate.  
   
   
       79 . The exposure method according to  claim 78 , further comprising stopping supply of the second liquid to the space between the first element and the second element during the exposure for the substrate.  
   
   
       80 . The exposure method according to  claim 78 , further comprising stopping recovery of the second liquid from the space between the first element and the second element during the exposure for the substrate.  
   
   
       81 . A method for producing a device, comprising exposing a substrate in accordance with the exposure method as defined in  claim 77 .  
   
   
       82 . The exposure apparatus according to  claim 4 , wherein the first surface and the second surface of the first element are substantially in parallel to each other.  
   
   
       83 . The exposure apparatus according to  claim 4 , wherein a distance between the first surface and the second surface of the first element on the optical axis of the projection optical system is not less than 15 mm.  
   
   
       84 . The exposure apparatus according to  claim 4 , wherein: 
 a partial area of the second surface of the first element, which serves as the liquid immersion area, is designated as a first area, and an area, which is disposed therearound, is designated as a second area; and    an affinity of a surface of the first area for the second liquid is higher than an affinity of a surface of the second area for the second liquid.    
   
   
       85 . The exposure apparatus according to  claim 84 , wherein the surface of the second area is liquid-repellent with respect to the second liquid.  
   
   
       86 . The exposure apparatus according to  claim 4 , further comprising: 
 a first liquid immersion mechanism which fills a space between the substrate and the first surface of the first element with the first liquid; and    a second liquid immersion mechanism which fills a space between the first element and the second element with the second liquid.    
   
   
       87 . The exposure apparatus according to  claim 86 , wherein each of the first liquid immersion mechanism and the second liquid immersion mechanism has a supply port and a recovery port for the liquid.  
   
   
       88 . The exposure apparatus according to  claim 86 , wherein the first liquid and the second liquid are an identical liquid.  
   
   
       89 . The exposure apparatus according to  claim 86 , wherein the second liquid immersion mechanism has a liquid recovery port which is arranged to surround the liquid immersion area formed on the second surface of the first element.  
   
   
       90 . The exposure apparatus according to  claim 86 , wherein: 
 the first liquid immersion mechanism has an inclined surface which is formed opposite to the surface of the substrate; and    the first liquid immersion mechanism has a liquid recovery port which is formed on the inclined surface.    
   
   
       91 . The exposure apparatus according to  claim 90 , wherein the inclined surface is formed so that a spacing distance between the inclined surface and the surface of the substrate is increased at positions separated farther from the optical axis of the exposure light beam.  
   
   
       92 . The exposure apparatus according to  claim 90 , wherein: 
 the inclined surface is formed to surround a projection area onto which the exposure light beam is radiated; and    the liquid recovery port of the first liquid immersion mechanism is arranged to surround the projection area onto which the exposure light beam is radiated.    
   
   
       93 . The exposure apparatus according to  claim 90 , wherein a porous member is arranged in the liquid recovery port of the first liquid immersion mechanism.  
   
   
       94 . The exposure apparatus according to  claim 90 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed between the inclined surface and the projection area to be irradiated with the exposure light beam, which is substantially in parallel to the surface of the substrate, and which is formed continuously to the inclined surface; and    the flat portion is formed to surround the projection area.    
   
   
       95 . The exposure apparatus according to  claim 94 , wherein the flat portion of the first liquid immersion mechanism is arranged between the substrate and the first surface of the first element.  
   
   
       96 . The exposure apparatus according to  claim 86 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed opposite to the surface of the substrate and which is substantially in parallel to the surface of the substrate; and    the flat portion is arranged between the substrate and the first surface of the first element to surround a projection area onto which the exposure light beam is radiated.    
   
   
       97 . The exposure apparatus according to  claim 96 , wherein the first liquid immersion mechanism has a liquid recovery port which is disposed outside the flat portion with respect to the projection area and which is arranged to surround the flat portion.  
   
   
       98 . The exposure apparatus according to  claim 96 , wherein the first liquid immersion mechanism has a liquid recovery port which is arranged outside the flat portion with respect to the projection area onto which the exposure light beam is radiated.  
   
   
       99 . The exposure apparatus according to  claim 30 , wherein: 
 the first liquid immersion mechanism has an inclined surface which is formed opposite to the surface of the substrate; and    the first liquid immersion mechanism has a liquid recovery port which is formed on the inclined surface.    
   
   
       100 . The exposure apparatus according to  claim 99 , wherein the inclined surface is formed so that a spacing distance between the inclined surface and the surface of the substrate is increased at positions separated farther from the optical axis of the exposure light beam.  
   
   
       101 . The exposure apparatus according to  claim 99 , wherein a porous member is arranged in the liquid recovery port of the first liquid immersion mechanism.  
   
   
       102 . The exposure apparatus according to  claim 99 , wherein the inclined surface is formed to surround a projection area onto which the exposure light beam is radiated.  
   
   
       103 . The exposure apparatus according to  claim 102 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed between the inclined surface and the projection area to be irradiated with the exposure light beam, which is substantially in parallel to the surface of the substrate, and which is formed continuously to the inclined surface; and    the flat portion is formed to surround the projection area.    
   
   
       104 . The exposure apparatus according to  claim 30 , wherein: 
 the first liquid immersion mechanism has a flat portion which is formed opposite to the surface of the substrate and which is substantially in parallel to the surface of the substrate; and    the flat portion is arranged to surround a projection area onto which the exposure light beam is radiated.    
   
   
       105 . The exposure apparatus according to  claim 103 , wherein the flat portion of the first liquid immersion mechanism is arranged opposite to the surface of the substrate between the substrate and the first surface of the first element.  
   
   
       106 . The exposure apparatus according to  claim 104 , wherein the first liquid immersion mechanism has a liquid recovery port which is arranged outside the flat portion with respect to the projection area onto which the exposure light beam is radiated.  
   
   
       107 . The exposure apparatus according to  claim 30 , wherein the first liquid immersion mechanism has a liquid recovery port which is arranged to surround a projection area onto which the exposure light beam is radiated.  
   
   
       108 . The exposure apparatus according to  claim 107 , wherein the liquid recovery port of the first liquid immersion mechanism, which is formed to surround the projection area, has an outer diameter which is smaller than an outer diameter of the second surface of the first element.  
   
   
       109 . The exposure apparatus according to  claim 107 , wherein the liquid recovery port of the first liquid immersion mechanism is arranged around the first surface of the first element so that the liquid supply port is opposed to the surface of the substrate between the first element and the substrate.  
   
   
       110 . The exposure apparatus according to  claim 30 , wherein: 
 the first element has a third surface which is formed around the first surface; and    the distance between the first surface and the second surface of the first element is longer than a distance between the second surface and the third surface of the first element.    
   
   
       111 . The exposure apparatus according to  claim 30 , wherein a surface of the second element, which is opposed to the first element, is smaller than the second surface of the first element.  
   
   
       112 . The exposure apparatus according to  claim 104 , wherein the first liquid immersion mechanism has a plate which is arranged between the first element and the substrate and which includes an opening through which the exposure light beam passes and the flat portion formed around the opening.  
   
   
       113 . The exposure apparatus according to  claim 104 , wherein a distance between the first surface and the second surface of the first element is greater than a distance between the substrate and the first surface of the first element on an optical axis of the projection optical system.  
   
   
       114 . The exposure apparatus according to  claim 104 , wherein a surface of the second element, which is opposed to the first element, is smaller than the second surface of the first element.  
   
   
       115 . The exposure apparatus according to  claim 4 , wherein the first element and the second element are supported by an identical support member.  
   
   
       116 . The exposure apparatus according to  claim 22 , wherein the first element and the second element are supported by an identical support member.  
   
   
       117 . The exposure apparatus according to  claim 30 , wherein the first element and the second element are supported by an identical support member.  
   
   
       118 . The exposure apparatus according to  claim 57 , wherein the first element and the second element are supported by an identical support member.  
   
   
       119 . The exposure apparatus according to  claim 64 , wherein the first element and the second element are supported by an identical support member.  
   
   
       120 . The exposure apparatus according to  claim 4 , wherein the space between the first element and the second element is not communicated with a space between the first element and the substrate.  
   
   
       121 . The exposure apparatus according to  claim 22 , wherein the space between the first element and the second element is not communicated with a space between the first element and the substrate.  
   
   
       122 . The exposure apparatus according to  claim 30 , wherein the space between the first element and the second element is not communicated with a space between the first element and the substrate.  
   
   
       123 . The exposure apparatus according to  claim 57 , wherein the space between the first element and the second element is not communicated with a space between the first element and the substrate.  
   
   
       124 . The exposure apparatus according to  claim 64 , wherein the space between the first element and the second element is not communicated with a space between the first element and the substrate.  
   
   
       125 . The exposure apparatus according to  claim 4 , wherein the first element has no refractive power.  
   
   
       126 . The exposure apparatus according to  claim 22 , wherein the first element has no refractive power.  
   
   
       127 . The exposure apparatus according to  claim 30 , wherein the first element has no refractive power.  
   
   
       128 . The exposure apparatus according to  claim 57 , wherein the first element has no refractive power.  
   
   
       129 . The exposure apparatus according to  claim 64 , wherein the first element has no refractive power.  
   
   
       130 . The exposure apparatus according to  claim 4 , further comprising a recovery port which recovers the first liquid, and a porous member which is provided in the recovery port, wherein a condition of (4×g×cosq)/d 3 (Pa−Pb) holds provided that Pa represents a pressure of a space between the porous member and the substrate, Pb represents a pressure of a flow passage space over the porous member, d represents a pore size of the porous member, q represents a contact angle of the porous member with respect to the liquid, and g represents a surface tension of the liquid.  
   
   
       131 . The exposure apparatus according to  claim 22 , further comprising a recovery port which recovers the first liquid, and a porous member which is provided in the recovery port, wherein a condition of (4×g×cosq)/d 3 (Pa−Pb) holds provided that Pa represents a pressure of a space between the porous member and the substrate, Pb represents a pressure of a flow passage space over the porous member, d represents a pore size of the porous member, q represents a contact angle of the porous member with respect to the liquid, and g represents a surface tension of the liquid.  
   
   
       132 . The exposure apparatus according to  claim 30 , further comprising a recovery port which recovers the first liquid, and a porous member which is provided in the recovery port, wherein a condition of (4×g×cosq)/d 3 (Pa−Pb) holds provided that Pa represents a pressure of a space between the porous member and the substrate, Pb represents a pressure of a flow passage space over the porous member, d represents a pore size of the porous member, q represents a contact angle of the porous member with respect to the liquid, and g represents a surface tension of the liquid.  
   
   
       133 . The exposure apparatus according to  claim 57 , further comprising a recovery port which recovers the first liquid, and a porous member which is provided in the recovery port, wherein a condition of (4×g×cosq)/d 3 (Pa−Pb) holds provided that Pa represents a pressure of a space between the porous member and the substrate, Pb represents a pressure of a flow passage space over the porous member, d represents a pore size of the porous member, q represents a contact angle of the porous member with respect to the liquid, and g represents a surface tension of the liquid.  
   
   
       134 . The exposure apparatus according to  claim 64 , further comprising a recovery port which recovers the first liquid, and a porous member which is provided in the recovery port, wherein a condition of (4×g×cosq)/d 3 (Pa−Pb) holds provided that Pa represents a pressure of a space between the porous member and the substrate, Pb represents a pressure of a flow passage space over the porous member, d represents a pore size of the porous member, q represents a contact angle of the porous member with respect to the liquid, and g represents a surface tension of the liquid.  
   
   
       135 . The exposure apparatus according to  claim 4 , wherein a plate, which is formed with an opening through which the exposure light beam passes, is provided between the first element and the substrate.  
   
   
       136 . The exposure apparatus according to  claim 22 , wherein a plate, which is formed with an opening through which the exposure light beam passes, is provided between the first element and the substrate.  
   
   
       137 . The exposure apparatus according to  claim 30 , wherein a plate, which is formed with an opening through which the exposure light beam passes, is provided between the first element and the substrate.  
   
   
       138 . The exposure apparatus according to  claim 57 , wherein a plate, which is formed with an opening through which the exposure light beam passes, is provided between the first element and the substrate.  
   
   
       139 . The exposure apparatus according to  claim 64 , wherein a plate, which is formed with an opening through which the exposure light beam passes, is provided between the first element and the substrate.  
   
   
       140 . The exposure apparatus according to  claim 135 , wherein a supply port, which supplies the first liquid, is formed in the vicinity of the opening of the plate.  
   
   
       141 . The exposure apparatus according to  claim 136 , wherein a supply port, which supplies the first liquid, is formed in the vicinity of the opening of the plate.  
   
   
       142 . The exposure apparatus according to  claim 137 , wherein a supply port, which supplies the first liquid, is formed in the vicinity of the opening of the plate.  
   
   
       143 . The exposure apparatus according to  claim 138 , wherein a supply port, which supplies the first liquid, is formed in the vicinity of the opening of the plate.  
   
   
       144 . The exposure apparatus according to  claim 139 , wherein a supply port, which supplies the first liquid, is formed in the vicinity of the opening of the plate.  
   
   
       145 . The exposure apparatus according to  claim 135 , wherein a recovery port, which recovers the first liquid, is formed around the opening of the plate.  
   
   
       146 . The exposure apparatus according to  claim 136 , wherein a recovery port, which recovers the first liquid, is formed around the opening of the plate.  
   
   
       147 . The exposure apparatus according to  claim 137 , wherein a recovery port, which recovers the first liquid, is formed around the opening of the plate.  
   
   
       148 . The exposure apparatus according to  claim 138 , wherein a recovery port, which recovers the first liquid, is formed around the opening of the plate.  
   
   
       149 . The exposure apparatus according to  claim 139 , wherein a recovery port, which recovers the first liquid, is formed around the opening of the plate.  
   
   
       150 . A method for producing a device, comprising using the exposure apparatus as defined in  claim 4 .  
   
   
       151 . A method for producing a device, comprising using the exposure apparatus as defined in  claim 22 .  
   
   
       152 . A method for producing a device, comprising using the exposure apparatus as defined in  claim 30 .  
   
   
       153 . A method for producing a device, comprising using the exposure apparatus as defined in  claim 57 .  
   
   
       154 . A method for producing a device, comprising using the exposure apparatus as defined in  claim 64.