Method and apparatus for wafer cleaning

Abstract

An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.

1 . A wafer holding apparatus, comprising: 
 a bracket capable of rotating about an axis, having at least three points of contact with the wafer; wherein the wafer position is maintained onto the bracket by gravity.    
   
   
       2 . The apparatus of  claim 1 , wherein the bracket is capable of translating along the axis.  
   
   
       3 . The apparatus of  claim 1 , wherein the contact points are pads.  
   
   
       4 . The apparatus of  claim 3 , wherein the pads are an elastomer.  
   
   
       5 . The apparatus of  claim 3 , wherein the pads are positioned on a plurality of posts.