US2008099175A1PendingUtilityA1

Method for in-gas micro/nanoimprinting of bulk metallic glass

Assignee: CHU JINN PPriority: Oct 30, 2006Filed: Apr 27, 2007Published: May 1, 2008
Est. expiryOct 30, 2026(~0.3 yrs left)· nominal 20-yr term from priority
B22D 21/00B22D 17/2245C22C 45/00
47
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

A method for in-gas micro/nanoimprinting of bulk metallic glass includes steps of preparing a die, heating the bulk metallic glass and in-gas micro/nanoimprinting of the bulk metallic glass. In the step of preparing a die, the die has a micro/nano structure having multiple depressions and a flow channel connected to the depressions. In the step of heating the bulk metallic glass, the bulk metallic glass is heated to a temperature between a glass transition temperature and a crystallization temperature of the bulk metallic glass. In the step of in-gas micro/nanoimprinting, the bulk metallic glass is forced into the die in presence of gas to imprint a complementing micro/nano structure on the bulk metallic glass. Because the die has a flow channel to allow air or gas to escape from the micro/nano structure of the die, the micro/nanoimprinting can be performed in presence of air or gas.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method for in-gas micro/nanoimprinting of bulk metallic glass comprising steps of
 preparing a die having
 a micro/nano structure having multiple depressions and 
 a flow channel being connected to the depressions; 
   heating the bulk metallic glass to a temperature between a glass transition temperature and a crystallization temperature of the bulk metallic glass; and   in-gas micro/nanoimprinting of the bulk metallic glass by forcing the bulk metallic glass into the die in presence of gas to imprint a complementing micro/nano structure on the bulk metallic glass.   
     
     
         2 . The method for in-gas micro/nanoimprinting of bulk metallic glass as claimed in  claim 1 , wherein
 the micro/nano structure on the die is a grating of micro/nano-scale period having multiple parallel and equally spaced groove-shaped depressions; and   the flow channel is connected transversely to the groove-shaped depressions.   
     
     
         3 . The method for in-gas micro/nanoimprinting of bulk metallic glass as claimed in  claim 2 , wherein
 the flow channel is deeper than the groove-shaped depressions.   
     
     
         4 . The method for in-gas micro/nanoimprinting of bulk metallic glass as claimed in  claim 1 , wherein
 the die further has
 at lest one guide channel being connected to the flow channel; and 
 an outlet being connected to the at least one guide channel. 
   
     
     
         5 . The method for in-gas micro/nanoimprinting of bulk metallic glass as claimed in  claim 4 , wherein
 the bulk metallic glass comprises
 a primary element being selected form the group consisting of Cu, Pd, Zr, Ce or Au; and 
 at least two secondary elements being selected from the group consisting of Al, Zr, Cu, Pd, Ti, Ni, Ag, Hf, lanthanide series elements, VIB, VIIB and VIIIB transition metals, P and Si and being different from the primary element. 
   
     
     
         6 . The method for in-gas micro/nanoimprinting of bulk metallic glass as claimed in  claim 1 , wherein
 the bulk metallic glass comprises
 a primary element being selected form the group consisting of Cu, Pd, Zr, Ce or Au; and 
 at least two secondary elements being selected from the group consisting of Al, Zr, Cu, Pd, Ti, Ni, Ag, Hf, lanthanide series elements, VIB, VIIB and VIIIB transition metals, P and Si and being different from the primary element. 
   
     
     
         7 . The method for in-gas micro/nanoimprinting of bulk metallic glass as claimed in  claim 2 , wherein
 the bulk metallic glass comprises
 a primary element being selected form the group consisting of Cu, Pd, Zr, Ce or Au; and 
 at least two secondary elements being selected from the group consisting of Al, Zr, Cu, Pd, Ti, Ni, Ag, Hf, lanthanide series elements, VIB, VIIB and VIIIB transition metals, P and Si and being different from the primary element. 
   
     
     
         8 . The method for in-gas micro/nanoimprinting of bulk metallic glass as claimed in  claim 3 , wherein
 the bulk metallic glass comprises
 a primary element being selected form the group consisting of Cu, Pd, Zr, Ce or Au; and 
 at least two secondary elements being selected from the group consisting of Al, Zr, Cu, Pd, Ti, Ni, Ag, Hf, lanthanide series elements, VIB, VIIB and VIIIB transition metals, P and Si and being different from the primary element. 
   
     
     
         9 . The method for in-gas micro/nanoimprinting of bulk metallic glass as claimed in  claim 1 , wherein the bulk metallic glass is served as a die after the step of in-gas micro/nanoimprinting of the bulk metallic glass.

Join the waitlist — get patent alerts

Track US2008099175A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.