Thin film forming apparatus

Abstract

Provided is a thin film forming apparatus that can focus ion beams onto a target and reduce a manufacturing cost. In a thin film forming apparatus radiating an ion beam ( 17 ) from an ion source ( 22 ) toward a target ( 6 ) and forming a thin film on a surface of a substrate ( 5 ) with particles sputtered by the ion beam, the ion source ( 22 ) includes an electrode for extracting ions from plasma and accelerating the extracted ions. The electrode includes a plate-shaped accelerator electrode ( 26 ) in which a plurality of accelerator apertures are bored, and a plate-shaped decelerator electrode ( 27 ) in which a plurality of decelerator apertures are bored. The plurality of accelerator apertures and the plurality of decelerator apertures are aligned and offset to focus the ion beams ( 17 ).

1 . A thin film forming apparatus radiating an ion beam from an ion source toward a target and forming a thin film on a surface of a substrate with particles sputtered by the ion beam,
 wherein the ion source includes an electrode for extracting ions from plasma and accelerating the extracted ions, the electrode including:   a plate-shaped accelerator electrode in which a plurality of accelerator apertures are bored; and   a plate-shaped decelerator electrode in which a plurality of decelerator apertures are bored,   wherein the plurality of accelerator apertures and the plurality of decelerator apertures are aligned and offset to focus the ion beams.   
     
     
         2 . The thin film forming apparatus of  claim 1 , wherein the plurality of accelerator apertures are arranged such that the center points of the adjacent accelerator apertures form a regular triangle. 
     
     
         3 . The thin film forming apparatus of  claim 1 , wherein the plurality of decelerator apertures are offset outward from the center of the electrode with respect to the plurality of accelerator apertures.