Inventor · disambiguated record
Kenji Shirako
Also filed as: SHIRAKO KENJI
12 granted patents·7 pending applications·370 citations·filing 2008–2022
89Inventor score
Files withKOKUSAI ELECTRIC CORP6HITACHI INT ELECTRIC INC5SHIRAKO KENJI2FUKUDA MASANAO1HIROCHI YUKITOMO1
Top patents by PatentIndex Score
19 records- 0196US10590531B1Substrate processing apparatus, and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2019·Granted Mar 17, 2020·338 cites·10 claims
- 0293US11935762B2Substrate processing apparatus, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Granted Mar 19, 2024·3 cites·14 claims
- 0393US10550468B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2017·Granted Feb 4, 2020·4 cites·12 claims
- 0490US11450536B2Substrate processing apparatus and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2021·Granted Sep 20, 2022·2 cites·19 claims
- 0589US11124873B2Substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2019·Granted Sep 21, 2021·4 cites·14 claims
- 0685US9074284B2Heat treatment apparatusFUKUDA MASANAO·Filed 2010·Granted Jul 7, 2015·7 cites·12 claims
- 0782US9418881B2Substrate processing apparatus capable of switching control mode of heaterSUGIURA SHINOBU·Filed 2011·Granted Aug 16, 2016·9 cites·6 claims
- 0865US2021254211A1Substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2021·Application pending·0 cites
- 0963US9222732B2Substrate processing apparatus and method of manufacturing semiconductor deviceSHIRAKO KENJI·Filed 2011·Granted Dec 29, 2015·2 cites·15 claims
- 1062US12489010B2Substrate processing apparatus and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2021·Granted Dec 2, 2025·0 cites·19 claims
- 1157US9084298B2Substrate processing apparatus including shielding unit for suppressing leakage of magnetic fieldHIROCHI YUKITOMO·Filed 2011·Granted Jul 14, 2015·1 cites·7 claims
- 1245US2008179186A1Thin film forming apparatusSHIMURA KAZUHIRO·Filed 2008·Application pending·0 cites
- 1342US8771416B2Substrate processing apparatus with an insulator disposed in the reaction chamberSAIDO SHUHEI·Filed 2010·Granted Jul 8, 2014·0 cites·10 claims
- 1437US2011204036A1Heat treatment apparatusHITACHI INT ELECTRIC INC·Filed 2011·Application pending·0 cites
- 1537US2012214317A1Substrate processing apparatus and method, and semiconductor device manufacturing methodMUROBAYASHI MASAKI·Filed 2012·Application pending·0 cites
- 1637US2010224128A1Semiconductor manufacturing apparatusHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 1737US2011056434A1Heat treatment apparatusHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 1836US10837112B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2017·Granted Nov 17, 2020·0 cites·3 claims
- 1932US2012156886A1Substrate processing apparatus, method of manufacturing substrate, and method of manufacturing semiconductor deviceSHIRAKO KENJI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →