US2008185616A1PendingUtilityA1

Semiconductor device-based sensors and methods associated with the same

56
Assignee: NITRONEX CORPPriority: Jun 28, 2004Filed: Jan 31, 2008Published: Aug 7, 2008
Est. expiryJun 28, 2024(expired)· nominal 20-yr term from priority
G01N 27/129G01N 27/4148
56
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Claims

Abstract

Semiconductor device-based chemical sensors and methods associated with the same are provided. The sensors include regions that can interact with chemical species being detected. The chemical species may, for example, be a component of a fluid (e.g., gas or liquid). The interaction between the chemical species and a region of the sensor causes a change in a measurable property (e.g., an electrical property) of the device. These changes may be related to the concentration of the chemical species in the medium being characterized.

Claims

exact text as granted — not AI-modified
1 . A FET-based chemical sensor designed to detect a chemical species comprising:
 a semiconductor material region;   a source electrode formed on the semiconductor material region;   a drain electrode formed on the semiconductor material region;   a gate electrode formed on the semiconductor material region; and   a sensing region, separated from the gate electrode, and capable of interacting with the chemical species to change a measurable property of the chemical sensor.   
     
     
         2 . The sensor of  claim 1 , wherein the sensing region comprises a sensing layer. 
     
     
         3 . The sensor of  claim 2 , wherein the sensing layer has a thickness of less than 500 nm. 
     
     
         4 . The sensor of  claim 2 , wherein the sensing region further comprises a surface region of the semiconductor material region positioned under the sensing layer. 
     
     
         5 . The sensor of  claim 1 , wherein the sensing region comprises an exposed surface region of the semiconductor material region. 
     
     
         6 . The sensor of  claim 1 , wherein the sensing region is formed between the source electrode and the drain electrode. 
     
     
         7 . The sensor of  claim 1 , wherein a ratio of sensing electrode surface area to total channel surface area is greater than 0.35. 
     
     
         8 . The sensor of  claim 1 , wherein the sensing region comprises a sensing electrode. 
     
     
         9 . The sensor of  claim 8 , wherein a separate voltage may be applied to each of the source, drain, gate and sensing electrodes. 
     
     
         10 . The sensor of  claim 1 , wherein respective electrical contacts to each of the source, drain, gate and sensing electrodes are formed on a backside of the sensor. 
     
     
         11 . The sensor of  claim 1 , wherein the sensor is substantially free of electrical contacts on a frontside of the sensor in areas separate from the sensing region. 
     
     
         12 . The sensor of  claim 1 , wherein the semiconductor region comprises a gallium nitride material layer. 
     
     
         13 . The sensor of  claim 12 , wherein the sensing region is formed, at least in part, in the gallium nitride material layer. 
     
     
         14 . The sensor of  claim 12 , wherein the gallium nitride material layer has a crack level of less than about 0.005 micron/micron 2 . 
     
     
         15 . The sensor of  claim 1 , further comprising a substrate. 
     
     
         16 . The sensor of  claim 15 , wherein the substrate is a silicon substrate. 
     
     
         17 - 28 . (canceled) 
     
     
         29 . A semiconductor device-based chemical sensor comprising:
 a semiconductor material region;   a first electrode formed on the semiconductor material region;   a second electrode formed on the semiconductor material region;   a first electrical contact extending from a backside of the sensor to the first electrode;   a second electrical contact extending from a backside of the sensor to the second electrode; and   a sensing region, separated from the first electrode and the second electrode, and capable of interacting with the chemical species to change a measurable property of the chemical sensor.   
     
     
         30 . The chemical sensor of  claim 29 , further comprising a third electrode, wherein the first electrode is a source electrode, the second electrode is a drain electrode and the third electrode is a gate electrode. 
     
     
         31 . A method of detecting chemical species comprising:
 exposing a FET-based chemical sensor to a medium comprising chemical species; and   measuring changes in drain current of the sensor resulting from adsorption of the chemical species on a sensing region separated from the gate electrode to detect chemical species.   
     
     
         32 - 39 . (canceled)

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