Apparatus and method for cleaning a glass substrate before photoresist coating

Abstract

A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.

1 - 11 . (canceled) 
     
     
         12 . An apparatus for cleaning a glass substrate before photoresist coating, wherein a metal film is formed on the surface of said glass substrate, said apparatus comprising:
 a developer nozzle, connected with a developer supply source and providing a developer desired for cleaning said glass substrate;   a set of clean water nozzles, connected to a clean water supply source and providing the clean water desired for cleaning said glass substrate; and   a delivering band carrying said glass substrate to first pass said developer nozzle for developer immersing and then to pass said set of clean water nozzles for clean water rinsing.   
     
     
         13 . The apparatus of  claim 12 , further comprising a recycling pipeline for recycling excess liquids during said glass substrate is cleaned. 
     
     
         14 . The apparatus of  claim 12 , wherein said developer is a tetramethylammonium hydroxide (TMAH) solution in a concentration of between 0.35% and 0.45%. 
     
     
         15 . The apparatus of  claim 14 , wherein said developer nozzle sprays said tetramethylammonium hydroxide (TMAH) solution onto the surface of said metal film of said glass substrate. 
     
     
         16 . The apparatus of  claim 12 , wherein said clean water from said clean water supply source is deionized water. 
     
     
         17 . The apparatus of  claim 12 , wherein said clean water nozzles rinse the surface of said metal film of said glass substrate in manner of high pressure spraying. 
     
     
         18 . The apparatus of  claim 12 , wherein said clean water nozzles rinse the surface of said metal film of said glass substrate in combination with a mega sonic wave. 
     
     
         19 . The apparatus of  claim 12 , further comprising an air scraper which is used to dry the surface of said metal film after completion of rinsing said glass substrate. 
     
     
         20 . The apparatus of  claim 12 , wherein said set of clean water nozzles includes at least one clean water nozzle.