Cleaning apparatus for a probe

Abstract

The present invention provides a cleaning apparatus capable of removing foreign matters attached to a tip of a probe effectively without impairing the durability of the probe. The cleaning apparatus for the probe comprises a base plate having a rough surface and a surface layer formed to conform to and cover the rough surface for the purpose of providing a polishing surface for the probe and having lower hardness than hardness of the probe tip of the probe.

1 . A cleaning apparatus for removing foreign matters attached to a probe, comprising:
 a base plate having a rough surface; and   a surface layer formed to conform to and cover said rough surface for the purpose of providing a polishing surface for said probe and having lower hardness than hardness of a probe tip of said probe.   
   
   
       2 . The cleaning apparatus according to  claim 1 , wherein said surface layer has a smooth surface along said rough surface. 
   
   
       3 . The cleaning apparatus according to  claim 1  or  2 , wherein the thickness of said surface layer is 0.05 to 1.0 micrometers. 
   
   
       4 . The cleaning apparatus according to  claim 1 , wherein the arithmetic mean roughness (Ra) of said rough surface is 0.02 to 1.00 micrometers. 
   
   
       5 . The cleaning apparatus according to  claim 1 , wherein said base plate comprises a silicon plate whose surface is formed to be a rough surface by sandblast. 
   
   
       6 . The cleaning apparatus according to  claim 1 , wherein the Vickers hardness (Hv) of the probe tip of said probe is 800 to 1000, and said surface layer is formed by depositing a metal material having the Vickers hardness (Hv) of 400 to 600 to cover said rough surface. 
   
   
       7 . The cleaning apparatus according to  claim 6 , wherein said metal material is nickel or a nickel alloy. 
   
   
       8 . The cleaning apparatus according to  claim 2  wherein the arithmetic mean roughness (Ra) of said rough surface is 0.02 to 1.00 micrometers. 
   
   
       9 . The cleaning apparatus according to  claim 3  wherein the arithmetic mean roughness (Ra) of said rough surface is 0.02 to 1.00 micrometers. 
   
   
       10 . The cleaning apparatus according to  claim 2 , wherein said base plate comprises a silicon plate whose surface is formed to be a rough surface by sandblast. 
   
   
       11 . The cleaning apparatus according to  claim 3 , wherein said base plate comprises a silicon plate whose surface is formed to be a rough surface by sandblast. 
   
   
       12 . The cleaning apparatus according to  claim 4 , wherein said base plate comprises a silicon plate whose surface is formed to be a rough surface by sandblast.