US2008293167A1PendingUtilityA1
Fabrication method of semiconductor integrated circuit device
Est. expiryDec 22, 2023(expired)· nominal 20-yr term from priority
G11C 2029/5602G11C 29/56G01R 31/287G11C 29/56016G01R 31/31718G01R 31/286H10W 90/756H10W 90/754H10W 90/724H10W 90/271
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Abstract
A memory test is carried out on semiconductor integrated circuit devices including a semiconductor memory at low cost with efficiency. In a test burn-in system, twenty-four test boards are processed in sequence with time differences, and the test boards are circulated one by one. In this case, the memory test is conducted with the sequence of single board processing: the test is started with a test board in which semiconductor integrated circuit devices have been embedded, and semiconductor integrated circuit devices are discharged, beginning with a test board that has undergone the test.
Claims
exact text as granted — not AI-modified1 . A fabrication method of semiconductor integrated circuit devices, comprising the steps of: mounting a plurality of semiconductor integrated circuit devices, obtained by encapsulating a plurality of semiconductor chips, including a logic circuit device or CPU and a memory circuit device, in one package, in a plurality of test boards; and conducting a memory test on each memory circuit device in the semiconductor integrated circuit devices while the test boards are placed in a thermostatic bath, wherein the thermostatic bath includes first and second slots which are different from each other in temperature.
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