Methods and apparatus for polishing an edge of a substrate
Abstract
Methods, systems and apparatus are provided for polishing an edge of a substrate. The invention includes an apparatus adapted to apply a preset pressure to a polishing film in contact with an edge of a substrate. The apparatus includes an actuator adapted to apply a preset pressure to the polishing film; and a controller coupled to the actuator and adapted to receive a signal indicative of a condition of the edge of the substrate, and to adjust a pressure applied by the actuator to the polishing film so as to maintain the preset pressure based on the received signal. Numerous other aspects are provided.
Claims
exact text as granted — not AI-modified1 . An apparatus adapted to apply a preset pressure to a polishing film in contact with an edge of a substrate comprising:
an actuator adapted to apply a preset pressure to the polishing film; and a controller coupled to the actuator and adapted to receive a signal indicative of a condition of the edge of the substrate, and to adjust a pressure applied by the actuator to the polishing film so as to maintain the preset pressure based on the received signal.
2 . The apparatus of claim 1 wherein the polishing film is adapted to conform to the edge of the substrate via application of the preset pressure.
3 . The apparatus of claim 1 , wherein the signal indicates whether an endpoint has been reached.
4 . The apparatus of claim 1 , wherein the signal indicates whether a layer of material has been removed from the edge of the substrate.
5 . The apparatus of claim 1 , wherein the signal indicates whether an intended edge profile has been reached.
6 . The apparatus as recited in claim 1 , further comprising:
a driver coupled to the controller adapted to rotate the substrate against the polishing film, the driver adapted to generate a signal indicative of the condition of the edge of the substrate.
7 . The apparatus of claim 6 , wherein the controller is coupled to and adapted to direct operation of the driver in response to a signal received from the at least one sensor so as to attain a preset polish level.
8 . The apparatus of claim 1 further comprising a friction sensor coupled to the controller and adapted to provide a signal indicative of an amount of friction between the substrate and the polishing film.
9 . The apparatus of claim 8 wherein the amount of friction between the substrate and the polishing film is indicative of an amount of material that has been removed from the substrate.
10 . The apparatus of claim 6 wherein the signal indicates an amount of force applied to the actuator to push the polishing film against the substrate.
11 . The apparatus of claim 6 wherein the signal indicates an amount of energy being exerted to drive the substrate.
12 . The apparatus of claim 1 wherein the actuator further comprises a solenoid.
13 . The apparatus of claim 12 , wherein the amount of pressure applied by the actuator is determined based on the amount current drawn by the solenoid.
14 . The apparatus of claim 1 wherein the preset pressure is at least one of constant or varied.
15 . The apparatus of claim 1 further comprising a head adapted to support the polishing film.
16 . The apparatus of claim 15 further comprising a pad mounted to the head via the actuator, and adapted to press the polishing film against the substrate.
17 . The apparatus of claim 16 , wherein the pad is adapted to contour the polishing film to an edge of the substrate.
18 . The apparatus of claim 15 wherein the actuator is adapted to push the head towards the substrate.
19 . The apparatus of claim 16 further comprising a fluid supply coupled to the controller, wherein a fluid is delivered to the substrate via the pad.
20 . The apparatus of claim 19 further comprising one or more fluid channels, wherein the fluid channels are adapted to deliver the fluid to the pad.Join the waitlist — get patent alerts
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