Copper physical vapor deposition targets and methods of making copper physical vapor deposition targets

Abstract

The invention includes physical vapor deposition targets formed of copper material and having an average grain size of less than 50 microns and an absence of course-grain areas throughout the target. The invention encompasses a physical vapor deposition target, of a copper material and having an average grain size of less than 50 microns with a grain size standard deviation of fess than 5% (1−σ) throughout the target. The copper material is selected from copper alloys and high-purity copper material containing greater than or equal to 99.9999% copper, by weight. The invention includes methods of forming copper physical vapor deposition targets. An as-cast copper material is subjected to a multistage processing. Each stage of the multistage processing includes a heating event, a hot-forging event, and a water quenching event. After the multistage processing the copper material is roiled to produce a target blank.

1 - 9 . (canceled) 
   
   
       10 . A method of forming a copper physical vapor deposition target comprising:
 providing an as-cast copper material;   performing a multi-stage processing of the as-cast material, each stage comprising a heating event, a hot forging event and a water-quenching event; and   after the multi-stage processing, rolling the copper material to produce a target blank.   
   
   
       11 . The method of  claim 10  further comprising annealing the target blank. 
   
   
       12 . The method of  claim 11  wherein the annealing is conducted at a temperature of at least about 480° F. 
   
   
       13 . The method of  claim 10  further comprising hot isostatic pressing the blank to a backing plate to produce a diffusion bond having a bond strength of greater than or equal to 20 ksi. 
   
   
       14 . The method of  claim 13  wherein the isostatic pressing is conducted at a temperature of about 662° F. for about 2 hours. 
   
   
       15 . The method of  claim 10  further comprising machining the target blank to produce a monolithic target. 
   
   
       16 . The method of  claim 10  wherein the copper material is high-purity copper having a purity of greater than or equal to 99.9999% copper, by weight. 
   
   
       17 . The method of  claim 10  wherein the copper material is a copper alloy. 
   
   
       18 . The method of  claim 17  wherein the copper alloy comprises copper and one or more elements selected from the group consisting of Ag, Al, In, Mg, Sn, and Ti. 
   
   
       19 . The method of  claim 10  wherein the multi-stage process comprises a first stage comprising a first heating event wherein the copper material is heated at a temperature of greater than or equal to 900° F., and a second stage comprising a second heating event wherein the copper material is heated at a temperature of greater than or equal to 900° F. for at least 30 minutes. 
   
   
       20 . A copper physical vapor deposition target framed by the method of  claim 10 .