Film-forming composition for imprinting, method of manufacturing structure, and structure
Abstract
Provided are a film-forming composition for imprinting that enables a structure to be obtained after coating the composition on a substrate and pressing a mold thereto with low compression pressure, a method of manufacturing a structure using the film-forming composition for imprinting, and a structure obtained thereby. The film-forming composition for imprinting according to the present invention contains a resin and an organic solvent, in which the organic solvent includes a particular solvent having a boiling point of 100 to 200° C. at ambient pressure. When the structure is manufactured, the film-forming composition for imprinting according to the present invention is coated on a substrate to form a resin layer, and after a mold is pressed against the resin layer, the mold is released from the resin layer.
Claims
exact text as granted — not AI-modified1 . A film-forming composition for imprinting, for use in forming a structure by coating on a substrate, and pressing a mold thereto,
the film-forming composition for imprinting comprising a resin and an organic solvent, wherein the organic solvent comprises a particular solvent having a boiling point of 100 to 200° C. at ambient pressure.
2 . The film-forming composition for imprinting according to claim 1 wherein the proportion of the particular solvent in the entire organic solvent is no less than 30% by mass.
3 . The film-forming composition for imprinting according to claim 1 wherein the resin is a siloxane resin.
4 . The film-forming composition for imprinting according to claim 3 wherein the siloxane resin comprises a low-molecular weight siloxane resin having a mass-average molecular weight of 300 to 5,000.
5 . The film-forming composition for imprinting according to claim 4 wherein the low-molecular weight siloxane resin has a mass-average molecular weight of 300 to 3,000.
6 . The film-forming composition for imprinting according to claim 4 wherein the proportion of the low-molecular weight siloxane resin in the entire siloxane resin is no less than 30% by mass.
7 . A method of manufacturing a structure comprising the steps of: coating the film-forming composition for imprinting according to claim 1 on a substrate to form a resin layer;
pressing a mold against the resin layer; and releasing the mold from the resin layer.
8 . The method of manufacturing a structure according to claim 7 wherein the resin layer is hardened in a state where the mold is pressed against the resin layer.
9 . A structure obtained by the method of manufacturing a structure according to claim 7 .Join the waitlist — get patent alerts
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